Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.48 |
| ▸ | ALDH1A1 | P00352 | 8/20 | 0.45 |
| ▸ | TDP1 | Q9NUW8 | 5/20 | 0.45 |
| ▸ | HSD17B10 | Q99714 | 4/20 | 0.45 |
| ▸ | CTSD | P07339 | 1/20 | 0.45 |
| ▸ | PTGS2 | P35354 | 2/20 | 0.43 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.43 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.43 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.43 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.43 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.43 |
| ▸ | HTR2B | P41595 | 1/20 | 0.43 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.43 |
| ▸ | IDO1 | P14902 | 2/20 | 0.41 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.41 |
| ▸ | LMNA | P02545 | 1/20 | 0.41 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.41 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.41 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.41 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9181403 | 0.82 | TSHR (0.48) | TSHRALDH1A1TDP1HSD17B10CTSD | |
| SCHEMBL49520 | 0.82 | TSHR (0.48) | TSHRALDH1A1TDP1HSD17B10CTSD | |
| SCHEMBL6910659 | 0.78 | TSHR (0.43) | TSHRALDH1A1TDP1HSD17B10CTSD | |
| SCHEMBL1371114 | 0.78 | TSHR (0.43) | TSHRALDH1A1TDP1HSD17B10CTSD | |
| SCHEMBL7691374 | 0.78 | ALDH1A1 (0.53) | TSHRALDH1A1TDP1HSD17B10CTSD | |
| SCHEMBL2200402 | 0.76 | TSHR (0.42) | TSHRALDH1A1TDP1HSD17B10CTSD | |
| SCHEMBL11852672 | 0.76 | TSHR (0.42) | TSHRALDH1A1TDP1HSD17B10CTSD | |
| SCHEMBL11097238 | 0.74 | TSHR (0.40) | TSHRALDH1A1TDP1HSD17B10CTSD | |
| SCHEMBL980166 | 0.74 | TSHR (0.40) | TSHRALDH1A1TDP1HSD17B10CTSD | |
| SCHEMBL27980315 | 0.74 | TSHR (0.40) | TSHRALDH1A1TDP1HSD17B10CTSD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 72 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20180135167-A1 | Transparent Sheet Materials | FUJIFILM MANUFACTURING EUROPE B.V. (NL) | 2018-05-17 | — | — | US | claimed |
| EP-3234216-A2 | TRANSPARENT SHEET MATERIALS | Fujifilm Manufacturing Europe BV (NL) | 2017-10-25 | — | — | EP | claimed |
| EP-0067066-B2 | Dry-developing resist composition | FUJITSU LTD (JP) | 1994-01-12 | — | — | EP | claimed |
| EP-0067066-B1 | DRY-DEVELOPING RESIST COMPOSITION | FUJITSU LIMITED (JP) | 1985-12-18 | — | — | EP | claimed |
| EP-0067067-B1 | DRY-DEVELOPING NEGATIVE RESIST COMPOSITION | FUJITSU LIMITED (JP) | 1985-09-25 | — | — | EP | claimed |
| US-4481279-A | Dry-developing resist composition | FUJITSU LIMITED (JP) | 1984-11-06 | — | — | US | claimed |
| US-4464455-A | Dry-developing negative resist composition | FUJITSU LIMITED (JP) | 1984-08-07 | — | — | US | claimed |
| EP-0067066-A2 | Dry-developing resist composition | FUJITSU LIMITED (JP) | 1982-12-15 | — | — | EP | claimed |
| EP-0067067-A2 | Dry-developing negative resist composition | FUJITSU LIMITED (JP) | 1982-12-15 | — | — | EP | claimed |
| JP-58108529-A | — | — | None | — | — | JP | disclosed |
| JP-63223058-A | — | — | None | — | — | JP | disclosed |
| EP-3234215-B1 | METHOD FOR PREPARING TRANSPARENT SHEET MATERIALS | FUJIFILM MFG EUROPE BV (NL) | 2019-08-07 | — | — | EP | disclosed |
| US-20180135167-A1 | Transparent Sheet Materials | FUJIFILM MANUFACTURING EUROPE B.V. (NL) | 2018-05-17 | — | — | US | disclosed |
| US-20170350006-A1 | Method for Preparing Transparent Sheet Materials | FUJIFILM MANUFACTURING EUROPE B.V. (NL) | 2017-12-07 | — | — | US | disclosed |
| EP-0067066-A2 | Dry-developing resist composition | FUJITSU LIMITED (JP) | 1982-12-15 | — | — | EP | disclosed |
| EP-0067067-A2 | Dry-developing negative resist composition | FUJITSU LIMITED (JP) | 1982-12-15 | — | — | EP | disclosed |
| US-4117057-A | SILICON CARBIDE SINTERED MOLDINGS AND A METHOD FOR PRODUCING THE SAME | THE RESEARCH INSTITUTE FOR IRON, STEEL AND OTHER METALS OF THE TOHOKU UNIVERSITY (JP) | 1978-09-26 | — | — | US | disclosed |
| US-4115427-A | BY REACTION OF A HYDROGEN SILANE AND AN AMINE | DYNAMIT NOBEL AKTIENGESELLSCHAFT (DE) | 1978-09-19 | — | — | US | disclosed |
| US-4100233-A | Silicon carbide fibers having a high strength and a method for producing said fibers | THE RESEARCH INSTITUTE FOR IRON, STEEL AND OTHER METALS OF THE TOHOKU UNIVERSITY (JP) | 1978-07-11 | — | — | US | disclosed |
| US-3965096-A | Ultraviolet and thermally stable polymer compositions | THE UNITED STATES OF AMERICA AS REPRESENTED BY THE ADMINISTRATOR OF THE UNITED STATES NATIONAL AERONAUTICS AND SPACE ADMINISTRATION (US) | 1976-06-22 | — | — | US | disclosed |