SCHEMBL7189063

SCHEMBL7189063

CCCCCC(C)=O.O=C(O)OCCOC(=O)O

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
DGKA P23743 1/20 0.55
AKR1B1 P15121 1/20 0.48
GPR84 Q9NQS5 7/20 0.46
PPARG P37231 7/20 0.46
PPARD Q03181 7/20 0.46
PPARA Q07869 7/20 0.46
HDAC11 Q96DB2 5/20 0.46
TSHR P16473 4/20 0.46
PTPN1 P18031 3/20 0.46
ALDH1A1 P00352 3/20 0.46
TLR2 O60603 2/20 0.46
TDP1 Q9NUW8 2/20 0.46
FABP4 P15090 2/20 0.46
SLC22A6 Q4U2R8 1/20 0.46
SLC22A8 Q8TCC7 1/20 0.46
MEN1 O00255 1/20 0.46
ESR1 P03372 1/20 0.46
ALOX15 P16050 1/20 0.46
PDE4A P27815 1/20 0.46
KMT2A Q03164 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7192581 0.85 DGKA (0.42) DGKAAKR1B1GPR84PPARGPPARD
SCHEMBL11296855 0.82 ALDH1A1 (0.43) DGKATSHRALDH1A1
Hydrogen Peroxide SCHEMBL2361360 0.82 GPR84 (0.67) AKR1B1GPR84PPARGPPARDPPARA
Acetic Acid SCHEMBL5305838 0.82 AKR1B1 (0.62) AKR1B1GPR84PPARGPPARDPPARA
SCHEMBL29364 0.82
SCHEMBL1580170 0.82
SCHEMBL1324565 0.82 CES2 (0.63) AKR1B1GPR84PPARGPPARDPPARA
SCHEMBL8359115 0.82 DGKA (0.84) DGKAGPR84PPARGPPARDPPARA
2-Nonanone SCHEMBL8213625 0.80 GPR84 (0.64) AKR1B1GPR84PPARGPPARDPPARA
Methyl Nonyl Ketone SCHEMBL10344896 0.80 GPR84 (0.64) AKR1B1GPR84PPARGPPARDPPARA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6596458-B1 Used in an ultramicrolithography process or another photofabrication process for the production of very large scale integrated circuits or high capacity microchips FUJI PHOTO FILM CO., LTD. (JP) 2003-07-22 US disclosed
US-6506535-B1 A positive working photoresist composition for use in the production of semiconductor integrated circuit devices, mask for the production of integrated circuits, printed wiring boards, liquid crystal panels FUJI PHOTO FILM CO., LTD. (JP) 2003-01-14 US disclosed