Known targets — ChEMBL curated mechanism
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
The experimentally established mechanism targets of Diphenylamine. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC6A2 known ✓ | P23975 | 1/20 | 0.57 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.60 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.57 |
| ▸ | TSHR | P16473 | 3/20 | 0.57 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.57 |
| ▸ | L3MBTL1 | Q9Y468 | 3/20 | 0.57 |
| ▸ | ALOX12 | P18054 | 2/20 | 0.57 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.57 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.57 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.57 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.57 |
| ▸ | HTR2B | P41595 | 1/20 | 0.57 |
| ▸ | SNCA | P37840 | 1/20 | 0.53 |
| ▸ | CASP3 | P42574 | 1/20 | 0.52 |
| ▸ | SENP7 | Q9BQF6 | 1/20 | 0.52 |
| ▸ | MAPT | P10636 | 5/20 | 0.50 |
| ▸ | MAPK14 | Q16539 | 2/20 | 0.50 |
| ▸ | MAPK13 | O15264 | 1/20 | 0.50 |
| ▸ | MAPK12 | P53778 | 1/20 | 0.50 |
| ▸ | MAPK11 | Q15759 | 1/20 | 0.50 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Diphenylamine SCHEMBL1008717 | 0.95 | HSD17B10 (0.67) | HSD17B10ALDH1A1TSHRTDP1L3MBTL1 | |
| Diphenylamine SCHEMBL1008716 | 0.95 | HSD17B10 (0.67) | HSD17B10ALDH1A1TSHRTDP1L3MBTL1 | |
| Diphenylamine SCHEMBL28015233 | 0.95 | HSD17B10 (0.67) | HSD17B10ALDH1A1TSHRTDP1L3MBTL1 | |
| Diphenylamine SCHEMBL5145295 | 0.92 | HSD17B10 (0.63) | HSD17B10ALDH1A1TSHRTDP1L3MBTL1 | |
| Diphenylamine SCHEMBL28870226 | 0.90 | HSD17B10 (0.60) | HSD17B10ALDH1A1TSHRTDP1L3MBTL1 | |
| Diphenylamine SCHEMBL1626446 | 0.86 | MAPT (0.61) | HSD17B10ALDH1A1TSHRTDP1L3MBTL1 | |
| Diphenylamine SCHEMBL5665558 | 0.85 | HSD17B10 (0.60) | HSD17B10ALDH1A1TSHRTDP1L3MBTL1 | |
| Diphenylamine SCHEMBL1344539 | 0.84 | HSD17B10 (0.86) | HSD17B10ALDH1A1TSHRTDP1L3MBTL1 | |
| Sulfuric Acid SCHEMBL970713 | 0.82 | MAPT (0.75) | HSD17B10ALDH1A1TSHRTDP1L3MBTL1 | |
| Sulfuric Acid SCHEMBL5718122 | 0.82 | ALDH1A1 (0.48) | HSD17B10ALDH1A1TSHRTDP1L3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113646676-B | Polarizing film, polarizing plate, and method for producing polarizing film | 日东电工株式会社 | 2024-07-23 | — | — | CN | claimed |
| CN-105807563-B | Photoresist composition, preparation method and patterning method thereof | 京东方科技集团股份有限公司 | 2020-01-14 | — | — | CN | claimed |
| CN-105068379-B | A kind of silk-screen printing photosensitive resin composition | 田菱新材料（厦门）有限公司 | 2019-04-16 | — | — | CN | claimed |
| CN-105807563-A | Photoresist composition and preparation method and composition method thereof | 京东方科技集团股份有限公司 | 2016-07-27 | — | — | CN | claimed |
| CN-102173181-A | Negative image photosensitive dry offset plate containing diazo resin and preparation method thereof | UNIV BEIJING NORMAL | 2011-09-07 | — | — | CN | claimed |
| CN-102096323-A | Positive light-sensitive waterless offset printing plate containing heavy-nitrogen resin and manufacturing method thereof | UNIV BEIJING NORMAL | 2011-06-15 | — | — | CN | claimed |
| CN-102081306-A | Thermosensitive waterless offset plate containing diazophotographic resin and preparation method thereof | UNIV BEIJING NORMAL | 2011-06-01 | — | — | CN | claimed |
| US-5134057-A | METHOD OF PROVIDING A SUBSTRATE WITH A LAYER COMPRISING A POLYVINYL BASED HYDROGEL AND A BIOCHEMICALLY ACTIVE MATERIAL | 501 PPG BIOMEDICAL SYSTEMS, INC. (US) | 1992-07-28 | — | — | US | claimed |
| EP-0363504-A1 | Method of providing a substrate with a layer comprising a polyvinylbased hydrogel and a biochemically active material | Dräger Nederland B.V. (NL) | 1990-04-18 | — | — | EP | claimed |
| CN-105807563-B | Photoresist composition, preparation method and patterning method thereof | 京东方科技集团股份有限公司 | 2020-01-14 | — | — | CN | disclosed |
| CN-105807563-A | Photoresist composition and preparation method and composition method thereof | 京东方科技集团股份有限公司 | 2016-07-27 | — | — | CN | disclosed |
| CN-104262193-B | A kind of dinitro diphenylamine diazo resin, photoetching compositions containing this resin and preparation method thereof | 京东方科技集团股份有限公司 | 2016-06-08 | — | — | CN | disclosed |
| CN-102173181-A | Negative image photosensitive dry offset plate containing diazo resin and preparation method thereof | UNIV BEIJING NORMAL | 2011-09-07 | — | — | CN | disclosed |
| CN-102096323-A | Positive light-sensitive waterless offset printing plate containing heavy-nitrogen resin and manufacturing method thereof | UNIV BEIJING NORMAL | 2011-06-15 | — | — | CN | disclosed |
| US-5134057-A | METHOD OF PROVIDING A SUBSTRATE WITH A LAYER COMPRISING A POLYVINYL BASED HYDROGEL AND A BIOCHEMICALLY ACTIVE MATERIAL | 501 PPG BIOMEDICAL SYSTEMS, INC. (US) | 1992-07-28 | — | — | US | disclosed |
| WO-1992002857-A1 | AQUEOUS DEVELOPABLE PRECOLORED DIAZO IMAGING ELEMENT | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1992-02-20 | — | — | WO | disclosed |
| EP-0042704-A2 | Method of forming a pattern employing a photosensitive composition | Hitachi, Ltd. (JP) | 1981-12-30 | — | — | EP | disclosed |
| US-4276363-A | AROMATIC DIAZONIUM SALT PHOTOSENSITIVE COMPOSITION TACKIFIED THIN LAYER CONTACTED WITH COATED PHOSPHOR PARTICLES | HITACHI, LTD. (JP) | 1981-06-30 | — | — | US | disclosed |
| US-4093463-A | NITROGEN, LIGHT SENSITIVE | EASTMAN KODAK COMPANY (US) | 1978-06-06 | — | — | US | disclosed |
| US-4032344-A | PHOTOSENSITIVITY | EASTMAN KODAK COMPANY (US) | 1977-06-28 | — | — | US | disclosed |