SCHEMBL7601773

SCHEMBL7601773

CO[Si](C)(O[Si](C)(OC)c1ccccc1)c1ccccc1

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 1/20 0.38
ESR2 Q92731 1/20 0.38
CA4 P22748 2/20 0.36
TSHR P16473 2/20 0.34
POLB P06746 2/20 0.32
CA12 O43570 1/20 0.32
CA1 P00915 1/20 0.32
CA2 P00918 1/20 0.32
CA7 P43166 1/20 0.32
CA9 Q16790 1/20 0.32
CA14 Q9ULX7 1/20 0.32
NR1H2 P55055 2/20 0.31
NR1H3 Q13133 2/20 0.31
NPC1 O15118 1/20 0.31
RAB9A P51151 1/20 0.31
LTA4H P09960 1/20 0.31
ALDH1A1 P00352 1/20 0.31
CYP1A2 P05177 1/20 0.31
CYP2C19 P33261 1/20 0.31
MAPT P10636 2/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30003108 0.98 ESR1 (0.37) ESR1ESR2CA4TSHRPOLB
SCHEMBL10609352 0.98 ESR1 (0.37) ESR1ESR2CA4TSHRPOLB
SCHEMBL18094271 0.98 ESR1 (0.37) ESR1ESR2CA4TSHRPOLB
SCHEMBL25507022 0.91 ESR1 (0.33) ESR1ESR2CA4TSHR
SCHEMBL14193864 0.91 ESR1 (0.35) ESR1ESR2CA4TSHRPOLB
SCHEMBL49103 0.90 ESR1 (0.41) ESR1ESR2CA4TSHRPOLB
SCHEMBL20143197 0.89 ESR1 (0.32) ESR1ESR2CA4
SCHEMBL8440982 0.89 ESR1 (0.34) ESR1ESR2CA4TSHR
SCHEMBL9505641 0.87 ESR1 (0.39) ESR1ESR2CA4TSHRPOLB
SCHEMBL8437442 0.87 ESR1 (0.33) ESR1ESR2CA4TSHRPOLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 41 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0698632-B1 Process for preparing organosiloxane terminated with silanol group SHINETSU CHEMICAL CO (JP) 2001-11-21 EP claimed
US-5576408-A Process for preparing low molecular weight organosiloxane terminated with silanol group SHIN-ETSU CHEMICAL CO., LTD. (JP) 1996-11-19 US claimed
US-5391677-A Acrylic-functional organopolysiloxane and method for the preparation thereof SHIN-ETSU CHEMICAL CO., LTD. (JP) 1995-02-21 US claimed
JP-57055919-A None JP disclosed
JP-59120621-A None JP disclosed
JP-59168072-A None JP disclosed
JP-57180627-A None JP disclosed
CN-106243357-B It can the siliceous anti-reflection agent peelled off of wet type 罗门哈斯电子材料有限责任公司 2019-07-23 CN disclosed
US-10031420-B2 Wet-strippable silicon-containing antireflectant ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2018-07-24 US disclosed
US-9837298-B2 Method for manufacturing laminate, method for manufacturing sealed substrate laminate, sealed substrate laminate, and sealed substrate TOKYO OHKA KOGYO CO., LTD. (JP) 2017-12-05 US disclosed
US-9627235-B2 Supporting member separation method TOKYO OHKA KOGYO CO., LTD. (JP) 2017-04-18 US disclosed
EP-0698632-A1 Process for preparing organosiloxane terminated with silanol group SHIN-ETSU CHEMICAL CO., LTD. (JP) 1996-02-28 EP disclosed
US-5391677-A Acrylic-functional organopolysiloxane and method for the preparation thereof SHIN-ETSU CHEMICAL CO., LTD. (JP) 1995-02-21 US disclosed
EP-0139234-B1 RESIN COMPOSITION KABUSHIKI KAISHA TOSHIBA (JP) 1989-11-29 EP disclosed
US-4599155-A POLYORTHOESTERS;SHRINKAGE INHIBITION;NONCRACKING;COATINGS KABUSHIKI KAISHA TOSHIBA (JP) 1986-07-08 US disclosed
EP-0139234-A2 Resin composition KABUSHIKI KAISHA TOSHIBA (JP) 1985-05-02 EP disclosed
JP-S59168072-A EPOXY RESIN COMPOSITION FOR PAINT TOSHIBA CORP 1984-09-21 JP disclosed
JP-S59120621-A INSULATING MATERIAL FOR USE IN ELECTRIC DEVICE AND APPLIANCE TOSHIBA CORP 1984-07-12 JP disclosed
JP-S57180627-A EPOXY RESIN COMPOSITION TOSHIBA CORP 1982-11-06 JP disclosed
JP-S5755919-A EPOXY RESIN COMPOSITION TOSHIBA CORP 1982-04-03 JP disclosed