Known targets — ChEMBL curated mechanism
ABL1BMXBRAFBTKCHRNA4CHRNB2CSNK1EEGFRERBB2F10FLT1FLT3FLT4IGF1RINSRITKJAK3KDRKITOPRM1PARP1PARP2PDGFRBPIK3CDRAF1RETSLC18A2TECTXKdacAdacBdacCftsImrcAmrcBmrdArplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ABL1 known ✓ | P00519 | 1/20 | 0.41 |
| ▸ | MEN1 | O00255 | 1/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.44 |
| ▸ | PTGS2 | P35354 | 2/20 | 0.44 |
| ▸ | HDAC4 | P56524 | 1/20 | 0.43 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.43 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.43 |
| ▸ | LMNA | P02545 | 4/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.43 |
| ▸ | STAT3 | P40763 | 3/20 | 0.43 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.43 |
| ▸ | MAPT | P10636 | 3/20 | 0.43 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.42 |
| ▸ | ABCB1 | P08183 | 1/20 | 0.41 |
| ▸ | BCR | P11274 | 1/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.41 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.41 |
| ▸ | HTT | P42858 | 1/20 | 0.41 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.41 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4655793 | 0.91 | HDAC4 (0.47) | MEN1KMT2APTGS2HDAC4HDAC2 | |
| SCHEMBL10492054 | 0.90 | LMNA (0.48) | MEN1KMT2APTGS2LMNAALDH1A1 | |
| SCHEMBL1140939 | 0.86 | ALDH1A1 (0.39) | MEN1KMT2APTGS2LMNAALDH1A1 | |
| SCHEMBL218886 | 0.86 | ALDH1A1 (0.39) | MEN1KMT2APTGS2LMNAALDH1A1 | |
| SCHEMBL4655811 | 0.85 | TP53 (0.48) | KMT2APTGS2HDAC4HDAC2HDAC8 | |
| SCHEMBL7741653 | 0.85 | LTA4H (0.50) | MEN1KMT2APTGS2LMNAALDH1A1 | |
| SCHEMBL7739971 | 0.85 | PDE4A (0.42) | MEN1KMT2APTGS2HDAC4HDAC2 | |
| SCHEMBL7574616 | 0.84 | HDAC4 (0.51) | MEN1KMT2APTGS2HDAC4HDAC2 | |
| SCHEMBL7892661 | 0.84 | TSHR (0.44) | LMNAALDH1A1NPSR1MAPTSMN1; SMN2 | |
| SCHEMBL7172569 | 0.82 | CNR2 (0.40) | MEN1KMT2APTGS2LMNAALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 107 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240352203-A1 | FILM-FORMING MATERIAL FOR SEMICONDUCTOR, MEMBER-FORMING MATERIAL FOR SEMICONDUCTOR, PROCESS MEMBER-FORMING MATERIAL FOR SEMICONDUCTOR, UNDERLAYER FILM-FORMING MATERIAL, UNDERLAYER FILM, AND SEMICONDUCTOR DEVICE | ADEKA CORPORATION (JP) | 2024-10-24 | — | — | US | disclosed |
| EP-4375750-A1 | FILM-FORMING MATERIAL FOR SEMICONDUCTOR, MEMBER-FORMING MATERIAL FOR SEMICONDUCTOR, PROCESS MEMBER-FORMING MATERIAL FOR SEMICONDUCTOR, UNDERLAYER FILM-FORMING MATERIAL, UNDERLAYER FILM, AND SEMICONDUCTOR DEVICE | ADEKA CORPORATION (JP) | 2024-05-29 | — | — | EP | disclosed |
| CN-115551923-A | Polysulfonamide polymers, positive photosensitive compositions containing them and their use | 崔国英 | 2022-12-30 | — | — | CN | disclosed |
| CN-115433358-A | Polyamide-b-amic acid polymers, positive photosensitive compositions and their use | 山东圣泉新材料股份有限公司 | 2022-12-06 | — | — | CN | disclosed |
| US-11450445-B2 | Electroconductive film and method for manufacturing electroconductive pattern | TOKYO UNIVERSITY OF SCIENCE FOUNDATION (JP) | 2022-09-20 | — | — | US | disclosed |
| CN-107003608-B | Photopatternable composition and method for manufacturing transistor device by using same | 飞利斯有限公司 | 2020-09-25 | — | — | CN | disclosed |
| US-20200303086-A1 | ELECTROCONDUCTIVE FILM AND METHOD FOR MANUFACTURING ELECTROCONDUCTIVE PATTERN | TOKYO UNIVERSITY OF SCIENCE FOUNDATION (JP) | 2020-09-24 | — | — | US | disclosed |
| CN-111647160-A | Aromatic polyamide sulfonamide polymer, positive photosensitive composition containing aromatic polyamide sulfonamide polymer, and use thereof | 崔国英 | 2020-09-11 | — | — | CN | disclosed |
| CN-111548496-A | Polysulfonamide polymers, low-temperature crosslinked positive-working photosensitive compositions containing polysulfonamide polymers and use thereof | 崔国英 | 2020-08-18 | — | — | CN | disclosed |
| US-10720259-B2 | Electroconductive film and method for manufacturing electroconductive pattern | TOKYO UNIVERSITY OF SCIENCE FOUNDATION (JP) | 2020-07-21 | — | — | US | disclosed |
| US-20020172873-A1 | Photosensitive resin composition, color filter, and copolymer resin useful for them | DAI NIPPON PRINTING CO., LTD. (JP) | 2002-11-21 | — | — | US | disclosed |
| US-6410206-B1 | MIXTURE OF (METH)ACRYLIC ACID, ACRYLATED ESTER AND EPOXYCOMPOUND | DAI NIPPON PRINTING CO., LTD. (JP) | 2002-06-25 | — | — | US | disclosed |
| EP-1193553-A2 | Exposure method, exposure apparatus, x-ray mask, semiconductor device and microstructure | MITSUBISHI DENKI KABUSHIKI KAISHA (JP) | 2002-04-03 | — | — | EP | disclosed |
| EP-0880075-B1 | Radiation sensitive resin composition | JSR CORP (JP) | 2001-10-17 | — | — | EP | disclosed |
| EP-1035439-A2 | Photosensitive resin composition, color filter, and copolymer resin useful for them | DAI NIPPON PRINTING CO., LTD. (JP) | 2000-09-13 | — | — | EP | disclosed |
| US-5958648-A | Radiation sensitive resin composition | JSR CORPORATION (JP) | 1999-09-28 | — | — | US | disclosed |
| EP-0880075-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 1998-11-25 | — | — | EP | disclosed |
| EP-0594452-B1 | Radiation sensitive resin composition for microlens | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1997-01-15 | — | — | EP | disclosed |
| US-5432039-A | Radiation sensitive quinone diazide and resin composition for microlens | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1995-07-11 | — | — | US | disclosed |
| EP-0594452-A2 | Radiation sensitive resin composition for microlens | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1994-04-27 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20240352203-A1 | FILM-FORMING MATERIAL FOR SEMICONDUCTOR, MEMBER-FORMING MATERIAL FOR SEMICONDUCTOR, PROCESS MEMBER-FORMING MATERIAL FOR SEMICONDUCTOR, UNDERLAYER FILM-FORMING MATERIAL, UNDERLAYER FILM, AND SEMICONDUCTOR DEVICE | FBXL19, SRSF9, CNOT9 | ABL1 1226/4885MEN1 795/4885KMT2A 1297/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.