SCHEMBL708302

SCHEMBL708302

CCC(c1ccccc1)[SiH](Br)Br

nearest known ligand 0.48

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
LMNA P02545 2/20 0.48
MIF P14174 1/20 0.39
TRPA1 O75762 2/20 0.38
HKDC1 Q2TB90 1/20 0.38
TAAR1 Q96RJ0 4/20 0.38
HTR2A P28223 4/20 0.38
HRH1 P35367 3/20 0.38
AOC3 Q16853 1/20 0.37
NOS3 P29474 1/20 0.37
NOS2 P35228 1/20 0.37
TDP1 Q9NUW8 1/20 0.37
POLB P06746 1/20 0.36
MEN1 O00255 1/20 0.36
KMT2A Q03164 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL705291 0.82 AOC3 (0.43) LMNATAAR1HTR2AHRH1AOC3
SCHEMBL27934269 0.81 LMNA (0.48) LMNAMIFTRPA1HKDC1TAAR1
SCHEMBL707144 0.79 LMNA (0.46) LMNAMIFTRPA1HKDC1TAAR1
SCHEMBL22283485 0.79 LMNA (0.46) LMNAMIFTRPA1HKDC1TAAR1
SCHEMBL707339 0.79 LMNA (0.46) LMNAMIFTRPA1HKDC1TAAR1
SCHEMBL10606181 0.79 LMNA (0.52) LMNAMIFTRPA1HKDC1TAAR1
SCHEMBL705765 0.76 LMNA (0.43) LMNAMIFTRPA1HKDC1TAAR1
SCHEMBL707897 0.74 LMNA (0.42) LMNAMIFTRPA1HKDC1TAAR1
SCHEMBL705469 0.73 LMNA (0.41) LMNAMIFTRPA1HKDC1TAAR1
SCHEMBL704671 0.73 LMNA (0.41) LMNAMIFTRPA1HKDC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8124239-B2 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2012-02-28 US disclosed
US-20100155121-A1 SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME FUJITSU LIMITED (JP) 2010-06-24 US disclosed
US-7659357-B2 Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed FUJITSU LIMITED (JP) 2010-02-09 US disclosed
US-20070026689-A1 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2007-02-01 US disclosed
US-4051131-A Intermediates for preparing cephalosporins AMERICAN HOME PRODUCTS CORPORATION (DEL.) (US) 1977-09-27 US disclosed
US-3965098-A Intermediates for preparing cephalosporins and methods of production AMERICAN HOME PRODUCTS CORPORATION (US) 1976-06-22 US disclosed