Known targets — ChEMBL curated mechanism
ABCC9ABL1ACEACHEACVR1ADORA1ADORA2AADORA2BADORA3ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALOX5ATP4AATP4BBCRBTKCACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGCRBNCUL4ACXCR1CXCR2DDB1DDCDHFRDPP4DRD2DRD3DRD4EGFRERBB2ERBB4ESR1ESR2FDPSFKBP1AFLT1FLT3FLT4GARTGHSRGRIA1GRIA2GRIA3GRIA4GRIK1GRIK2GRIK3GRIK4GRIK5GRIN2AGSK3AGSK3BHDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IDH1IDH2IMPA1ITGA2BITGB3JAK1JAK2JAK3KCNJ11KCNK3KCNK9KDRKITMEN1METMMP1MMP13MMP7MMP8NANOD2NS5bODC1OPG057OPRD1OPRK1OPRM1PPARP1PARP2PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PKLRPPARDPPATPTGS1PTGS2RBX1ROCK1ROCK2RRM1RRM2RRM2BSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC10A2SLC5A2SLC6A2SLC6A3SLC6A4SLC9A3SYKTACR1THRATHRBTOP1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYK2TYMSVDRampCblablaT-3blaT-4blaT-5blaT-6blaUOE-1dacAdacBdacCfolAfolPftsIgyrAgyrBileSmecAmrcAmrcBmrdAparCparEpbp2pbp4pbpApbpFrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUthyAykgMykgO
The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Water SCHEMBL28423906 | 1.00 | — | — | |
| Bromide SCHEMBL149867 | 0.82 | — | — | |
| Water SCHEMBL8458365 | 0.67 | — | — | |
| Water SCHEMBL5712989 | 0.67 | — | — | |
| Water SCHEMBL840153 | 0.67 | — | — | |
| Water SCHEMBL25327325 | 0.67 | — | — | |
| Bromide SCHEMBL818578 | 0.67 | — | — | |
| Water SCHEMBL9321452 | 0.67 | — | — | |
| Water SCHEMBL1144696 | 0.67 | — | — | |
| Water SCHEMBL23533346 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8765028-B2 | Composition for oxide thin film, method of preparing the composition, method of forming the oxide thin film, and electronic device using the composition | INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY (KR) | 2014-07-01 | — | — | US | claimed |
| US-20120049181-A1 | COMPOSITION FOR OXIDE THIN FILM, METHOD OF PREPARING THE COMPOSITION, METHOD OF FORMING THE OXIDE THIN FILM, AND ELECTRONIC DEVICE USING THE COMPOSITION | INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY (KR) | 2012-03-01 | — | — | US | claimed |
| US-9558941-B2 | Method of forming oxide thin film and method of fabricating oxide thin film transistor using hydrogen peroxide | INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY (KR) | 2017-01-31 | — | — | US | disclosed |
| US-20150011045-A1 | METHOD OF FORMING OXIDE THIN FILM AND METHOD OF FABRICATING OXIDE THIN FILM TRANSISTOR USING HYDROGEN PEROXIDE | INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY (KR) | 2015-01-08 | — | — | US | disclosed |
| US-8765028-B2 | Composition for oxide thin film, method of preparing the composition, method of forming the oxide thin film, and electronic device using the composition | INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY (KR) | 2014-07-01 | — | — | US | disclosed |
| US-8742414-B2 | Composition for an oxide thin film, a preparation method of the composition, a method for forming an oxide thin film using the composition, an electronic device including the oxide thin film, and a semiconductor device including the oxide thin film | INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY (KR) | 2014-06-03 | — | — | US | disclosed |
| US-8536570-B2 | Composition for oxide thin film, preparation method of the composition, methods for forming the oxide thin film using the composition, and electronic device using the composition | INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY (KR) | 2013-09-17 | — | — | US | disclosed |
| US-20130161620-A1 | COMPOSITION FOR AN OXIDE THIN FILM, A PREPARATION METHOD OF THE COMPOSITION, A METHOD FOR FORMING AN OXIDE THIN FILM USING THE COMPOSITION, AN ELECTRONIC DEVICE INCLUDING THE OXIDE THIN FILM, AND A SEMICONDUCTOR DEVICE INCLUDING THE OXIDE THIN FILM | INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY (KR) | 2013-06-27 | — | — | US | disclosed |
| US-20120313096-A1 | OXIDE SEMICONDUCTOR COMPOSITION AND PREPARATION METHOD THEREOF, METHOD OF FORMING OXIDE SEMICONDUCTOR THIN FILM, METHOD OF FABRICATING ELECTRONIC DEVICE AND ELECTRONIC DEVICE FABRICATED THEREBY | Industry-Academics Cooperation Foundation, Yonsei University (KR) | 2012-12-13 | — | — | US | disclosed |
| US-20120168747-A1 | COMPOSITION FOR OXIDE THIN FILM, PREPARATION METHOD OF THE COMPOSITION, METHODS FOR FORMING THE OXIDE THIN FILM USING THE COMPOSITION, AND ELECTRONIC DEVICE USING THE COMPOSITION | INDUSTRY-ACADEMIC CORPORATION FOUNDATION, YONSEI UNIVERSITY (KR) | 2012-07-05 | — | — | US | disclosed |
| US-20120049181-A1 | COMPOSITION FOR OXIDE THIN FILM, METHOD OF PREPARING THE COMPOSITION, METHOD OF FORMING THE OXIDE THIN FILM, AND ELECTRONIC DEVICE USING THE COMPOSITION | INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY (KR) | 2012-03-01 | — | — | US | disclosed |