SCHEMBL7126364

SCHEMBL7126364

CC(=O)OC(CC1CC2C=CC1C2)C1CCOC1=O

nearest known ligand 0.32

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 10/20 0.32
POLB P06746 1/20 0.32
ALOX15 P16050 1/20 0.32
IDO1 P14902 1/20 0.32
TDO2 P48775 1/20 0.32
TDP1 Q9NUW8 2/20 0.32
ALDH1A1 P00352 6/20 0.32
MAPT P10636 2/20 0.31
PKM P14618 1/20 0.31
MAPK1 P28482 1/20 0.31
LMNA P02545 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7130240 0.79 IDO1 (0.35) KDM4EIDO1TDO2TDP1ALDH1A1
SCHEMBL7126089 0.78 ALDH1A1 (0.32) POLBALDH1A1
SCHEMBL9908411 0.77 ALDH1A1 (0.32) KDM4EALDH1A1LMNA
SCHEMBL14182366 0.75
SCHEMBL13992892 0.72
SCHEMBL7119984 0.70 KDM4E (0.32) KDM4ELMNA
SCHEMBL3366580 0.68 KDM4E (0.34) KDM4EPOLBALOX15TDP1ALDH1A1
SCHEMBL14761258 0.67 KDM4E (0.34) KDM4EPOLBALOX15TDP1ALDH1A1
SCHEMBL12634093 0.66 KDM4E (0.36) KDM4EPOLBALOX15IDO1TDO2
SCHEMBL32688903 0.66 KDM4E (0.40) KDM4EPOLBALOX15IDO1TDO2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6660448-B2 Lactone ring-substituted norbornene based polymers; photoresists; resolution, etching resistance, use in micropatterning with electron beams or deep-ultraviolet radation SHIN-ETSU CHEMICAL CO., LTD. (JP) 2003-12-09 US disclosed
US-6500961-B2 MICROSTRUCTURE PATTERNS FOR PHOTORESISTS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2002-12-31 US disclosed
US-20020091215-A1 Polymer, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2002-07-11 US disclosed
US-20020019545-A1 Novel lactone compounds having alicyclic structure and their manufacturing method SHIN-ETSU CHEMICAL CO., LTD. (JP) 2002-02-14 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20020019545-A1 Novel lactone compounds having alicyclic structure and their manufacturing method RACK1, MRPS22, ECH1 KDM4E 788/4885POLB 2115/4885ALOX15 66/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.