SCHEMBL7566916

SCHEMBL7566916

CC(C)(C)C1CCC(C(=O)O)(S(=O)(=O)ON2C(=O)c3ccccc3C2=O)CC1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 9/20 0.41
KDM4E B2RXH2 7/20 0.41
MAPT P10636 7/20 0.41
KMT2A Q03164 7/20 0.41
HPGD P15428 4/20 0.41
F2 P00734 4/20 0.39
MEN1 O00255 4/20 0.39
HTT P42858 3/20 0.39
LMNA P02545 1/20 0.39
SMN1; SMN2 Q16637 1/20 0.39
ATM Q13315 2/20 0.39
VDR P11473 3/20 0.39
XBP1 P17861 2/20 0.38
CYP1A2 P05177 2/20 0.36
CYP3A4 P08684 1/20 0.36
CYP2C19 P33261 1/20 0.36
NPSR1 Q6W5P4 1/20 0.36
CYP2C9 P11712 1/20 0.36
CDC25B P30305 1/20 0.36
GLA P06280 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL603216 0.64 ALDH1A1 (0.42) ALDH1A1KDM4EMAPTKMT2AHPGD
SCHEMBL28561733 0.63 VDR (0.39) ALDH1A1KDM4EMAPTKMT2AHPGD
SCHEMBL66141 0.62 KDM4E (0.61) ALDH1A1KDM4EMAPTKMT2AHPGD
SCHEMBL9064541 0.62 ALDH1A1 (0.61) ALDH1A1KDM4EMAPTKMT2AHPGD
SCHEMBL29217852 0.62 ALDH1A1 (0.66) ALDH1A1KDM4EMAPTKMT2AHPGD
SCHEMBL64157 0.62 ALDH1A1 (0.61) ALDH1A1KDM4EMAPTKMT2AHPGD
SCHEMBL29368754 0.62 ALDH1A1 (0.61) ALDH1A1KDM4EMAPTKMT2AHPGD
SCHEMBL10437852 0.61 GLA (0.40) ALDH1A1KDM4EMAPTHPGDSMN1; SMN2
SCHEMBL29565442 0.60 ALDH1A1 (0.46) ALDH1A1KDM4EMAPTKMT2AHPGD
SCHEMBL9425523 0.60 ALDH1A1 (0.46) ALDH1A1KDM4EMAPTKMT2AHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6406831-B1 AN PHOTOACID GENERATOR WHICH RELEASES AN ACID BY EXPOSURE TO LIGHT, A VINYL POLYMER WHICH IS ACID SENSITIVE AND HAS AN ALKALI SOLUBLE GROUP PROTECTED WITH A DISSOLUTION CONTROLLING GROUP AND CONVERTED INTO ALKALI SOLUBLE RESIN BY ACID CLEAVAGE NEC CORPORATION (JP) 2002-06-18 US disclosed
US-20020058203-A1 Chemically amplified resist compositions NEC ELECTRONICS CORPORATION (JP) 2002-05-16 US disclosed
US-6342334-B1 ULTRAFINE PROCESSING WITH IMPROVED FOCAL DEPTH, DICARBOXYIMIDE PHOTOACID GENERATOR WHICH RELEASES AN ACID HAVING BOTH A SULFONIC ACID GROUP AND A CARBOXYL GROUP; ACID SENSITIVE RESIN WHICH FORMS A CARBOXYL-CONTAINING ALKALI SOLUBLE RESIN; NEC CORPORATION (JP) 2002-01-29 US disclosed