SCHEMBL750651

SCHEMBL750651

CCC(C)(C)C(=O)Nc1ccccc1

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ RIPK1 Q13546 4/20 0.59
▸ PDK1 Q15118 2/20 0.56
▸ PDK2 Q15119 2/20 0.56
▸ PDK3 Q15120 2/20 0.56
▸ PDK4 Q16654 2/20 0.56
▸ MMP8 P22894 1/20 0.53
▸ MEN1 O00255 2/20 0.51
▸ KMT2A Q03164 2/20 0.51
▸ TDP1 Q9NUW8 1/20 0.51
▸ LMNA P02545 1/20 0.51
▸ POLB P06746 1/20 0.51
▸ L3MBTL1 Q9Y468 2/20 0.50
▸ RAB9A P51151 2/20 0.50
▸ NPC1 O15118 1/20 0.50
▸ NAPRT Q6XQN6 1/20 0.50
▸ HSD17B10 Q99714 1/20 0.50
▸ HDAC3 O15379 1/20 0.49
▸ HDAC4 P56524 1/20 0.49
▸ HDAC1 Q13547 1/20 0.49
▸ HDAC7 Q8WUI4 1/20 0.49

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19501813 0.93 NPC1 (0.57) RIPK1PDK1PDK2PDK3PDK4
SCHEMBL28131849 0.92 RIPK1 (0.51) RIPK1PDK1PDK2PDK3PDK4
SCHEMBL12226380 0.90 L3MBTL1 (0.61) RIPK1MEN1KMT2ATDP1LMNA
SCHEMBL12863539 0.90 S1PR4 (0.54) RIPK1MEN1KMT2ATDP1L3MBTL1
SCHEMBL19501812 0.89 KMT2A (0.54) RIPK1MEN1KMT2ALMNAPOLB
SCHEMBL12205982 0.87 RIPK1 (0.59) RIPK1MMP8MEN1KMT2AHDAC3
SCHEMBL14134918 0.87 POLB (0.54) RIPK1PDK1PDK2PDK3PDK4
SCHEMBL12037517 0.87 MEN1 (0.50) RIPK1PDK1PDK2PDK3PDK4
SCHEMBL12863546 0.87 HDAC1 (0.55) RIPK1PDK1PDK2PDK3PDK4
SCHEMBL19501566 0.85 LMNA (0.54) RIPK1MEN1KMT2ATDP1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 184 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107001995-A Cleaning and/or treatment compositions comprising malodor reduction composition 宝洁公司 2017-08-01 — — CN claimed
WO-2011084492-A1 TRASH BAG WITH MALODOR CONTROL THE GLAD PRODUCTS COMPANY (US) 2011-07-14 — — WO claimed
US-12044968-B2 Protective film-forming composition having acetal structure and amide structure NISSAN CHEMICAL CORPORATION (JP) 2024-07-23 — — US disclosed
US-12044968-B2 Protective film-forming composition having acetal structure and amide structure NISSAN CHEMICAL CORPORATION (JP) 2024-07-23 — — US disclosed
US-12032288-B2 Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device FUJIFILM CORPORATION (JP) 2024-07-09 — — US disclosed
US-20240219831-A1 PATTERN FORMING METHOD AND METHOD FOR PRODUCING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2024-07-04 — — US disclosed
WO-2024064884-A2 SELECTION OF CHEMICAL SYNTHESIS PROCESSES THE REGENTS OF THE UNIVERSITY OF MICHIGAN (US) 2024-03-28 — — WO disclosed
US-11914300-B2 Manufacturing method of semiconductor chip, and kit FUJIFILM CORPORATION (JP) 2024-02-27 — — US disclosed
CN-117567350-A Preparation method of indolone compound 暨南大学 2024-02-20 — — CN disclosed
CN-117545827-A Perfume composition 花王株式会社 2024-02-09 — — CN disclosed
US-20240027908-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2024-01-25 — — US disclosed
US-7279539-B2 Alkali-soluble polymer and polymerizable composition thereof FUJIFILM CORPORATION (JP) 2007-10-09 — — US disclosed
US-20070202439-A1 Polymerizable composition and planographic printing plate precursor FUJIFILM CORPORATION 2007-08-30 — — US disclosed
US-20070148593-A1 Polymerizable composition and planographic printing plate precursor using the same FUJIFILM CORPORATION 2007-06-28 — — US disclosed
US-7179582-B2 Radical polymerizable composition and lithographic printing plate precursor using the same FUJI PHOTO FILM CO., LTD. (JP) 2007-02-20 — — US disclosed
CN-1288497-C Photo sensitive composition and negative lithographic printing plate FUJI PHOTO FILM CO LTD (JP) 2006-12-06 — — CN disclosed
EP-0954558-B1 FUEL COMPOSITIONS EXHIBITING IMPROVED FUEL STABILITY ORR WILLIAM C (US) 2006-06-14 — — EP disclosed
US-20050044778-A1 Fuel compositions employing catalyst combustion structure OCTANE INTERNATIONAL, LTD. 2005-03-03 — — US disclosed
US-20040237384-A1 Fuel compositions exhibiting improved fuel stability OCTANE INTERNATIONAL, LTD. 2004-12-02 — — US disclosed
US-6652608-B1 Fuel compositions exhibiting improved fuel stability OCTANE INTERNATIONAL, LTD. 2003-11-25 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12032288-B2 Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device RER1, COL1A1, RAD51 RIPK1 3733/4885PDK1 4881/4885PDK2 4697/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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