SCHEMBL718216

SCHEMBL718216

CN(CCC(=O)O)CCC(=O)O

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 2/20 0.56
MEN1 O00255 1/20 0.56
KDM4C Q9H3R0 10/20 0.50
KDM5A P29375 8/20 0.50
PHF8 Q9UPP1 5/20 0.50
KDM2A Q9Y2K7 3/20 0.50
KDM7A Q6ZMT4 1/20 0.50
KDM5C P41229 2/20 0.48
KDM5B Q9UGL1 1/20 0.48
EGLN1 Q9GZT9 2/20 0.47
LMNA P02545 1/20 0.47
ALKBH5 Q6P6C2 1/20 0.47
SUCNR1 Q9BXA5 1/20 0.47
KDM4A O75164 2/20 0.47
LTA4H P09960 1/20 0.46
FFAR3 O14843 1/20 0.45
HDAC3 O15379 1/20 0.45
HDAC1 Q13547 1/20 0.45
HDAC2 Q92769 1/20 0.45
HDAC8 Q9BY41 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methane SCHEMBL15776806 0.97 KMT2A (0.54) KMT2AMEN1KDM4CKDM5APHF8
SCHEMBL11239382 0.97 KMT2A (0.54) KMT2AMEN1KDM4CKDM5APHF8
SCHEMBL22815162 0.92 KDM4C (0.55) KMT2AMEN1KDM4CKDM5APHF8
SCHEMBL30635841 0.92 KDM4C (0.55) KMT2AMEN1KDM4CKDM5APHF8
SCHEMBL25262703 0.89 PHF8 (0.48) KMT2AMEN1KDM4CKDM5APHF8
SCHEMBL3952397 0.89 KMT2A (0.48) KMT2AMEN1KDM4CKDM5APHF8
SCHEMBL30698118 0.89 CA12 (0.55) KMT2AMEN1KDM4CKDM5APHF8
SCHEMBL3205134 0.89 KDM4C (0.61) KMT2AMEN1KDM4CKDM5APHF8
SCHEMBL2560704 0.87 KMT2A (0.46) KMT2AMEN1KDM4CKDM5APHF8
SCHEMBL3198287 0.86

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 172 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12427472-B2 Process for removal of acid gases from a fluid stream BASF SE (DE) 2025-09-30 US disclosed
CN-114173908-B Method for removing acid gases from fluid streams 巴斯夫欧洲公司 2025-04-01 CN disclosed
CN-119710705-A Molybdenum selective etching solution 湖北兴福电子材料股份有限公司 2025-03-28 CN disclosed
US-12138583-B2 Process for removal of acid gases from a fluid stream with a liquid absorbent comprising a piperazine ring BASF SE (DE) 2024-11-12 US disclosed
CN-113453784-B Method for removing acid gases from fluid streams 巴斯夫欧洲公司 2024-09-13 CN disclosed
US-20240042375-A1 PROCESS FOR REMOVAL OF ACID GASES FROM A FLUID STREAM BASF SE (DE) 2024-02-08 US disclosed
EP-4028148-B1 PROCESS FOR REMOVAL OF ACID GASES FROM A FLUID STREAM BASF SE (DE) 2023-11-15 EP disclosed
US-11814347-B2 Method for producing fluorinated compounds MERCK PATENT GMBH (DE) 2023-11-14 US disclosed
US-20230301948-A1 REDUCTION OF VIRAL INFECTIONS PHOXBIO LIMITED (IE) 2023-09-28 US disclosed
EP-3927450-B1 PROCESS FOR REMOVAL OF ACID GASES FROM A FLUID STREAM WITH A LIQUID ABSORBENT COMPRISING A PIPERAZINE RING BASF SE (DE) 2023-06-07 EP disclosed
EP-0201340-B1 TONER COMPOSITION AND METHOD FOR PREPARING THE SAME Kao Corporation (JP) 1992-04-01 EP disclosed
US-4749638-A CARBON BLACK, DISPERSANT, POLYMERIC BINDER OIL PHASE EMULSION POLYMERIZATION KAO CORPORATION (JP) 1988-06-07 US disclosed
EP-0039226-B1 RESIN COMPOSITION COMPRISING WATER-SOLUBLE POLYAMIDE AND VINYL ALCOHOL-BASED POLYMER UNITIKA LTD. (JP) 1985-10-02 EP disclosed
US-4365041-A LIGHT SENSITIVE, ADHESIVES UNITIKA LTD. (JP) 1982-12-21 US disclosed
EP-0039226-A2 Resin composition comprising water-soluble polyamide and vinyl alcohol-based polymer UNITIKA LTD. (JP) 1981-11-04 EP disclosed
US-4220704-A Water soluble photosensitive resin compositions comprising a polyamide or its salt TOYOBO CO., LTD. (JP) 1980-09-02 US disclosed
US-4188221-A REACTION PRODUCT OF (METH)ACRYLIC ACID AND A POLYGLYCIDYL ETHER OF A POLYOL, MOISTURE RESISTANCE TOYO BOSEKI KABUSHIKI KAISHA (JP) 1980-02-12 US disclosed
US-4187112-A Photosensitive plate containing nitrogen containing condensation type polyesters TOYOBO CO., LTD. (JP) 1980-02-05 US disclosed
US-4145222-A Water soluble photosensitive resin composition comprising a polyamide or its ammonium salt TOYOBO CO., LTD. (JP) 1979-03-20 US disclosed
US-4096123-A COPOLYMER CONTAINING A TERTIARY AMINO GROUP TOYO BOSEKI KABUSHIKI KAISHA (JA) 1978-06-20 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12427472-B2 Process for removal of acid gases from a fluid stream C5, C1S, C9 KMT2A 4539/4885MEN1 484/4885KDM4C 4177/4885
US-20240042375-A1 PROCESS FOR REMOVAL OF ACID GASES FROM A FLUID STREAM C5, C1S, C9 KMT2A 4539/4885MEN1 484/4885KDM4C 4177/4885
US-11814347-B2 Method for producing fluorinated compounds FDPS, PFAS, ARFGEF1 KMT2A 2422/4885MEN1 205/4885KDM4C 1392/4885
US-20230301948-A1 REDUCTION OF VIRAL INFECTIONS SARS1, IL36G, STING1 KMT2A 3585/4885MEN1 3775/4885KDM4C 3341/4885
US-12138583-B2 Process for removal of acid gases from a fluid stream with a liquid absorbent comprising a piperazine ring AVPR2, HRH2, SLC43A1 KMT2A 3480/4885MEN1 2204/4885KDM4C 3450/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.