Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TTR | P02766 | 1/20 | 0.44 |
| ▸ | ESR2 | Q92731 | 9/20 | 0.41 |
| ▸ | ESR1 | P03372 | 8/20 | 0.41 |
| ▸ | ELANE | P08246 | 1/20 | 0.40 |
| ▸ | ACHE | P22303 | 1/20 | 0.39 |
| ▸ | MAOA | P21397 | 1/20 | 0.39 |
| ▸ | UGT1A1 | P22309 | 1/20 | 0.39 |
| ▸ | MAOB | P27338 | 1/20 | 0.39 |
| ▸ | AMY1A | P0DUB6 | 1/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.38 |
| ▸ | GAA | P10253 | 2/20 | 0.38 |
| ▸ | MAPT | P10636 | 1/20 | 0.38 |
| ▸ | HPGD | P15428 | 1/20 | 0.38 |
| ▸ | HTT | P42858 | 1/20 | 0.38 |
| ▸ | RUNX1 | Q01196 | 1/20 | 0.38 |
| ▸ | CBFB | Q13951 | 1/20 | 0.38 |
| ▸ | ANPEP | P15144 | 1/20 | 0.38 |
| ▸ | DPP4 | P27487 | 1/20 | 0.38 |
| ▸ | PKM | P14618 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29623219 | 0.86 | ESR2 (0.57) | TTRESR2ESR1ALDH1A1MAPT | |
| SCHEMBL16196612 | 0.86 | ESR2 (0.57) | TTRESR2ESR1ALDH1A1MAPT | |
| SCHEMBL8059881 | 0.82 | ACHE (0.52) | ESR2ESR1ACHEMAOAUGT1A1 | |
| SCHEMBL29861377 | 0.81 | ALOX5 (0.48) | TTRESR2ESR1MAOAUGT1A1 | |
| SCHEMBL16196432 | 0.81 | ALOX5 (0.48) | TTRESR2ESR1MAOAUGT1A1 | |
| SCHEMBL28487296 | 0.76 | TTR (0.44) | TTRESR2ESR1MAOAUGT1A1 | |
| SCHEMBL15512030 | 0.75 | KDM4E (0.39) | ESR2ESR1ELANEMAOAALDH1A1 | |
| SCHEMBL2870993 | 0.75 | TRPA1 (0.48) | ESR2ESR1ELANEACHEMAOA | |
| SCHEMBL29737462 | 0.75 | ALDH1A1 (0.44) | TTRMAOAAMY1AALDH1A1MAPT | |
| SCHEMBL1883019 | 0.75 | ALDH1A1 (0.44) | TTRMAOAAMY1AALDH1A1MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 44 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117939914-A | Structure, display element, pattern for partition wall, and method for forming the same | 东京应化工业株式会社 | 2024-04-26 | — | — | CN | disclosed |
| CN-111205648-B | Curable composition, cured product, microlens, and optical element | 东京应化工业株式会社 | 2023-12-08 | — | — | CN | disclosed |
| CN-111324013-B | Chemically amplified positive photosensitive resin composition and application thereof | 奇美实业股份有限公司 | 2023-12-01 | — | — | CN | disclosed |
| CN-117106358-A | Composition for forming separation layer, support substrate with separation layer, laminate, method for producing laminate, and method for producing electronic component | 东京应化工业株式会社 | 2023-11-24 | — | — | CN | disclosed |
| CN-111381438-B | Chemically amplified positive photosensitive resin composition and application thereof | 奇美实业股份有限公司 | 2023-06-20 | — | — | CN | disclosed |
| CN-116262863-A | Composition for forming separation layer, support substrate with separation layer, laminate, method for producing laminate, and method for producing electronic component | 东京应化工业株式会社 | 2023-06-16 | — | — | CN | disclosed |
| CN-109062007-B | Positive photosensitive polysiloxane composition and application thereof | 奇美实业股份有限公司 | 2023-03-10 | — | — | CN | disclosed |
| CN-106933034-B | Positive photoresist composition | 东京应化工业株式会社 | 2023-01-06 | — | — | CN | disclosed |
| CN-115437214-A | Chemically amplified positive photosensitive resin composition, protective film, and element having protective film | 奇美实业股份有限公司 | 2022-12-06 | — | — | CN | disclosed |
| CN-108693710-B | Positive photosensitive polysiloxane composition | 奇美实业股份有限公司 | 2022-12-02 | — | — | CN | disclosed |
| US-9389509-B2 | Photosensitive polysiloxane composition, protecting film and element having the protecting film | CHI MEI CORPORATION (TW) | 2016-07-12 | — | — | US | disclosed |
| US-20150346601-A1 | PHOTOSENSITIVE POLYSILOXANE COMPOSITION, PROTECTIVE FILM AND ELEMENT HAVING THE PROTECTIVE FILM | CHI MEI CORPORATION (TW) | 2015-12-03 | — | — | US | disclosed |
| US-20150293449-A1 | PHOTOSENSITIVE POLYSILOXANE COMPOSITION AND USES THEREOF | CHI MEI CORPORATION (TW) | 2015-10-15 | — | — | US | disclosed |
| US-20150234275-A1 | PHOTOSENSITIVE POLYSILOXANE COMPOSITION, PROTECTING FILM AND ELEMENT HAVING THE PROTECTING FILM | CHI MEI CORPORATION (TW) | 2015-08-20 | — | — | US | disclosed |
| US-20150050596-A1 | PHOTOSENSITIVE POLYSILOXANE COMPOSITION AND USES THEREOF | CHI MEI CORPORATION (TW) | 2015-02-19 | — | — | US | disclosed |
| US-20150031808-A1 | PHOTOSENSITIVE POLYSILOXANE COMPOSITION AND USES THEREOF | CHI MEI CORPORATION (TW) | 2015-01-29 | — | — | US | disclosed |
| US-20140322651-A1 | PHOTOSENSITIVE POLYSILOXANE COMPOSITION, PROTECTING FILM AND ELEMENT HAVING THE PROTECTING FILM | CHI MEI CORPORATION (TW) | 2014-10-30 | — | — | US | disclosed |
| US-20130144005-A1 | PHOTO-CURING POLYSILOXANE COMPOSITION AND APPLICATION THEREOF | CHI MEI CORPORATION (TW) | 2013-06-06 | — | — | US | disclosed |
| US-8349461-B2 | Photo-curing polysiloxane composition and protective film formed from the same | CHI MEI CORPORATION (TW) | 2013-01-08 | — | — | US | disclosed |
| US-20120052439-A1 | PHOTO-CURING POLYSILOXANE COMPOSITION AND PROTECTIVE FILM FORMED FROM THE SAME | CHI MEI CORPORATION (TW) | 2012-03-01 | — | — | US | disclosed |