SCHEMBL7199294

SCHEMBL7199294

CCOC(C)Oc1ccc(C=C(C=Cc2ccccc2)C=Cc2ccc(O)cc2)cc1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LTB4R Q15722 1/20 0.41
LTB4R2 Q9NPC1 1/20 0.41
MAOB P27338 2/20 0.41
ABCG2 Q9UNQ0 2/20 0.41
RELA Q04206 1/20 0.40
CA12 O43570 3/20 0.40
CA7 P43166 3/20 0.40
CA9 Q16790 3/20 0.40
CA14 Q9ULX7 3/20 0.40
CA1 P00915 2/20 0.40
CA2 P00918 2/20 0.40
MAOA P21397 1/20 0.39
NPC1 O15118 1/20 0.39
MAPT P10636 1/20 0.39
RAB9A P51151 1/20 0.39
KMT2A Q03164 1/20 0.39
GSK3B P49841 1/20 0.38
BACE1 P56817 1/20 0.38
AKR1B10 O60218 2/20 0.38
AKR1B1 P15121 2/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3842067 1.00 LTB4R (0.41) LTB4RLTB4R2MAOBABCG2RELA
SCHEMBL3838358 0.91 CA12 (0.43) MAOBABCG2CA12CA7CA9
SCHEMBL7270962 0.89 PTGS2 (0.40) LTB4RLTB4R2MAOBABCG2CA12
SCHEMBL7172181 0.89 ABCG2 (0.46) MAOBABCG2CA12CA7CA9
SCHEMBL7138148 0.89 MAOB (0.42) MAOBABCG2CA12CA7CA9
SCHEMBL6280731 0.89 RELA (0.41) MAOBABCG2RELACA12CA7
SCHEMBL6866016 0.89 CA12 (0.41) LTB4RLTB4R2MAOBABCG2RELA
SCHEMBL4964310 0.89 KMT2A (0.47) LTB4RLTB4R2MAOBABCG2RELA
SCHEMBL6276080 0.88 ABCG2 (0.42) LTB4RLTB4R2ABCG2CA12CA7
SCHEMBL6839679 0.87 LTB4R (0.37) LTB4RLTB4R2MAOBABCG2CA12

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6586152-B1 Useful as an ingredient of a resist composition used for preparation of semiconductor devices and the like, which comprises a compound shown by the following general formula useful as an ingredient of a resist composition used for WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2003-07-01 US claimed
US-6303264-B1 PROFILE OF PATTERN OF QUARTER MICRON ORDER WITHOUT CAUSING FOOTING, WHILE RETAINING HIGH RESOLUTION ABILITY AND HIGH SENSITIVITY WAKO PURE CHEMICAL INDUSTRIES, LTD (JP) 2001-10-16 US claimed
US-6586152-B1 Useful as an ingredient of a resist composition used for preparation of semiconductor devices and the like, which comprises a compound shown by the following general formula useful as an ingredient of a resist composition used for WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2003-07-01 US disclosed
US-6303264-B1 PROFILE OF PATTERN OF QUARTER MICRON ORDER WITHOUT CAUSING FOOTING, WHILE RETAINING HIGH RESOLUTION ABILITY AND HIGH SENSITIVITY WAKO PURE CHEMICAL INDUSTRIES, LTD (JP) 2001-10-16 US disclosed
EP-0875787-A1 Method for reducing the substrate dependence of resist Wako Pure Chemical Industries, Ltd. (JP) 1998-11-04 EP disclosed