Edetic Acid

Edetic Acid

SCHEMBL7525860

N.O.O.O=C(O)CN(CCN(CC(=O)O)CC(=O)O)CC(=O)O.[Fe]

nearest known ligand 0.82

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ABCC9ABL1ACEACHEACVR1ADORA1ADORA2AADORA2BADORA3ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALOX5ATP4AATP4BBCRBTKCACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGCRBNCUL4ACXCR1CXCR2DDB1DDCDHFRDPP4DRD2DRD3DRD4EGFRERBB2ERBB4ESR1ESR2FDPSFKBP1AFLT1FLT3FLT4GARTGHSRGRIA1GRIA2GRIA3GRIA4GRIK1GRIK2GRIK3GRIK4GRIK5GRIN2AGSK3AGSK3BHDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IDH1IDH2IMPA1ITGA2BITGB3JAK1JAK2JAK3KCNJ11KCNK3KCNK9KDRKITMEN1METMMP1MMP13MMP7MMP8NANOD2NS5bODC1OPG057OPRD1OPRK1OPRM1PPARP1PARP2PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PKLRPPARDPPATPTGS1PTGS2RBX1ROCK1ROCK2RRM1RRM2RRM2BSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC10A2SLC5A2SLC6A2SLC6A3SLC6A4SLC9A3SYKTACR1THRATHRBTOP1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYK2TYMSVDRampCblablaT-3blaT-4blaT-5blaT-6blaUOE-1dacAdacBdacCfolAfolPftsIgyrAgyrBileSmecAmrcAmrcBmrdAparCparEpbp2pbp4pbpApbpFrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUthyAykgMykgO

The experimentally established mechanism targets of Edetic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ACE known ✓ P12821 1/20 0.82
CHRM2 known ✓ P08172 1/20 0.78
ADRA2A known ✓ P08913 1/20 0.78
SLC6A2 known ✓ P23975 1/20 0.78
SLC6A4 known ✓ P31645 1/20 0.78
ADRA1A known ✓ P35348 1/20 0.78
DRD3 known ✓ P35462 1/20 0.78
SLC6A3 known ✓ Q01959 1/20 0.78
TDP1 Q9NUW8 2/20 0.82
EYA2 O00167 1/20 0.82
APP P05067 1/20 0.82
BLM P54132 2/20 0.78
PMP22 Q01453 2/20 0.78
KDM4E B2RXH2 2/20 0.78
ALOX15 P16050 2/20 0.78
TSHR P16473 2/20 0.78
LMNA P02545 1/20 0.78
DRD1 P21728 1/20 0.78
CYP2C19 P33261 1/20 0.78
HRH3 Q9Y5N1 1/20 0.78

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Edetic Acid SCHEMBL9796993 1.00 TDP1 (0.82) TDP1EYA2APPACEBLM
Edetic Acid SCHEMBL8044889 1.00 TDP1 (0.82) TDP1EYA2APPACEBLM
Edetic Acid SCHEMBL9509453 1.00 TDP1 (0.82) TDP1EYA2APPACEBLM
Edetic Acid SCHEMBL8658392 1.00 TDP1 (0.82) TDP1EYA2APPACEBLM
Pentetic Acid SCHEMBL10702640 0.97 TDP1 (0.83) TDP1EYA2APPACEBLM
Pentetic Acid SCHEMBL6242444 0.97 TDP1 (0.83) TDP1EYA2APPACEBLM
Edetic Acid SCHEMBL5718897 0.97 TDP1 (0.88) TDP1EYA2APPACEBLM
Edetic Acid SCHEMBL3973748 0.97 TDP1 (0.88) TDP1EYA2APPACEBLM
Edetic Acid SCHEMBL275772 0.97 TDP1 (0.88) TDP1EYA2APPACEBLM
Edetic Acid SCHEMBL8361892 0.97 TDP1 (0.88) TDP1EYA2APPACEBLM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 46 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023085007-A1 CHEMICAL-MECHANICAL POLISHING COMPOSITION AND POLISHING METHOD JSR株式会社 2023-05-19 WO disclosed
WO-2023085008-A1 CHEMICAL-MECHANICAL POLISHING COMPOSITION, PRODUCTION METHOD THEREFOR, AND POLISHING METHOD JSR株式会社 2023-05-19 WO disclosed
WO-2023085009-A1 CHEMICAL-MECHANICAL POLISHING COMPOSITION AND POLISHING METHOD JSR株式会社 2023-05-19 WO disclosed
CN-1223897-C Photosensitive silver halide material for photographing FUJI PHOTO FILM CO LTD (JP) 2005-10-19 CN disclosed
CN-1210616-C Silver halide color photographic light-sensitive material FUJI PHOTO FILM CO LTD (JP) 2005-07-13 CN disclosed
EP-0851287-B1 Aminopolycarboxylic acid-series chelating agent, heavy metal compound thereof, photographic additive, and processing method FUJI PHOTO FILM CO LTD (JP) 2002-03-27 EP disclosed
EP-0601836-B1 Silver halide light sensitive color photographic material KONISHIROKU PHOTO IND (JP) 2000-10-04 EP disclosed
CN-1199181-A Silver halide color photographic light-sensitive material FUJI PHOTO FILM CO LTD (JP) 1998-11-18 CN disclosed
EP-0851287-A2 Aminopolycarboxylic acid-series chelating agent, heavy metal compound thereof, photographic additive, and processing method Fuji Photo Film Co., Ltd. (JP) 1998-07-01 EP disclosed
EP-0429240-B1 Silver halide photographic material KONISHIROKU PHOTO IND (JP) 1996-03-27 EP disclosed
EP-0292282-A1 Method of treating photographic process waste liquor through concentration by evaporation KONICA CORPORATION (JP) 1988-11-23 EP disclosed
US-4778746-A COLOR DEVELOPING, FIXING, STABILIZATION WITHOUT WASHING KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1988-10-18 US disclosed
EP-0284341-A2 Method for treating photographic process waste liquor throough concentration by evaporation KONICA CORPORATION (JP) 1988-09-28 EP disclosed
EP-0272883-A2 Method of concentrating photographic process waste liquor by evaporation KONICA CORPORATION (JP) 1988-06-29 EP disclosed
EP-0270358-A2 Method of concentrating photographic process waste liquor by evaporation KONICA CORPORATION (JP) 1988-06-08 EP disclosed
EP-0255784-A2 Method of forming dye image having superior rapid processing performance KONICA CORPORATION (JP) 1988-02-10 EP disclosed
EP-0255783-A2 Light-sensitive silver halide photographic material feasible for rapid processing KONICA CORPORATION (JP) 1988-02-10 EP disclosed
EP-0255292-A2 Processing solution of light-sensitive silver halide color photographic material and processing method of the same KONICA CORPORATION (JP) 1988-02-03 EP disclosed
US-4687731-A STORAGE STABILITY KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1987-08-18 US disclosed
US-4563405-A NONSTAINING, STORAGE STABLE KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1986-01-07 US disclosed