Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAOB | P27338 | 6/20 | 0.42 |
| ▸ | ABCG2 | Q9UNQ0 | 5/20 | 0.41 |
| ▸ | CA12 | O43570 | 2/20 | 0.39 |
| ▸ | CA1 | P00915 | 2/20 | 0.39 |
| ▸ | CA2 | P00918 | 2/20 | 0.39 |
| ▸ | CA7 | P43166 | 2/20 | 0.39 |
| ▸ | CA9 | Q16790 | 2/20 | 0.39 |
| ▸ | CA14 | Q9ULX7 | 2/20 | 0.39 |
| ▸ | CXCL12 | P48061 | 1/20 | 0.39 |
| ▸ | MMP1 | P03956 | 1/20 | 0.37 |
| ▸ | MMP2 | P08253 | 1/20 | 0.37 |
| ▸ | MMP9 | P14780 | 1/20 | 0.37 |
| ▸ | AKR1B10 | O60218 | 1/20 | 0.36 |
| ▸ | AKR1B1 | P15121 | 1/20 | 0.36 |
| ▸ | MAOA | P21397 | 1/20 | 0.36 |
| ▸ | AR | P10275 | 1/20 | 0.36 |
| ▸ | GUSB | P08236 | 1/20 | 0.36 |
| ▸ | TAS1R3 | Q7RTX0 | 1/20 | 0.36 |
| ▸ | TAS1R1 | Q7RTX1 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7270962 | 0.91 | PTGS2 (0.40) | MAOBABCG2CA12CA1CA2 | |
| SCHEMBL7199294 | 0.89 | LTB4R (0.41) | MAOBABCG2CA12CA1CA2 | |
| SCHEMBL3842067 | 0.89 | LTB4R (0.41) | MAOBABCG2CA12CA1CA2 | |
| SCHEMBL3838358 | 0.89 | CA12 (0.43) | MAOBABCG2CA12CA1CA2 | |
| SCHEMBL6277592 | 0.88 | MAOB (0.43) | MAOBABCG2CA12CA1CA2 | |
| SCHEMBL6553372 | 0.86 | ABCG2 (0.39) | MAOBABCG2CA12CA1CA2 | |
| SCHEMBL6279818 | 0.85 | CA12 (0.40) | MAOBABCG2CA12CA1CA2 | |
| SCHEMBL6280731 | 0.84 | RELA (0.41) | MAOBABCG2CA12CA1CA2 | |
| SCHEMBL6842075 | 0.81 | ABCG2 (0.39) | MAOBABCG2CA12CA1CA2 | |
| SCHEMBL4964310 | 0.81 | KMT2A (0.47) | MAOBABCG2CA12CA1CA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0780732-B1 | Polymer composition and resist material | WAKO PURE CHEM IND LTD (JP) | 2003-07-09 | — | — | EP | disclosed |
| US-6303264-B1 | PROFILE OF PATTERN OF QUARTER MICRON ORDER WITHOUT CAUSING FOOTING, WHILE RETAINING HIGH RESOLUTION ABILITY AND HIGH SENSITIVITY | WAKO PURE CHEMICAL INDUSTRIES, LTD (JP) | 2001-10-16 | — | — | US | disclosed |
| EP-0789279-B1 | Polymer and resist material | WAKO PURE CHEM IND LTD (JP) | 2001-03-21 | — | — | EP | disclosed |
| US-6033826-A | POLYHYDROXYSTYRENE DERIVATIVE CONTAINING AN ACETAL OR KETAL GROUP WHICH CAN EASILY BE ELIMINATED IN THE PRESENCE OF AN ACID IN THE MOLECULE AND HAVING A VERY NARROW MOLECULAR WEIGHT DISTRIBUTION GIVES A RESIST MATERIAL | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2000-03-07 | — | — | US | disclosed |
| EP-0704762-B1 | Resist material and pattern formation | WAKO PURE CHEM IND LTD (JP) | 1999-12-15 | — | — | EP | disclosed |
| US-5976759-A | ALKALI SOLUBLE BY HEATING | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1999-11-02 | — | — | US | disclosed |
| EP-0875787-A1 | Method for reducing the substrate dependence of resist | Wako Pure Chemical Industries, Ltd. (JP) | 1998-11-04 | — | — | EP | disclosed |
| EP-0780732-A2 | Polymer composition and resist material | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1997-06-25 | — | — | EP | disclosed |
| US-5558971-A | HYDROXYSTYRENE POLYMER DERIVATIVES, PHOTOACID GENERATOR | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1996-09-24 | — | — | US | disclosed |
| US-5558976-A | HYDROXYSTYRENE POLYMER DERIVATIVES, PHOTOACID GENERATOR, PHOTORESISTS | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1996-09-24 | — | — | US | disclosed |
| EP-0704762-A1 | Resist material and pattern formation | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1996-04-03 | — | — | EP | disclosed |
| EP-0588544-A2 | Fine pattern forming material and pattern formation process | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1994-03-23 | — | — | EP | disclosed |