SCHEMBL7536673

SCHEMBL7536673

O=C(C=CC(=O)OC1C2CC3CC(C2)CC1C3)OC1C2CC3CC(C2)CC1C3

nearest known ligand 0.48

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 12/20 0.48
ATM Q13315 1/20 0.46
EPHX1 P07099 1/20 0.46
EPHX2 P34913 1/20 0.41
FKBP1A P62942 1/20 0.35
CYP2C9 P11712 2/20 0.35
ALDH1A1 P00352 1/20 0.33
LMNA P02545 1/20 0.33
THRB P10828 1/20 0.33
HTT P42858 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
HSD17B10 Q99714 1/20 0.32
L3MBTL1 Q9Y468 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14112065 0.92 ATM (0.57) HSD11B1ATMEPHX1EPHX2FKBP1A
SCHEMBL27533435 0.92 ATM (0.57) HSD11B1ATMEPHX1EPHX2FKBP1A
SCHEMBL1337904 0.88 HSD11B1 (0.43) HSD11B1ATMEPHX1EPHX2FKBP1A
SCHEMBL27869297 0.88 HSD11B1 (0.43) HSD11B1ATMEPHX1EPHX2FKBP1A
SCHEMBL7538699 0.87 HCAR2 (0.48) HSD11B1ATMEPHX1EPHX2FKBP1A
SCHEMBL27985247 0.84 HSD11B1 (0.47) HSD11B1ATMEPHX1EPHX2FKBP1A
SCHEMBL9101852 0.83 HSD11B1 (0.40) HSD11B1ATMEPHX1EPHX2FKBP1A
SCHEMBL333419 0.83 HSD11B1 (0.46) HSD11B1ATMEPHX1EPHX2FKBP1A
SCHEMBL1033337 0.76 HSD11B1 (0.52) HSD11B1EPHX1EPHX2FKBP1ACYP2C9
SCHEMBL5350579 0.76 HSD11B1 (0.52) HSD11B1EPHX1EPHX2FKBP1ACYP2C9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20020190818-A1 High frequency band pass filter TDK CORPORATION (JP) 2002-12-19 US disclosed
EP-0788118-B1 Low dielectric polymer and film, substrate and electronic part using the same TDK CORP (JP) 2002-11-20 EP disclosed
US-5914283-A FUMARIC ACID DIESTER MONOMER-CONTAINING POLYMER FILM; HEAT RESISTANCE, WEATHER RESISTANCE TDK CORPORATION (JP) 1999-06-22 US disclosed
EP-0788118-A1 Low dielectric polymer and film, substrate and electronic part using the same TDK Corporation (JP) 1997-08-06 EP disclosed