SCHEMBL7119984

SCHEMBL7119984

O=C1OCCC1C(O)C1CC2C=CC1C2

nearest known ligand 0.33

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 1/20 0.32
LMNA P02545 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7126089 0.80 ALDH1A1 (0.32)
SCHEMBL14252805 0.77
SCHEMBL7130240 0.76 IDO1 (0.35) KDM4E
SCHEMBL7126364 0.70 KDM4E (0.32) KDM4ELMNA
SCHEMBL9908387 0.70 LMNA (0.33) LMNA
SCHEMBL13482603 0.68
SCHEMBL14625819 0.68
SCHEMBL14453567 0.67
SCHEMBL6557304 0.66 KDM4E (0.34) KDM4ELMNA
SCHEMBL120085 0.66 ALDH1A1 (0.41) KDM4ELMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7341818-B2 Norbornene-type monomers and polymers containing pendent lactone or sultone groups PROMERUS LLC (US) 2008-03-11 US disclosed
US-7341818-B2 Norbornene-type monomers and polymers containing pendent lactone or sultone groups PROMERUS LLC (US) 2008-03-11 US disclosed
US-6660448-B2 Lactone ring-substituted norbornene based polymers; photoresists; resolution, etching resistance, use in micropatterning with electron beams or deep-ultraviolet radation SHIN-ETSU CHEMICAL CO., LTD. (JP) 2003-12-09 US disclosed
US-6500961-B2 MICROSTRUCTURE PATTERNS FOR PHOTORESISTS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2002-12-31 US disclosed
US-20020091215-A1 Polymer, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2002-07-11 US disclosed
US-20020019545-A1 Novel lactone compounds having alicyclic structure and their manufacturing method SHIN-ETSU CHEMICAL CO., LTD. (JP) 2002-02-14 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20020019545-A1 Novel lactone compounds having alicyclic structure and their manufacturing method RACK1, MRPS22, ECH1 KDM4E 788/4885LMNA 123/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.