SCHEMBL7150816

SCHEMBL7150816

O=C(O)c1cccc(C(F)(c2cccc(C(=O)O)c2O)C(F)(F)C(F)(F)F)c1O

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALB P02768 1/20 0.50
ALDH1A1 P00352 6/20 0.46
KDM4E B2RXH2 5/20 0.46
HPGD P15428 3/20 0.46
HSD17B10 Q99714 2/20 0.46
MMP2 P08253 1/20 0.46
HNF4A P41235 1/20 0.43
TAS2R14 Q9NYV8 2/20 0.40
HMGB1 P09429 2/20 0.40
FABP4 P15090 1/20 0.39
ALOX15 P16050 1/20 0.39
SMN1; SMN2 Q16637 2/20 0.38
CA12 O43570 1/20 0.38
CA1 P00915 1/20 0.38
CA2 P00918 1/20 0.38
CA4 P22748 1/20 0.38
CA6 P23280 1/20 0.38
CA7 P43166 1/20 0.38
CA9 Q16790 1/20 0.38
NAPRT Q6XQN6 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1372606 0.84 ALDH1A1 (0.48) ALDH1A1KDM4EHPGDHSD17B10TAS2R14
SCHEMBL3423138 0.83 TAS2R14 (0.40) ALBALDH1A1KDM4EHPGDHSD17B10
SCHEMBL31120746 0.82 ALB (0.57) ALBALDH1A1KDM4EHPGDHSD17B10
SCHEMBL1508508 0.82 ALB (0.57) ALBALDH1A1KDM4EHPGDHSD17B10
SCHEMBL2747575 0.79 TAS2R14 (0.38) ALBALDH1A1KDM4EHPGDTAS2R14
SCHEMBL5186678 0.76 CA12 (0.53) ALDH1A1KDM4EHPGDHMGB1SMN1; SMN2
Trifluoroacetic Acid SCHEMBL6852951 0.75 CA2 (0.52) ALBALDH1A1KDM4EHPGDHSD17B10
SCHEMBL5025935 0.74 NPC1 (0.41) ALDH1A1KDM4EHPGDTAS2R14HMGB1
SCHEMBL39311 0.74 CA2 (0.61) ALBALDH1A1KDM4EHPGDHSD17B10
SCHEMBL30638079 0.74 CA2 (0.61) ALBALDH1A1KDM4EHPGDHSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6524764-B1 Alkali-developable; polyamide, phenol compound and/or ester of a naphthoquinone diazide sulphonic acid TORAY INDUSTRIES, INC. (JP) 2003-02-25 US disclosed
EP-1132773-A1 POSITIVE-TYPE PHOTOSENSITIVE POLYIMIDE PRECURSOR COMPOSITION TORAY INDUSTRIES, INC. (JP) 2001-09-12 EP disclosed