SCHEMBL7575951

SCHEMBL7575951

COc1ccc(S(OS(C)(=O)=O)(c2ccc(OC)cc2)c2ccc(OC)cc2)cc1

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PKM P14618 4/20 0.59
CA1 P00915 3/20 0.50
CA2 P00918 3/20 0.50
GAA P10253 2/20 0.50
MMP1 P03956 1/20 0.50
MMP2 P08253 1/20 0.50
MMP9 P14780 1/20 0.50
MMP8 P22894 1/20 0.50
MMP13 P45452 1/20 0.50
NPC1 O15118 1/20 0.48
PKLR P30613 1/20 0.48
RAB9A P51151 1/20 0.48
LMNA P02545 1/20 0.47
MAPK1 P28482 1/20 0.47
PTGS2 P35354 3/20 0.46
PTGS1 P23219 2/20 0.46
CA9 Q16790 2/20 0.46
CA12 O43570 1/20 0.46
CA7 P43166 1/20 0.46
CA14 Q9ULX7 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15063438 0.93 PKM (0.52) PKMCA1CA2GAAMMP1
SCHEMBL11049593 0.88 LTA4H (0.58) PKMMMP2MMP9MMP8MMP13
SCHEMBL7582031 0.80 PKM (0.55) PKMCA1CA2GAAMMP1
SCHEMBL8320906 0.79 PKM (0.35) PKMCA1CA2GAAMMP1
SCHEMBL9155335 0.79 SOS1 (0.56) CA1CA2MMP1MMP9MMP8
SCHEMBL8321316 0.79 ELANE (0.36) PKMMMP13PTGS2PTGS1ALDH1A1
SCHEMBL7575512 0.78 GAA (0.52) CA1CA2GAAMMP1MMP2
SCHEMBL11986371 0.78 PKM (0.70) PKMCA1CA2GAAMMP1
SCHEMBL280156 0.78 PKM (0.70) PKMCA1CA2GAAMMP1
SCHEMBL450431 0.77 HTT (0.53) PKMCA1CA2GAAMMP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20020196896-A1 Exposure method, exposure apparatus, X-ray mask, semiconductor device and microstructure MITSUBISHI DENKI KABUSHIKI KAISHA (JP) 2002-12-26 US disclosed
EP-1193553-A2 Exposure method, exposure apparatus, x-ray mask, semiconductor device and microstructure MITSUBISHI DENKI KABUSHIKI KAISHA (JP) 2002-04-03 EP disclosed
US-4451408-A Process of preparing sulfonium organosulfonates THE DOW CHEMICAL COMPANY (US) 1984-05-29 US disclosed
US-4451409-A Sulfonium organosulfonates THE DOW CHEMICAL COMPANY (US) 1984-05-29 US disclosed