Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | AOC3 | Q16853 | 2/20 | 0.43 |
| ▸ | LMNA | P02545 | 1/20 | 0.40 |
| ▸ | HRH1 | P35367 | 6/20 | 0.38 |
| ▸ | HTR2A | P28223 | 6/20 | 0.38 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.37 |
| ▸ | TAAR1 | Q96RJ0 | 3/20 | 0.35 |
| ▸ | RIPK1 | Q13546 | 1/20 | 0.35 |
| ▸ | OPRM1 | P35372 | 1/20 | 0.35 |
| ▸ | OPRD1 | P41143 | 1/20 | 0.35 |
| ▸ | OPRK1 | P41145 | 1/20 | 0.35 |
| ▸ | OPRL1 | P41146 | 1/20 | 0.35 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL708302 | 0.82 | LMNA (0.48) | AOC3LMNAHRH1HTR2ATAAR1 | |
| SCHEMBL707817 | 0.81 | AOC3 (0.42) | AOC3LMNAHRH1HTR2ASIGMAR1 | |
| SCHEMBL524106 | 0.81 | AOC3 (0.42) | AOC3LMNAHRH1HTR2ASIGMAR1 | |
| SCHEMBL10608215 | 0.81 | AOC3 (0.46) | AOC3LMNAHRH1HTR2ASIGMAR1 | |
| SCHEMBL704370 | 0.78 | AOC3 (0.40) | AOC3LMNAHRH1HTR2ASIGMAR1 | |
| SCHEMBL703457 | 0.76 | AOC3 (0.39) | AOC3LMNAHRH1HTR2ASIGMAR1 | |
| SCHEMBL706757 | 0.75 | AOC3 (0.38) | AOC3LMNAHRH1HTR2ASIGMAR1 | |
| SCHEMBL703614 | 0.75 | AOC3 (0.38) | AOC3LMNATAAR1RIPK1OPRM1 | |
| SCHEMBL706248 | 0.75 | AOC3 (0.38) | AOC3LMNASIGMAR1 | |
| SCHEMBL107889 | 0.74 | HRH1 (0.56) | AOC3LMNAHRH1HTR2ASIGMAR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8124239-B2 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2012-02-28 | — | — | US | disclosed |
| US-20100155121-A1 | SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME | FUJITSU LIMITED (JP) | 2010-06-24 | — | — | US | disclosed |
| US-7659357-B2 | Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed | FUJITSU LIMITED (JP) | 2010-02-09 | — | — | US | disclosed |
| US-20070026689-A1 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2007-02-01 | — | — | US | disclosed |