SCHEMBL732210

SCHEMBL732210

C=CCOC(=O)CCC1CN1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.46
ALDH1A1 P00352 6/20 0.43
GAA P10253 1/20 0.43
PKM P14618 1/20 0.39
SMN1; SMN2 Q16637 1/20 0.39
EPHX2 P34913 1/20 0.38
CASP1 P29466 1/20 0.37
TDP1 Q9NUW8 2/20 0.36
NPSR1 Q6W5P4 1/20 0.33
CYP3A4 P08684 1/20 0.33
KDM4E B2RXH2 2/20 0.32
HPGD P15428 2/20 0.32
HSD17B10 Q99714 2/20 0.32
MAPT P10636 2/20 0.32
CACNA1B Q00975 1/20 0.32
APBA1 Q02410 1/20 0.32
L3MBTL1 Q9Y468 1/20 0.32
MEN1 O00255 1/20 0.31
KMT2A Q03164 1/20 0.31
CA1 P00915 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8537018 0.79 DGKA (0.38) TDP1MAPT
SCHEMBL56403 0.76 TSHR (0.63) TSHRALDH1A1GAAPKMSMN1; SMN2
SCHEMBL6129181 0.76 ALDH1A1 (0.44) TSHRALDH1A1GAATDP1KDM4E
SCHEMBL8450337 0.75 TSHR (0.46) TSHRALDH1A1GAAPKMSMN1; SMN2
SCHEMBL5049686 0.75 CASP1 (0.45) TSHRALDH1A1GAAPKMSMN1; SMN2
SCHEMBL11247696 0.74 TSHR (0.40) TSHRALDH1A1GAAPKMSMN1; SMN2
SCHEMBL28545578 0.74 TSHR (0.61) TSHRALDH1A1GAAPKMSMN1; SMN2
Ammonia Solution, Strong SCHEMBL29207431 0.74 TSHR (0.61) TSHRALDH1A1GAAPKMSMN1; SMN2
SCHEMBL19629 0.74 CASP1 (0.60) TSHRALDH1A1GAACASP1TDP1
SCHEMBL463195 0.72 TSHR (0.70) TSHRALDH1A1GAAPKMSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20150099828-A1 LAMINATE AND METHOD FOR PRODUCING SAME MITSUBISHI RAYON CO., LTD. (JP) 2015-04-09 US disclosed
US-8137803-B2 Multilayer structure polymer and resin composition together with acrylic resin film material, acrylic resin laminate film, photocurable acrylic resin film or sheet, laminate film or sheet and laminate molding obtained by laminating thereof MITSUBISHI RAYON CO., LTD. (JP) 2012-03-20 US disclosed
US-20100273019-A1 MULTILAYER STRUCTURE POLYMER AND RESIN COMPOSITION TOGETHER WITH ACRYLIC RESIN FILM MATERIAL, ACRYLIC RESIN LAMINATE FILM, PHOTOCURABLE ACRYLIC RESIN FILM OR SHEET, LAMINATE FILM OR SHEET AND LAMINATE MOLDING OBTAINED BY LAMINATING THEREOF MITSUBISHI RAYON CO., LTD. (JP) 2010-10-28 US disclosed
US-7781062-B2 Multilayer structure polymer and resin composition together with acrylic resin film material, acrylic resin laminate film, photocurable acrylic resin film or sheet, laminate film or sheet and laminate molding obtained by laminating thereof MITSUBISHI RAYON CO., LTD. (JP) 2010-08-24 US disclosed
EP-1582538-B1 MULTILAYER STRUCTURE POLYMER AND RESIN COMPOSITION TOGETHER WITH ACRYLIC RESIN FILM MATERIAL, ACRYLIC RESIN LAMINATE FILM, PHOTOCURABLE ACRYLIC RESIN FILM OR SHEET, LAMINATE FILM OR SHEET AND LAMINATE MOLDING OBTAINED BY LAMINATING THEREOF MITSUBISHI RAYON CO (JP) 2010-05-05 EP disclosed
US-20060110617-A1 Multilayer structure polymer and resin composition together with acrylic resin film material, acrylic resin laminate film, photocurable acrylic resin film or sheet, laminate film or sheet and laminate molding obtained by laminating thereof MITSUBISHI RAYON CO., LTD. (JP) 2006-05-25 US disclosed
EP-1582538-A1 MULTILAYER STRUCTURE POLYMER AND RESIN COMPOSITION TOGETHER WITH ACRYLIC RESIN FILM MATERIAL, ACRYLIC RESIN LAMINATE FILM, PHOTOCURABLE ACRYLIC RESIN FILM OR SHEET, LAMINATE FILM OR SHEET AND LAMINATE MOLDING OBTAINED BY LAMINATING THEREOF Mitsubishi Rayon Co., Ltd. (JP) 2005-10-05 EP disclosed
EP-1170109-B1 Photocuring resin compositions, photocuring sheets using the same, production thereof and process of production of a molded article using the same sheets MITSUBISHI RAYON CO (JP) 2005-03-30 EP disclosed
US-6646022-B2 Thermoplastic resin having a radical polymerizing unsaturated group at its side chain and a photopolymerization initiator and not comprising an additional crosslinking compound MITSUBISHI RAYON CO., LTD. (JP) 2003-11-11 US disclosed
US-20020032250-A1 Photocuring resin compositions, photocuring sheets and molded article using the same, and processes of production thereof MITSUBISHI RAYON CO., LTD. (JP) 2002-03-14 US disclosed
EP-1170109-A1 Photocuring resin compositions, photocuring sheets and molded article using the same and processes of production thereof Mitsubishi Rayon Co., Ltd. (JP) 2002-01-09 EP disclosed
EP-0743192-B1 Print with hologram and process for producing the same DAINIPPON PRINTING CO LTD (JP) 2001-11-28 EP disclosed
US-6264782-B1 Print with hologram and process for producing the same DAI NIPPON PRINTING CO., LTD. (JP) 2001-07-24 US disclosed
EP-0616906-B1 Process for the preparation of decorative sheet DAINIPPON PRINTING CO LTD (JP) 1998-08-12 EP disclosed
EP-0743192-A1 Print with hologram and process for producing the same DAI NIPPON PRINTING CO., LTD. (JP) 1996-11-20 EP disclosed
EP-0411152-B1 DECORATIVE SHEET AND METHOD OF PRODUCTION THEREOF DAINIPPON PRINTING CO LTD (JP) 1994-12-28 EP disclosed
EP-0616906-A2 Process for the preparation of decorative sheet DAI NIPPON INSATSU KABUSHIKI KAISHA (JP) 1994-09-28 EP disclosed
US-5296340-A Decorative sheet and process for preparation thereof DAI NIPPON INSATSU KABUSHIKI KAISHA (JP) 1994-03-22 US disclosed
EP-0411152-A1 DECORATIVE SHEET AND METHOD OF PRODUCTION THEREOF DAI NIPPON INSATSU KABUSHIKI KAISHA (JP) 1991-02-06 EP disclosed