Anisole

Anisole

SCHEMBL7093934

CCOC(=O)C(C)O.COc1ccccc1

nearest known ligand 0.50

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 4/20 0.50
CA4 P22748 1/20 0.48
L3MBTL1 Q9Y468 4/20 0.48
ALDH1A1 P00352 3/20 0.48
MAPK1 P28482 2/20 0.48
TSHR P16473 2/20 0.48
PIN1 Q13526 1/20 0.47
MEN1 O00255 3/20 0.46
KMT2A Q03164 3/20 0.46
NPC1 O15118 3/20 0.46
LMNA P02545 3/20 0.46
KDM4E B2RXH2 2/20 0.46
MAPT P10636 2/20 0.46
HTT P42858 2/20 0.46
HKDC1 Q2TB90 2/20 0.46
NPSR1 Q6W5P4 2/20 0.46
RAB9A P51151 2/20 0.46
TP53 P04637 1/20 0.46
HSP90AA1 P07900 1/20 0.46
MPI P34949 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Phenetole SCHEMBL16735431 0.86 TDP1 (0.58) TDP1L3MBTL1MAPK1PIN1MEN1
Acetic Acid Pentyl Ester SCHEMBL7093628 0.85 TDP1 (0.45) TDP1L3MBTL1ALDH1A1MAPK1TSHR
Toluene SCHEMBL8038714 0.84 PIN1 (0.51) TDP1L3MBTL1ALDH1A1TSHRPIN1
Benzene SCHEMBL3176015 0.83 PIN1 (0.47) TDP1L3MBTL1ALDH1A1TSHRPIN1
Toluene SCHEMBL10334200 0.82 PIN1 (0.50) TDP1L3MBTL1ALDH1A1TSHRPIN1
SCHEMBL7699400 0.82 LDHA (0.46) TDP1L3MBTL1ALDH1A1MEN1KMT2A
Ammonia Solution, Strong SCHEMBL27401360 0.81 PIN1 (0.49) TDP1L3MBTL1ALDH1A1TSHRPIN1
Anisole SCHEMBL2277975 0.80 ALDH1A1 (0.54) TDP1CA4L3MBTL1ALDH1A1MAPK1
SCHEMBL28262762 0.80 L3MBTL1 (0.54) TDP1L3MBTL1ALDH1A1MAPK1PIN1
Hydrogen Peroxide SCHEMBL5367632 0.79 ALDH1A1 (0.48) ALDH1A1PIN1MEN1KMT2ANPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0273026-B2 Solvents for Photoresist compositions SHIPLEY CO (US) 2003-08-20 EP disclosed