Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 4/20 | 0.62 |
| ▸ | CES2 | O00748 | 2/20 | 0.62 |
| ▸ | CES1 | P23141 | 2/20 | 0.62 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.50 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.50 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.42 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.42 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.41 |
| ▸ | ITGAV | P06756 | 1/20 | 0.40 |
| ▸ | SRC | P12931 | 1/20 | 0.40 |
| ▸ | SLC1A3 | P43003 | 1/20 | 0.39 |
| ▸ | SLC1A2 | P43004 | 1/20 | 0.39 |
| ▸ | SLC1A1 | P43005 | 1/20 | 0.39 |
| ▸ | HPGD | P15428 | 2/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.39 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.39 |
| ▸ | GMNN | O75496 | 1/20 | 0.39 |
| ▸ | POLB | P06746 | 1/20 | 0.39 |
| ▸ | MAPT | P10636 | 1/20 | 0.39 |
| ▸ | PMP22 | Q01453 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Benzoin SCHEMBL11213797 | 0.89 | LMNA (0.55) | LMNACES2CES1ALDH1A1KDM4E | |
| SCHEMBL10508258 | 0.89 | CES2 (0.46) | LMNACES2CES1ALDH1A1KDM4E | |
| Mandelic Acid SCHEMBL16499230 | 0.86 | LMNA (0.58) | LMNACES2CES1ALDH1A1KDM4E | |
| SCHEMBL10505589 | 0.86 | CES2 (0.44) | LMNACES2CES1ALDH1A1KDM4E | |
| Benzoin SCHEMBL8764252 | 0.85 | LMNA (0.54) | LMNACES2CES1ALDH1A1KDM4E | |
| Benzoin SCHEMBL384248 | 0.82 | LMNA (0.78) | LMNACES2CES1ALDH1A1KDM4E | |
| Benzoin SCHEMBL28391545 | 0.82 | LMNA (0.84) | LMNACES2CES1ALDH1A1KDM4E | |
| Benzoin SCHEMBL28200317 | 0.82 | LMNA (0.57) | LMNACES2CES1ALDH1A1KDM4E | |
| Benzoin SCHEMBL710405 | 0.81 | LMNA (0.75) | LMNACES2CES1ALDH1A1KDM4E | |
| Benzoin SCHEMBL60546 | 0.81 | LMNA (0.64) | LMNACES2CES1ALDH1A1KDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 239 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-111512228-B | Negative type lift-off resist composition comprising alkali-soluble resin and crosslinking agent and method for manufacturing metal film pattern on substrate | 默克专利有限公司 | 2024-09-06 | — | — | CN | claimed |
| CN-110361931-B | Antireflective hardmask composition | 厦门恒坤新材料科技股份有限公司 | 2022-08-05 | — | — | CN | claimed |
| CN-113913075-A | Anti-reflective coating composition and crosslinkable polymer | 嘉庚创新实验室 | 2022-01-11 | — | — | CN | claimed |
| CN-102741749-B | Negative photosensitive resin composition, pattern formation method, and liquid discharge head | CANON KABUSHIKI KAISHA (JP) | 2014-10-08 | — | — | CN | claimed |
| CN-101681096-A | Hardmask composition having antireflective properties and method of patterning material on substrate using the same | CHEIL IND INC | 2010-03-24 | — | — | CN | claimed |
| EP-0251465-A2 | Light activatable anaerobic composition containing latent sulfonic acid source | LOCTITE CORPORATION (US) | 1988-01-07 | — | — | EP | claimed |
| CN-122025633-A | Polymeric adhesive for electrochemical cells including labels | 通用汽车环球科技运作有限责任公司 | 2026-05-12 | — | — | CN | disclosed |
| US-20250231488-A1 | ANTI-REFLECTIVE COATING COMPOSITION | Tan Kah Kee Innovation Laboratory (CN) | 2025-07-17 | — | — | US | disclosed |
| CN-119882348-A | Resist underlayer composition and method for forming pattern using the same | 三星SDI株式会社 | 2025-04-25 | — | — | CN | disclosed |
| CN-119816544-A | Composition, cured product, display device, and solid-state imaging device | 住友化学株式会社 | 2025-04-11 | — | — | CN | disclosed |
| CN-116323713-B | Curable composition and cured film | 住友化学株式会社 | 2025-04-11 | — | — | CN | disclosed |
| CN-119816543-A | Composition, cured product, display device, and solid-state imaging device | 住友化学株式会社 | 2025-04-11 | — | — | CN | disclosed |
| CN-119620541-A | Preparation and application of bottom anti-reflection coating with high etching rate | 儒芯微电子材料（上海）有限公司 | 2025-03-14 | — | — | CN | disclosed |
| CN-1388414-A | Material for preservative formation | TOKYO O KAGAKU KOGYO CO LTD (JP) | 2003-01-01 | — | — | CN | disclosed |
| CN-1287630-A | Positive radiation-sensitive composition | TORAY INDUSTRIES (JP) | 2001-03-14 | — | — | CN | disclosed |
| EP-0251465-A2 | Light activatable anaerobic composition containing latent sulfonic acid source | LOCTITE CORPORATION (US) | 1988-01-07 | — | — | EP | disclosed |
| EP-0249365-A2 | Photocatalysts for vinyl compounds activated by an electron donating hetero atom | LOCTITE (IRELAND) Ltd. (IE) | 1987-12-16 | — | — | EP | disclosed |
| US-4708926-A | SULFONIC ESTERS OF A-HYDROXYCARBONYL COMPOUNDS | CIBA-GEIGY CORPORATION (US) | 1987-11-24 | — | — | US | disclosed |
| US-4636575-A | Masked curing catalyst for acid-curable compositions | CIBA-GEIGY CORPORATION (US) | 1987-01-13 | — | — | US | disclosed |
| US-4510290-A | LATENCY; LOW-TEMPERATURE CURING BY SHORTWAVE RADIATION; INKS, LACQUERS | CIBA GEIGY CORPORATION (US) | 1985-04-09 | — | — | US | disclosed |