SCHEMBL712913

SCHEMBL712913

Nc1ccc(Oc2cccc(S(=O)(=O)c3cccc(Oc4ccc(N)c(C(=O)O)c4)c3)c2)cc1C(=O)O

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
POLB P06746 4/20 0.48
APEX1 P27695 2/20 0.48
L3MBTL1 Q9Y468 2/20 0.48
CTDSP1 Q9GZU7 1/20 0.48
KDM4E B2RXH2 3/20 0.44
KMT2A Q03164 2/20 0.44
GFER P55789 1/20 0.44
RXFP1 Q9HBX9 1/20 0.44
CYP2C9 P11712 2/20 0.43
CYP1A2 P05177 1/20 0.43
TDP1 Q9NUW8 2/20 0.42
MEN1 O00255 1/20 0.42
USP2 O75604 1/20 0.42
MAPT P10636 1/20 0.42
THRB P10828 1/20 0.42
PKM P14618 1/20 0.42
RECQL P46063 1/20 0.42
BLM P54132 1/20 0.42
MCL1 Q07820 1/20 0.42
HPSE Q9Y251 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1553291 0.87 POLB (0.58) POLBAPEX1L3MBTL1CTDSP1KDM4E
SCHEMBL7631413 0.87 POLB (0.62) POLBAPEX1L3MBTL1CTDSP1KDM4E
SCHEMBL1553285 0.86 KDM4E (0.55) POLBAPEX1KDM4EKMT2AGFER
SCHEMBL5078313 0.83 POLB (0.57) POLBAPEX1KDM4EKMT2AGFER
SCHEMBL712251 0.83 KDM4E (0.61) POLBAPEX1KDM4EKMT2AGFER
SCHEMBL9304326 0.82 POLB (0.50) POLBAPEX1L3MBTL1CTDSP1KDM4E
SCHEMBL1554060 0.81 KMT2A (0.59) POLBAPEX1KDM4EKMT2AGFER
SCHEMBL711623 0.81 MMP2 (0.50) L3MBTL1KMT2AGFERTDP1MEN1
SCHEMBL10577261 0.79 ALDH1A1 (0.57) POLBL3MBTL1KDM4EKMT2AGFER
SCHEMBL9305467 0.79 MCL1 (0.56) POLBAPEX1L3MBTL1CTDSP1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 52 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114174422-B Resin composition and use thereof DIC株式会社 2024-04-30 CN disclosed
CN-116847983-A Laminated structure and flexible printed circuit board 太阳控股株式会社 2023-10-03 CN disclosed
WO-2023153390-A1 PHOTOSENSITIVE RESIN SHEET, CURED FILM, AND MULTILAYER WIRING SUBSTRATE 東レ株式会社 2023-08-17 WO disclosed
US-20220155684-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN SHEET, METHOD FOR PRODUCING HOLLOW STRUCTURE, AND ELECTRONIC COMPONENT TORAY INDUSTRIES, INC. (JP) 2022-05-19 US disclosed
CN-114174422-A Resin composition, semiconductor sealing material using same, and dipping base material, circuit board, build-up film, prepreg, carbon fiber composite material, solder resist, dry film, and printed wiring board DIC株式会社 2022-03-11 CN disclosed
EP-3933906-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN SHEET, METHOD FOR PRODUCING HOLLOW STRUCTURE, AND ELECTRONIC COMPONENT Toray Industries, Inc. (JP) 2022-01-05 EP disclosed
CN-105278241-B Photosensitive thermosetting resin composition, dry film and printed wiring board 太阳油墨制造株式会社 2020-08-11 CN disclosed
CN-105683837-B Photosensitive thermosetting resin composition and flexible printed circuit board 太阳油墨制造株式会社 2020-04-07 CN disclosed
CN-110869848-A Laminated structure, dry film, and flexible printed circuit board 太阳油墨制造株式会社 2020-03-06 CN disclosed
CN-105378564-B Photosensitive thermosetting resin composition and flexible printed circuit board 太阳油墨制造株式会社 2020-02-07 CN disclosed
US-20040048978-A1 Photosensitive resin composition, solder resist comprising the same, cover lay film, and printed circuit board KANEKA CORPORATION (JP) 2004-03-11 US disclosed
US-6686106-B2 POLYIMIDESILOXANE COPOLYMERS UBE INDUSTRIES, LTD. (JP) 2004-02-03 US disclosed
US-6605353-B2 Polyimide derived from a dianhydride and diamine having hydroxyl or carboxyl groups, which are modified with a diepoxide or unsaturated group-containing epoxide; curable; heat resistance, dielectric, film-forming KANEKA CORPORATION (JP) 2003-08-12 US disclosed
US-6468639-B2 PLATING RESISTANT AND PROTECTIVE INSULATING FILM IS ACHIEVED WITH A COATING MATERIAL OF A SINGLE TYPE OF INSULATING MATERIAL UBE INDUSTRIES, LTD. (JP) 2002-10-22 US disclosed
US-6461738-B2 HEAT AND SOLVENT RESISTANCE UBE INDUSTRIES, INC. (JP) 2002-10-08 US disclosed
US-20020076548-A1 SINGLE-APPLICATION POLYIMIDOSILOXANE-BASED COATING MATERIAL AND CURED FILM UBE INDUSTRIES, LTD. (JP) 2002-06-20 US disclosed
US-20020001763-A1 Photosensitive resin compositions, insulating films, and processes for formation of the films UBE INDUSTRIES, LTD. 2002-01-03 US disclosed
US-20010056174-A1 Epoxy-modified polyimide, photosensitive composition, coverlay film, solder resist, and printed wiring board using the epoxy-modified polyimide KANEKA CORPORATION (JP) 2001-12-27 US disclosed
US-20010020081-A1 Polyimide-based insulating film composition, insulating film and insulating film-forming method UBE INDUSTRIES, LTD. (JP) 2001-09-06 US disclosed
US-6117510-A SUPPORT FILMS WITH POLYIMIDOSILOXANE COPOLYMER COATINGS UBE INDUSTRIES, LTD. (JP) 2000-09-12 US disclosed