SCHEMBL7263447

SCHEMBL7263447

[N-]=[N+]=C1C=C(S(=O)(=O)Oc2ccc(-c3ccccc3)cc2)c2ccccc2C1=O

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA2 P00918 4/20 0.43
CA1 P00915 2/20 0.43
CA9 Q16790 2/20 0.43
PTPN1 P18031 5/20 0.38
CA12 O43570 3/20 0.37
MEN1 O00255 4/20 0.36
KMT2A Q03164 4/20 0.36
NPC1 O15118 2/20 0.36
RAB9A P51151 2/20 0.36
MAPT P10636 2/20 0.36
HTT P42858 2/20 0.36
NPSR1 Q6W5P4 2/20 0.36
APAF1 O14727 1/20 0.36
LMNA P02545 1/20 0.36
THRB P10828 1/20 0.36
XBP1 P17861 1/20 0.36
PTBP1 P26599 1/20 0.36
GALK1 P51570 1/20 0.36
BLM P54132 1/20 0.36
SMAD3 P84022 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13742305 0.92 CES2 (0.37) CA2CA1CA9PTPN1MEN1
SCHEMBL21820173 0.89 MEN1 (0.39) CA2CA1CA9PTPN1CA12
SCHEMBL11682194 0.84 CES2 (0.35) PTPN1MEN1KMT2ANPC1RAB9A
SCHEMBL13155965 0.84 ALDH1A1 (0.32) CA2CA1CA9MEN1KMT2A
SCHEMBL11973182 0.84 NR3C2 (0.35) CA2CA1CA9MEN1KMT2A
SCHEMBL5159716 0.82 TDP1 (0.31) PTPN1MAPTHTTNPSR1LMNA
SCHEMBL3156049 0.80 PSMB1 (0.32)
SCHEMBL11972851 0.80 RAB9A (0.47) CA2CA1PTPN1KMT2ANPC1
SCHEMBL5160369 0.80 PTPN1 (0.35) PTPN1MEN1KMT2ANPC1RAB9A
SCHEMBL11973238 0.80 CA2 (0.34) CA2CA1CA9PTPN1CA12

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6655009-B2 Dual mask process for making second pole piece layer of multiple write heads with high resolution narrow track width second pole tip INTERNATIONAL BUSINESS MACHINES CORPORATION 2003-12-02 US disclosed
US-20010027604-A1 Dual mask process for making second pole piece layer of multiple write heads with high resolution narrow track width second pole tip HUANG BIN (US) 2001-10-11 US disclosed
US-6286200-B1 Dual mask process for making second pole piece layer of write head with high resolution narrow track width second pole tip INTERNATIONAL BUSINESS MACHINES CORPORATION 2001-09-11 US disclosed