SCHEMBL75485

SCHEMBL75485

C=C(C)C(=O)OCC1(CO)CC2CCC1C2

nearest known ligand 0.36

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.36
TSHR P16473 3/20 0.33
THRB P10828 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1311078 0.93 ALDH1A1 (0.38) ALDH1A1TSHRTHRB
SCHEMBL154553 0.80 THRB (0.35) ALDH1A1TSHRTHRB
SCHEMBL7780069 0.80 ALDH1A1 (0.37) ALDH1A1TSHRTHRB
SCHEMBL75649 0.74 ALDH1A1 (0.39) ALDH1A1TSHRTHRB
SCHEMBL7235205 0.73 HSD11B1 (0.38)
SCHEMBL3694984 0.73 ALDH1A1 (0.34) ALDH1A1TSHRTHRB
SCHEMBL152170 0.73 ALOX5AP (0.37)
SCHEMBL16286650 0.72 ALDH1A1 (0.36) ALDH1A1TSHRTHRB
SCHEMBL74543 0.71 ALDH1A1 (0.31) ALDH1A1
SCHEMBL1310160 0.71 ALDH1A1 (0.42) ALDH1A1TSHRTHRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 45 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3575333-B1 ACTIVE-ENERGY-RAY-CURABLE AQUEOUS RESIN COMPOSITION AND UNDERCOAT AGENT FOR INORGANIC-MATERIAL THIN FILM DAINIPPON INK & CHEMICALS (JP) 2023-09-06 EP disclosed
WO-2023162889-A1 POLYMER AND PHOTOSENSITIVE RESIN COMPOSITION THEREOF 株式会社日本触媒 2023-08-31 WO disclosed
US-11414567-B2 (Meth)acryloyl group-containing acrylic-modified alkyd resin and undercoat agent for inorganic-material thin film DIC CORPORATION (JP) 2022-08-16 US disclosed
EP-3575344-B1 (METH)ACRYLOYL GROUP-CONTAINING ACRYLIC-MODIFIED ALKYD RESIN AND UNDERCOAT AGENT FOR INORGANIC-MATERIAL THIN FILM DAINIPPON INK & CHEMICALS (JP) 2021-09-15 EP disclosed
US-10829579-B2 Active-energy-ray-curable aqueous resin composition and undercoat agent for inorganic-material thin film DIC CORPORATION (JP) 2020-11-10 US disclosed
US-10739678-B2 Photocurable composition, pattern forming method, and method for manufacturing device FUJIFILM CORPORATION (JP) 2020-08-11 US disclosed
EP-3575333-A1 ACTIVE-ENERGY-RAY-CURABLE AQUEOUS RESIN COMPOSITION AND UNDERCOAT AGENT FOR INORGANIC-MATERIAL THIN FILM DIC Corporation (JP) 2019-12-04 EP disclosed
US-20190113791-A1 OPTICAL LAMINATE AND PRODUCTION METHOD THEREFOR, FRONT PANEL, AND IMAGE DISPLAY DEVICE DAI NIPPON PRINTING CO., LTD. (JP) 2019-04-18 US disclosed
US-20180120698-A1 PHOTOCURABLE COMPOSITION, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING DEVICE FUJIFILM CORPORATION (JP) 2018-05-03 US disclosed
EP-2103592-B1 Hydroxyl-containing monomer, polymer, resist composition, and patterning process SHINETSU CHEMICAL CO (JP) 2015-06-03 EP disclosed
EP-2112660-A1 ULTRAVIOLET-CURABLE COMPOSITION FOR OPTICAL DISK AND OPTICAL DISK USING THE SAME DIC Corporation (JP) 2009-10-28 EP disclosed
US-20090253084-A1 DOUBLE PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-10-08 US disclosed
US-20090253084-A1 DOUBLE PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-10-08 US disclosed
US-20090239179-A1 HYDROXYL-CONTAINING MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-09-24 US disclosed
US-20090239179-A1 HYDROXYL-CONTAINING MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-09-24 US disclosed
US-20090239179-A1 HYDROXYL-CONTAINING MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-09-24 US disclosed
EP-2103592-A2 Hydroxyl-containing monomer, polymer, resist composition, and patterning process Shin-Etsu Chemical Co., Ltd. (JP) 2009-09-23 EP disclosed
EP-2103592-A2 Hydroxyl-containing monomer, polymer, resist composition, and patterning process Shin-Etsu Chemical Co., Ltd. (JP) 2009-09-23 EP disclosed
US-20090207723-A1 OPTICAL DISC AND ULTRAVIOLET-CURABLE COMPOSITION FOR OPTICAL DISC DIC CORPORATION (JP) 2009-08-20 US disclosed
EP-2020656-A1 OPTICAL DISK AND ULTRAVIOLET-CURABLE COMPOSITION FOR OPTICAL DISK DIC Corporation (JP) 2009-02-04 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20090239179-A1 HYDROXYL-CONTAINING MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS RAD51, REV1, H1-0 ALDH1A1 774/4885TSHR 2056/4885THRB 2973/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.