SCHEMBL7545244

SCHEMBL7545244

O=Cc1ccc(Oc2ccc(O)cc2)cc1

nearest known ligand 0.73

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
ALDH5A1 P51649 1/20 0.73
ABAT P80404 1/20 0.73
KMT2A Q03164 2/20 0.64
MEN1 O00255 1/20 0.64
ESR1 P03372 1/20 0.64
ESR2 Q92731 1/20 0.64
PARP10 Q53GL7 2/20 0.60
PARP3 Q9Y6F1 1/20 0.60
LTA4H P09960 3/20 0.54
NR1H2 P55055 1/20 0.54
BAX Q07812 1/20 0.54
ALDH1A1 P00352 3/20 0.52
CYP2A6 P11509 1/20 0.52
KDM4E B2RXH2 3/20 0.52
LMNA P02545 1/20 0.52
SMN1; SMN2 Q16637 1/20 0.52
ALDH1A3 P47895 1/20 0.47
STS P08842 1/20 0.45
MAPT P10636 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
4-Hydroxybenzaldehyde SCHEMBL28577371 1.00 ALDH5A1 (0.73) ALDH5A1ABATKMT2AMEN1ESR1
SCHEMBL346354 1.00 ALDH5A1 (0.73) ALDH5A1ABATKMT2AMEN1ESR1
SCHEMBL6928612 0.90 ALDH5A1 (0.59) ALDH5A1ABATKMT2AMEN1ESR1
Phenol SCHEMBL17941265 0.90 LTA4H (0.59) ALDH5A1ABATKMT2AMEN1ESR1
SCHEMBL5050902 0.88 PARP10 (0.65) ALDH5A1ABATKMT2APARP10PARP3
SCHEMBL1663469 0.88 PARP10 (0.65) ALDH5A1ABATKMT2APARP10PARP3
Phenol SCHEMBL17941267 0.88 LTA4H (0.63) ALDH5A1ABATKMT2AMEN1ESR1
SCHEMBL22065383 0.86 ALDH5A1 (0.59) ALDH5A1ABATKMT2AMEN1ESR1
SCHEMBL22064844 0.86 ALDH5A1 (0.59) ALDH5A1ABATKMT2AMEN1ESR1
4-Hydroxybenzaldehyde SCHEMBL37193 0.85

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116444978-A Polyurethane rigid foam composition and preparation method and application thereof 万华化学集团股份有限公司 2023-07-18 CN claimed
CN-117143047-B High-refraction difunctional optical resin monomer and preparation method thereof 江苏集萃光敏电子材料研究所有限公司 2025-01-28 CN disclosed
CN-117143047-A High-refraction difunctional optical resin monomer and preparation method thereof 江苏集萃光敏电子材料研究所有限公司 2023-12-01 CN disclosed
CN-116444978-A Polyurethane rigid foam composition and preparation method and application thereof 万华化学集团股份有限公司 2023-07-18 CN disclosed
US-10501413-B2 Inhibitors of the Notch transcriptional activation complex and methods for use of the same UNIVERSITY OF MIAMI (US) 2019-12-10 US disclosed
US-10501413-B2 Inhibitors of the Notch transcriptional activation complex and methods for use of the same UNIVERSITY OF MIAMI (US) 2019-12-10 US disclosed
US-20180086700-A1 INHIBITORS OF THE NOTCH TRANSCRIPTIONAL ACTIVATION COMPLEX AND METHODS FOR USE OF THE SAME NATIONAL INSTITUTES OF HEALTH (NIH), U.S. DEPT. OF HEALTH AND HUMAN SERVICES (DHHS), U.S. GOVERNMENT 2018-03-29 US disclosed
US-20180086700-A1 INHIBITORS OF THE NOTCH TRANSCRIPTIONAL ACTIVATION COMPLEX AND METHODS FOR USE OF THE SAME NATIONAL INSTITUTES OF HEALTH (NIH), U.S. DEPT. OF HEALTH AND HUMAN SERVICES (DHHS), U.S. GOVERNMENT 2018-03-29 US disclosed
US-20180086700-A1 INHIBITORS OF THE NOTCH TRANSCRIPTIONAL ACTIVATION COMPLEX AND METHODS FOR USE OF THE SAME NATIONAL INSTITUTES OF HEALTH (NIH), U.S. DEPT. OF HEALTH AND HUMAN SERVICES (DHHS), U.S. GOVERNMENT 2018-03-29 US disclosed
EP-3282846-A1 INHIBITORS OF THE NOTCH TRANSCRIPTIONAL ACTIVATION COMPLEX AND METHODS FOR USE OF THE SAME University of Miami (US) 2018-02-21 EP disclosed
US-20140335692-A1 METHOD FOR FORMING A RESIST UNDER LAYER FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-11-13 US disclosed
US-20140335692-A1 METHOD FOR FORMING A RESIST UNDER LAYER FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-11-13 US disclosed
US-8853031-B2 Resist underlayer film composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-10-07 US disclosed
US-8853031-B2 Resist underlayer film composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-10-07 US disclosed
US-20130171569-A1 RESIST UNDERLAYER FILM COMPOSITION, METHOD FOR PRODUCING POLYMER FOR RESIST UNDERLAYER FILM, AND PATTERNING PROCESS USING THE RESIST UNDERLAYER FILM COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-07-04 US disclosed
US-20130171569-A1 RESIST UNDERLAYER FILM COMPOSITION, METHOD FOR PRODUCING POLYMER FOR RESIST UNDERLAYER FILM, AND PATTERNING PROCESS USING THE RESIST UNDERLAYER FILM COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-07-04 US disclosed
US-20120184103-A1 RESIST UNDERLAYER FILM COMPOSITION AND PATTERNING PROCESS USING THE SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-07-19 US disclosed
US-20120184103-A1 RESIST UNDERLAYER FILM COMPOSITION AND PATTERNING PROCESS USING THE SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-07-19 US disclosed
US-20020094993-A1 Compositions for repelling crawling insects S.C. JOHNSON & SON, INC. 2002-07-18 US disclosed
US-4950809-A REACTING ARYL KETONE OR ALDEHYDE WITH PERACETIC ACID RHONE-POULENC CHIMIE (FR) 1990-08-21 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-10501413-B2 Inhibitors of the Notch transcriptional activation complex and methods for use of the same NOTCH1, CBFB, HES1 ALDH5A1 3599/4885ABAT 3668/4885KMT2A 470/4885
US-20020094993-A1 Compositions for repelling crawling insects ACHE, DDT, GAP43 ALDH5A1 1945/4885ABAT 438/4885KMT2A 3439/4885
US-20180086700-A1 INHIBITORS OF THE NOTCH TRANSCRIPTIONAL ACTIVATION COMPLEX AND METHODS FOR USE OF THE SAME NOTCH1, CBFB, HES1 ALDH5A1 3599/4885ABAT 3668/4885KMT2A 470/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.