Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTR1A | P08908 | 3/20 | 0.48 |
| ▸ | HTR3A | P46098 | 3/20 | 0.48 |
| ▸ | IDO1 | P14902 | 1/20 | 0.44 |
| ▸ | MEN1 | O00255 | 1/20 | 0.44 |
| ▸ | POLB | P06746 | 1/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.44 |
| ▸ | PTGIR | P43119 | 2/20 | 0.43 |
| ▸ | CA1 | P00915 | 2/20 | 0.42 |
| ▸ | CA2 | P00918 | 2/20 | 0.42 |
| ▸ | CA7 | P43166 | 2/20 | 0.42 |
| ▸ | CA9 | Q16790 | 2/20 | 0.42 |
| ▸ | CA12 | O43570 | 1/20 | 0.42 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.42 |
| ▸ | ACHE | P22303 | 1/20 | 0.41 |
| ▸ | HAO1 | Q9UJM8 | 1/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.40 |
| ▸ | MMP2 | P08253 | 2/20 | 0.40 |
| ▸ | MMP9 | P14780 | 2/20 | 0.40 |
| ▸ | MMP12 | P39900 | 2/20 | 0.40 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10756090 | 0.88 | ALDH1A1 (0.44) | HTR3AMEN1POLBKMT2ACA1 | |
| SCHEMBL23999244 | 0.83 | ALDH1A1 (0.50) | HTR1AHTR3AIDO1MEN1POLB | |
| SCHEMBL20591216 | 0.81 | MEN1 (0.55) | HTR1AHTR3AMEN1POLBKMT2A | |
| SCHEMBL12313604 | 0.79 | ALDH1A1 (0.44) | HTR3AMEN1POLBKMT2ACA1 | |
| SCHEMBL5316082 | 0.78 | HTR1A (0.52) | HTR1AHTR3AIDO1MEN1POLB | |
| SCHEMBL8736422 | 0.78 | ACHE (0.48) | HTR1AHTR3AIDO1MEN1POLB | |
| SCHEMBL3640883 | 0.78 | ALDH1A1 (0.61) | HTR3AMEN1POLBKMT2ACA1 | |
| SCHEMBL482369 | 0.76 | CA1 (0.65) | MEN1POLBKMT2APTGIRCA1 | |
| SCHEMBL30548759 | 0.75 | MEN1 (0.62) | HTR1AHTR3AIDO1MEN1POLB | |
| SCHEMBL3547996 | 0.75 | HTR1A (0.53) | HTR1AHTR3AIDO1MEN1POLB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0729069-B1 | Benzanthrone polymerization gate in photopolymerizable composition | KODAK POLYCHROME GRAPHICS CO (US) | 2002-05-15 | — | — | EP | disclosed |
| EP-0859283-B1 | 4-(Alkoxyhydroxy)styryl triazine photoinitiators | KODAK POLYCHROME GRAPHICS CO (US) | 2000-11-02 | — | — | EP | disclosed |
| US-5900345-A | Surfactant in precoat for lithographic plates | KODAK POLYCHROME GRAPHICS, LLC (US) | 1999-05-04 | — | — | US | disclosed |
| EP-0575802-B1 | Photopolymeric printing plates | KODAK POLYCHROME GRAPHICS CO (US) | 1999-02-24 | — | — | EP | disclosed |
| US-5837586-A | LITHOGRAPHIC PRINTING PLATES RESISTANT TO SURFACE BLOOMING | KODAK POLYCHROME GRAPHICS COMPANY, LTD. (US) | 1998-11-17 | — | — | US | disclosed |
| EP-0859283-A1 | 4-(Alkoxyhydroxy)styryl triazine photoinitiators | INTERNATIONAL PAPER COMPANY (US) | 1998-08-19 | — | — | EP | disclosed |
| EP-0729069-A1 | Benzanthrone polymerization gate in photopolymerizable composition | INTERNATIONAL PAPER COMPANY (US) | 1996-08-28 | — | — | EP | disclosed |
| US-5543262-A | PHOTOLITHOGRAPHY USING A BENZANTHRONE TO INHIBIT POLYMERIZATION BELOW A THRESHOLD AMOUNT OF ACTINIC RADIATION BUT PERMITS IT WHEN ABOVE; ANTISOILANTS; BACKGROUND; QUALITY REPRODUCITN; ANTIHALATION AGENTS; HOTSPOTS | INTERNATIONAL PAPER COMPANY (US) | 1996-08-06 | — | — | US | disclosed |
| US-5286594-A | Nontacky, mar resistant, easily developed durable plates | INTERNATIONAL PAPER COMPANY (US) | 1994-02-15 | — | — | US | disclosed |
| EP-0575802-A1 | Photopolymeric printing plates | INTERNATIONAL PAPER COMPANY (US) | 1993-12-29 | — | — | EP | disclosed |
| EP-0212482-B1 | PROCESS FOR OBTAINING NEGATIVE IMAGES FROM POSITIVE PHOTORESISTS | HOECHST CELANESE CORPORATION (US) | 1989-04-19 | — | — | EP | disclosed |
| EP-0106156-B1 | LIGHT-SENSITIVE COMPOSITION | HOECHST CELANESE CORPORATION (US) | 1988-12-21 | — | — | EP | disclosed |
| EP-0212482-A2 | Process for obtaining negative images from positive photoresists | HOECHST CELANESE CORPORATION (US) | 1987-03-04 | — | — | EP | disclosed |
| EP-0061150-B1 | LIGHT-SENSITIVE POLYCONDENSATION PRODUCT, PROCESS FOR ITS PREPARATION AND LIGHT-SENSITIVE RECORDING MATERIAL CONTAINING THE SAME | AMERICAN HOECHST CORPORATION (US) | 1986-10-15 | — | — | EP | disclosed |
| EP-0089509-B1 | METHOD FOR THE ELECTROPHORETIC DEPOSITION OF RADIATION-SENSITIVE COATINGS ON METALLIC BASES, AND USE OF THE COATED MATERIAL AS AN OFFSET PRINTING PLATE | AMERICAN HOECHST CORPORATION (US) | 1986-05-28 | — | — | EP | disclosed |
| EP-0106156-A2 | Light-sensitive composition | HOECHST CELANESE CORPORATION (US) | 1984-04-25 | — | — | EP | disclosed |
| EP-0089509-A1 | Method for the electrophoretic deposition of radiation-sensitive coatings on metallic bases, and use of the coated material as an offset printing plate | AMERICAN HOECHST CORPORATION (US) | 1983-09-28 | — | — | EP | disclosed |
| EP-0061150-A1 | Light-sensitive polycondensation product, process for its preparation and light-sensitive recording material containing the same | AMERICAN HOECHST CORPORATION (US) | 1982-09-29 | — | — | EP | disclosed |
| US-4021243-A | Diazo light-sensitive copying composition and process of using in the manufacture of screen printing stencils | HOECHST AKTIENGESELLSCHAFT (DT) | 1977-05-03 | — | — | US | disclosed |