SCHEMBL7211340

SCHEMBL7211340

c1cnc(SSc2cnccn2)cn1

nearest known ligand 0.45

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.45
HSP90AA1 P07900 1/20 0.43
EHMT2 Q96KQ7 1/20 0.42
EHMT1 Q9H9B1 1/20 0.42
APOBEC3G Q9HC16 1/20 0.42
KDM4E B2RXH2 1/20 0.37
NAPRT Q6XQN6 1/20 0.37
HCAR2 Q8TDS4 1/20 0.37
TSHR P16473 2/20 0.36
BAZ2B Q9UIF8 1/20 0.36
ADORA3 P0DMS8 1/20 0.36
MC4R P32245 1/20 0.36
ADRA1A P35348 1/20 0.36
MC3R P41968 1/20 0.36
NISCH Q9Y2I1 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31
POLB P06746 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22327277 0.85
SCHEMBL15516303 0.82 LMNA (0.45) LMNAHSP90AA1EHMT2EHMT1APOBEC3G
SCHEMBL9252715 0.78
SCHEMBL28006477 0.78
SCHEMBL1617422 0.78
SCHEMBL8083497 0.78
SCHEMBL28046675 0.76 LMNA (0.41) LMNAHSP90AA1KDM4ENAPRTHCAR2
SCHEMBL4156992 0.73 L3MBTL1 (0.40) LMNAHSP90AA1TSHRSMN1; SMN2
SCHEMBL4837646 0.72
SCHEMBL11611749 0.72

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11939691-B2 Tin or tin alloy electroplating bath, and electronic component having electrodeposit formed thereon using the plating bath ISHIHARA CHEMICAL CO., LTD. (JP) 2024-03-26 US disclosed
CN-104448700-A Resin composition AJINOMOTO KK 2015-03-25 CN disclosed
US-6607653-B1 Tin-copper alloy plating bath, tin-copper-bismuth alloy plating bath or tin-copper-silver alloy plating bath containing a soluble metal compound and a specific sulfur-containing compound. The plating bath of the alloy with DAIWA FINE CHEMICALS CO., LTD. (JP) 2003-08-19 US disclosed
US-3937718-A CARBOXYLIC ACIDS, ALCOHOLS, TERTIERY PHOSPHINES, DISULFIDES, SULFENIC ACID ESTER SANKYO COMPANY LIMITED (JA) 1976-02-10 US disclosed