Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ERN1 | O75460 | 1/20 | 0.66 |
| ▸ | KMT2A | Q03164 | 7/20 | 0.59 |
| ▸ | MEN1 | O00255 | 6/20 | 0.59 |
| ▸ | MAPT | P10636 | 10/20 | 0.56 |
| ▸ | KDM4E | B2RXH2 | 7/20 | 0.54 |
| ▸ | L3MBTL1 | Q9Y468 | 5/20 | 0.54 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.54 |
| ▸ | GAA | P10253 | 3/20 | 0.54 |
| ▸ | HPGD | P15428 | 2/20 | 0.54 |
| ▸ | ATM | Q13315 | 1/20 | 0.54 |
| ▸ | RRM1 | P23921 | 1/20 | 0.54 |
| ▸ | PTPN22 | Q9Y2R2 | 1/20 | 0.54 |
| ▸ | THRB | P10828 | 3/20 | 0.53 |
| ▸ | POLB | P06746 | 3/20 | 0.53 |
| ▸ | MPI | P34949 | 2/20 | 0.53 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.53 |
| ▸ | TSHR | P16473 | 1/20 | 0.53 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.53 |
| ▸ | CRHBP | P24387 | 1/20 | 0.53 |
| ▸ | CRHR2 | Q13324 | 1/20 | 0.53 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30273052 | 1.00 | ERN1 (0.66) | ERN1KMT2AMEN1MAPTKDM4E | |
| Formamide SCHEMBL9731302 | 0.91 | ERN1 (0.66) | ERN1KMT2AMEN1MAPTKDM4E | |
| SCHEMBL7403263 | 0.84 | ERN1 (0.61) | ERN1KMT2AMEN1MAPTKDM4E | |
| SCHEMBL7915280 | 0.83 | ERN1 (0.70) | ERN1KMT2AMEN1MAPTKDM4E | |
| SCHEMBL7915285 | 0.83 | ERN1 (0.70) | ERN1KMT2AMEN1MAPTKDM4E | |
| SCHEMBL383717 | 0.82 | ERN1 (0.46) | ERN1KMT2AMEN1MAPTKDM4E | |
| SCHEMBL304032 | 0.79 | ERN1 (1.00) | ERN1KMT2AMEN1MAPTKDM4E | |
| SCHEMBL6411521 | 0.79 | ERN1 (0.66) | ERN1KMT2AMEN1MAPTKDM4E | |
| SCHEMBL1520145 | 0.79 | ERN1 (0.66) | ERN1KMT2AMEN1MAPTKDM4E | |
| SCHEMBL29358409 | 0.79 | ERN1 (1.00) | ERN1KMT2AMEN1MAPTKDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1053 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8945809-B2 | Fluorinated monomer, fluorinated polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-02-03 | — | — | US | claimed |
| US-8916331-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-12-23 | — | — | US | claimed |
| US-8647808-B2 | Fluorinated monomer, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-02-11 | — | — | US | claimed |
| CN-101308329-B | Coating compositions | ROHM & HAAS ELECT MAT | 2013-09-04 | — | — | CN | claimed |
| EP-2466379-B1 | Resist composition and patterning process | SHINETSU CHEMICAL CO (JP) | 2013-07-17 | — | — | EP | claimed |
| US-8420292-B2 | Polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-04-16 | — | — | US | claimed |
| EP-1998222-B1 | Coating compositions | ROHM & HAAS ELECT MAT (US) | 2013-03-20 | — | — | EP | claimed |
| US-8313886-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-11-20 | — | — | US | claimed |
| EP-2466379-A1 | Resist composition and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2012-06-20 | — | — | EP | claimed |
| US-20120148945-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-06-14 | — | — | US | claimed |
| US-20110151381-A1 | FLUORINATED MONOMER, FLUORINATED POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-06-23 | — | — | US | claimed |
| US-7923195-B2 | Positive resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-04-12 | — | — | US | claimed |
| US-7887991-B2 | Positive resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-02-15 | — | — | US | claimed |
| US-20100266957-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-10-21 | — | — | US | claimed |
| US-7655378-B2 | Negative resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-02-02 | — | — | US | claimed |
| US-20090202940-A1 | Positive resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-08-13 | — | — | US | claimed |
| US-20090202947-A1 | Positive resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO.,LTD (JP) | 2009-08-13 | — | — | US | claimed |
| US-20080020290-A1 | Negative resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-01-24 | — | — | US | claimed |
| US-20080020289-A1 | Novel polymer, positive resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-01-24 | — | — | US | claimed |
| US-6005151-A | Processs for preparing aromatic olefins using palladacycle catalysis | AVENTIS (DE) | 1999-12-21 | — | — | US | claimed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20110151381-A1 | FLUORINATED MONOMER, FLUORINATED POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | AFF1, H1-0, FRG1 | ERN1 2489/4885KMT2A 105/4885MEN1 415/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.