SCHEMBL7176961

SCHEMBL7176961

O=C(Oc1ccccc1)C(F)(C(=O)Oc1ccccc1)C(F)(F)C(F)(F)F

nearest known ligand 0.42

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
▸ ELANE P08246 4/20 0.42
▸ MAOB P27338 1/20 0.41
▸ ALDH1A1 P00352 1/20 0.41
▸ ATM Q13315 2/20 0.40
▸ L3MBTL1 Q9Y468 2/20 0.40
▸ TDP1 Q9NUW8 2/20 0.40
▸ HPGD P15428 1/20 0.39
▸ ALOX15 P16050 1/20 0.39
▸ HSD17B10 Q99714 1/20 0.39
▸ KDM4E B2RXH2 1/20 0.37
▸ MAPT P10636 1/20 0.37
▸ NSD2 O96028 1/20 0.37
▸ HDAC1 Q13547 1/20 0.37
▸ HDAC2 Q92769 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27845557 0.85 ELANE (0.42) ELANEMAOBALDH1A1ATML3MBTL1
SCHEMBL10187806 0.80 ELANE (0.44) ELANEMAOBALDH1A1ATML3MBTL1
SCHEMBL5054006 0.80 ELANE (0.44) ELANEMAOBALDH1A1ATML3MBTL1
SCHEMBL31257827 0.80 ELANE (0.44) ELANEMAOBALDH1A1ATML3MBTL1
SCHEMBL1255890 0.79 ELANE (0.47) ELANEMAOBALDH1A1ATML3MBTL1
SCHEMBL24142221 0.78 ALDH1A1 (0.46) ELANEMAOBALDH1A1ATML3MBTL1
SCHEMBL11924477 0.78 ELANE (0.43) ELANEMAOBALDH1A1ATML3MBTL1
SCHEMBL10946374 0.78 ELANE (0.46) ELANEMAOBALDH1A1ATML3MBTL1
SCHEMBL544447 0.78 MAOB (0.49) ELANEMAOBALDH1A1ATML3MBTL1
SCHEMBL8587544 0.77 ELANE (0.42) ELANEMAOBALDH1A1ATML3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119301526-A Composition for forming resist underlayer film 日产化学株式会社 2025-01-10 — — CN disclosed
CN-114868076-A Radical generating film forming composition, radical generating film, and method for producing horizontal electric field liquid crystal cell 日产化学株式会社 2022-08-05 — — CN disclosed
CN-114846397-A Method for manufacturing patterned liquid crystal display element 日产化学株式会社 2022-08-02 — — CN disclosed
CN-109153852-B Composition for forming release layer and release layer 日产化学株式会社 2022-07-05 — — CN disclosed
CN-109476913-B Composition for forming release layer 日产化学株式会社 2022-03-01 — — CN disclosed
US-6638631-B2 Stress relieving films comprising crosslinked mixtures of polysiloxanes, polyimides, polyamideimides copolymers and/or polyamides used as interfaces for semiconductors or printed circuits HITACHI, LTD. (JP) 2003-10-28 — — US disclosed
US-6638352-B2 For use in printed circuit boards; semiconductors HITACHI, LTD. (JP) 2003-10-28 — — US disclosed
US-20030047351-A1 Stress relieving films comprising crosslinked mixtures of polysiloxanes, polyimides, polyamideimides copolymers and/or polyamides used as interfaces for semiconductors or printed circuits SATSU YUICHI (JP) 2003-03-13 — — US disclosed
US-20030049193-A1 For use in printed circuit boards; semiconductors HITACHI,L TD (JP) 2003-03-13 — — US disclosed
US-3933713-A Method for preparing aromatic polyesters SOKOLOV LEV BORISOVICH 1976-01-20 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20030049193-A1 For use in printed circuit boards; semiconductors ASIC1, ASIC3, RIOK2 ELANE 1230/4885MAOB 4512/4885ALDH1A1 4510/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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