Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTT | P42858 | 2/20 | 0.53 |
| ▸ | LMNA | P02545 | 1/20 | 0.53 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.53 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.53 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.53 |
| ▸ | PKM | P14618 | 2/20 | 0.52 |
| ▸ | TUBB4A | P04350 | 1/20 | 0.49 |
| ▸ | TUBB | P07437 | 1/20 | 0.49 |
| ▸ | TUBA3C | P0DPH7 | 1/20 | 0.49 |
| ▸ | TUBA1B | P68363 | 1/20 | 0.49 |
| ▸ | TUBA4A | P68366 | 1/20 | 0.49 |
| ▸ | TUBB4B | P68371 | 1/20 | 0.49 |
| ▸ | TUBB3 | Q13509 | 1/20 | 0.49 |
| ▸ | TUBB2A | Q13885 | 1/20 | 0.49 |
| ▸ | TUBB8 | Q3ZCM7 | 1/20 | 0.49 |
| ▸ | TUBA3E | Q6PEY2 | 1/20 | 0.49 |
| ▸ | TUBA1A | Q71U36 | 1/20 | 0.49 |
| ▸ | TUBA1C | Q9BQE3 | 1/20 | 0.49 |
| ▸ | TUBB6 | Q9BUF5 | 1/20 | 0.49 |
| ▸ | TUBB2B | Q9BVA1 | 1/20 | 0.49 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2964762 | 1.00 | HTT (0.53) | HTTLMNASMN1; SMN2TDP1L3MBTL1 | |
| SCHEMBL5169176 | 1.00 | HTT (0.53) | HTTLMNASMN1; SMN2TDP1L3MBTL1 | |
| SCHEMBL3143801 | 0.94 | LMNA (0.51) | HTTLMNASMN1; SMN2TDP1L3MBTL1 | |
| SCHEMBL759994 | 0.94 | LMNA (0.51) | HTTLMNASMN1; SMN2TDP1L3MBTL1 | |
| SCHEMBL2958287 | 0.92 | STAT3 (0.48) | HTTLMNASMN1; SMN2TDP1L3MBTL1 | |
| SCHEMBL28309516 | 0.91 | PKM (0.57) | HTTLMNASMN1; SMN2TDP1L3MBTL1 | |
| SCHEMBL3129726 | 0.88 | AHR (0.52) | HTTLMNASMN1; SMN2TDP1L3MBTL1 | |
| SCHEMBL3143271 | 0.88 | AHR (0.52) | HTTLMNASMN1; SMN2TDP1L3MBTL1 | |
| SCHEMBL15063438 | 0.86 | PKM (0.52) | HTTLMNASMN1; SMN2TDP1L3MBTL1 | |
| SCHEMBL453521 | 0.86 | ACHE (0.54) | HTTLMNASMN1; SMN2TDP1L3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 100 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3010943-B1 | CURABLE COMPOSITION, FILM, AND METHOD OF PRODUCING FILM | CANON KK (JP) | 2024-04-03 | — | — | EP | disclosed |
| US-11332597-B2 | Photo-curable composition and patterning method using the same | CANON KABUSHIKI KAISHA (JP) | 2022-05-17 | — | — | US | disclosed |
| EP-2841255-B1 | RESIN PRODUCTION METHOD AND RESIN PRODUCTION APPARATUS | CANON KK (JP) | 2020-05-13 | — | — | EP | disclosed |
| US-20200123343-A1 | PHOTO-CURABLE COMPOSITION AND PATTERNING METHOD USING THE SAME | CANON KK (JP) | 2020-04-23 | — | — | US | disclosed |
| US-10472445-B2 | Photocurable composition and method for manufacturing film | CANON KABUSHIKI KAISHA (JP) | 2019-11-12 | — | — | US | disclosed |
| US-10421853-B2 | Photosensitive gas generating agent and photocurable composition | CANON KABUSHIKI KAISHA (JP) | 2019-09-24 | — | — | US | disclosed |
| EP-2907156-B1 | IMPRINTING METHOD AND CURABLE COMPOSITION FOR IMPRINTING | CANON KK (JP) | 2019-04-10 | — | — | EP | disclosed |
| EP-2758987-B1 | METHOD OF FORMING A FILM | CANON KK (JP) | 2019-03-20 | — | — | EP | disclosed |
| US-10233274-B2 | Curable composition and patterning method using the same | CANON KABUSHIKI KAISHA (JP) | 2019-03-19 | — | — | US | disclosed |
| US-10208183-B2 | Curable composition, film, and method of producing film | CANON KABUSHIKI KAISHA (JP) | 2019-02-19 | — | — | US | disclosed |
| US-20030194634-A1 | Novel anthracene derivative and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2003-10-16 | — | — | US | disclosed |
| EP-1343048-A2 | Anthracene derivative and radiation-sensitive resin composition | JSR Corporation (JP) | 2003-09-10 | — | — | EP | disclosed |
| US-20030113658-A1 | Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2003-06-19 | — | — | US | disclosed |
| US-20030113660-A1 | Sulfonyloxime compound, and radiation sensitive acid generator, positive type radiation sensitive resin composition and negative type radiation sensitive resin composition using same | JSR CORPORATION (JP) | 2003-06-19 | — | — | US | disclosed |
| US-20030068573-A1 | Chemical amplification type positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2003-04-10 | — | — | US | disclosed |
| EP-1270553-A2 | Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition | JSR Corporation (JP) | 2003-01-02 | — | — | EP | disclosed |
| US-20020192593-A1 | Used as chemically amplified resist, exhibits high sensitivity, resolution, radiation transmittance, and surface smoothness, and is free from the problem of partial insolublization during overexposure | JSR CORPORATION (JP) | 2002-12-19 | — | — | US | disclosed |
| US-20020172885-A1 | Novel carbazole derivative and chemically amplified radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-11-21 | — | — | US | disclosed |
| EP-1253470-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2002-10-30 | — | — | EP | disclosed |
| EP-1231205-A1 | VINYLPHENYLPROPIONIC ACID DERIVATIVES, PROCESSES FOR PRODUCTION OF THE DERIVATIVES, POLYMERS THEREOF AND RADIOSENSITIVE RESIN COMPOSITIONS | JSR Corporation (JP) | 2002-08-14 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20030194634-A1 | Novel anthracene derivative and radiation-sensitive resin composition | SRSF1, ARL1, ERCC4 | HTT 4523/4885LMNA 2023/4885SMN1; SMN2 2465/4885 |
| US-20020172885-A1 | Novel carbazole derivative and chemically amplified radiation-sensitive resin composition | ARID2, RAD1, RAD51 | HTT 3475/4885LMNA 3785/4885SMN1; SMN2 3950/4885 |
| US-10421853-B2 | Photosensitive gas generating agent and photocurable composition | PFN1, PFAS, FRG1 | HTT 3245/4885LMNA 2894/4885SMN1; SMN2 4658/4885 |
| US-20030113658-A1 | Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition | ASIC1, PFAS, RARA | HTT 4125/4885LMNA 3265/4885SMN1; SMN2 1241/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.