SCHEMBL7576449

SCHEMBL7576449

CCCS(=O)(=O)[O-].COc1ccc([I+]c2ccccc2)cc1

nearest known ligand 0.44

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.44
HTT P42858 2/20 0.43
NPSR1 Q6W5P4 1/20 0.40
RECQL P46063 2/20 0.40
POLB P06746 1/20 0.40
PKM P14618 1/20 0.40
PTGS2 P35354 2/20 0.39
MMP13 P45452 4/20 0.38
MMP8 P22894 2/20 0.38
MMP2 P08253 1/20 0.38
MMP12 P39900 1/20 0.38
MMP14 P50281 1/20 0.38
MMP16 P51512 1/20 0.38
KDM4E B2RXH2 2/20 0.38
LMNA P02545 1/20 0.38
TSHR P16473 1/20 0.38
MAPT P10636 1/20 0.38
CYP19A1 P11511 1/20 0.38
PGR P06401 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7582832 0.91 ALDH1A1 (0.49) ALDH1A1HTTNPSR1RECQLPOLB
SCHEMBL2896066 0.89 PTGS2 (0.41) ALDH1A1HTTPTGS2MMP13
SCHEMBL7573539 0.87 CA12 (0.38) ALDH1A1PKMKDM4E
SCHEMBL7574610 0.84 ALDH1A1 (0.47) ALDH1A1HTTRECQLPOLBPKM
SCHEMBL2896059 0.80 ALDH1A1 (0.48) ALDH1A1HTTRECQLPOLBPKM
SCHEMBL2634849 0.80 ALDH1A1 (0.50) ALDH1A1HTTRECQLPOLBPKM
Trifluoromethanesulfonic Acid SCHEMBL361656 0.79 KCNH2 (0.46) ALDH1A1HTTRECQLPKMMMP2
SCHEMBL126675 0.79 CA4 (0.59) ALDH1A1HTTPTGS2MAPT
SCHEMBL5447853 0.78 PABPC1 (0.41) ALDH1A1KDM4E
Water SCHEMBL8070408 0.77 CA4 (0.56) ALDH1A1HTTPTGS2MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20020196896-A1 Exposure method, exposure apparatus, X-ray mask, semiconductor device and microstructure MITSUBISHI DENKI KABUSHIKI KAISHA (JP) 2002-12-26 US disclosed
EP-1193553-A2 Exposure method, exposure apparatus, x-ray mask, semiconductor device and microstructure MITSUBISHI DENKI KABUSHIKI KAISHA (JP) 2002-04-03 EP disclosed