Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EDNRA | P25101 | 2/20 | 0.47 |
| ▸ | CES2 | O00748 | 1/20 | 0.45 |
| ▸ | CES1 | P23141 | 1/20 | 0.45 |
| ▸ | EDNRB | P24530 | 1/20 | 0.44 |
| ▸ | CA1 | P00915 | 2/20 | 0.42 |
| ▸ | CA2 | P00918 | 2/20 | 0.42 |
| ▸ | GAA | P10253 | 2/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.40 |
| ▸ | HTT | P42858 | 1/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.40 |
| ▸ | NPC1 | O15118 | 1/20 | 0.40 |
| ▸ | RAB9A | P51151 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trifluoroacetic Acid SCHEMBL242689 | 0.94 | CA1 (0.47) | EDNRACES2CES1CA1CA2 | |
| Acetic Acid SCHEMBL9794942 | 0.87 | CES2 (0.50) | EDNRACES2CES1EDNRBCA1 | |
| Trifluoroacetic Acid SCHEMBL1834215 | 0.85 | KMT2A (0.46) | GAAALDH1A1HTTSMN1; SMN2RAB9A | |
| Trifluoroacetic Acid SCHEMBL107376 | 0.85 | CES1 (0.45) | EDNRACES2CES1CA2 | |
| Trifluoroacetic Acid SCHEMBL10492085 | 0.84 | HDAC1 (0.46) | ALDH1A1SMN1; SMN2NPC1RAB9A | |
| Trifluoroacetic Acid SCHEMBL10584037 | 0.84 | LTA4H (0.44) | SMN1; SMN2NPC1RAB9A | |
| Trifluoroacetic Acid SCHEMBL3167314 | 0.83 | NQO2 (0.40) | EDNRAGAAALDH1A1HTTRAB9A | |
| Trifluoroacetic Acid SCHEMBL7584599 | 0.81 | LTA4H (0.46) | — | |
| Trifluoromethanesulfonic Acid SCHEMBL756610 | 0.81 | EDNRA (0.43) | EDNRACES2CES1EDNRBGAA | |
| Trifluoromethanesulfonic Acid SCHEMBL361656 | 0.81 | KCNH2 (0.46) | EDNRAGAAALDH1A1HTT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 215 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4748864-A1 | POLYMERIZATION INITIATOR OR PHOTOSENSITIZER, POLYMERIZATION INITIATION COMPOSITION, AND METHOD FOR PRODUCING RESIN | Miyoshi Oil & Fat Co., Ltd. (JP) | 2026-05-27 | — | — | EP | disclosed |
| US-20250231491-A1 | PHOTOLITHOGRAPHIC METHOD USING SILICON PHOTORESIST | SUNTIFIC MATERIALS (WEIFANG)., LTD. (CN) | 2025-07-17 | — | — | US | disclosed |
| US-20250231492-A1 | MANUFACTURE OF INTEGRATED CIRUIT USING POSITIVE TONE PHOTOPATTERNABLE DIELECTRIC INCLUDING HIGH SILICON CONTENT POLYSILSESQUIOXANE | SUNTIFIC MATERIALS (WEIFANG)., LTD. (CN) | 2025-07-17 | — | — | US | disclosed |
| WO-2025063284-A1 | POLYMERIZATION INITIATOR OR PHOTOSENSITIZER, POLYMERIZATION INITIATION COMPOSITION, AND METHOD FOR PRODUCING RESIN | ミヨシ油脂株式会社 | 2025-03-27 | — | — | WO | disclosed |
| EP-4508493-A1 | PHOTOLITHOGRAPHIC METHOD USING SILICON PHOTORESIST | Suntific Materials (Weifang), Ltd. (CN) | 2025-02-19 | — | — | EP | disclosed |
| EP-4508495-A1 | MANUFACTURE OF INTEGRATED CIRUIT USING POSITIVE TONE PHOTOPATTERNABLE DIELECTRIC INCLUDING HIGH SILICON CONTENT POLYSILSESQUIOXANE | Suntific Materials (Weifang), Ltd. (CN) | 2025-02-19 | — | — | EP | disclosed |
| WO-2025000535-A1 | MANUFACTURE OF INTEGRATED CIRUIT USING POSITIVE TONE PHOTOPATTERNABLE DIELECTRIC INCLUDING HIGH SILICON CONTENT POLYSILSESQUIOXANE | SUNTIFIC MATERIALS (WEIFANG), LTD. (CN) | 2025-01-02 | — | — | WO | disclosed |
| WO-2025000537-A1 | PHOTOLITHOGRAPHIC METHOD USING SILICON PHOTORESIST | SUNTIFIC MATERIALS (WEIFANG), LTD. (CN) | 2025-01-02 | — | — | WO | disclosed |
| US-20240352203-A1 | FILM-FORMING MATERIAL FOR SEMICONDUCTOR, MEMBER-FORMING MATERIAL FOR SEMICONDUCTOR, PROCESS MEMBER-FORMING MATERIAL FOR SEMICONDUCTOR, UNDERLAYER FILM-FORMING MATERIAL, UNDERLAYER FILM, AND SEMICONDUCTOR DEVICE | ADEKA CORPORATION (JP) | 2024-10-24 | — | — | US | disclosed |
| US-20240199854-A1 | COMPOSITION, CURED FILM, STRUCTURAL BODY, OPTICAL FILTER, SOLID-STATE IMAGING ELEMENT, IMAGE DISPLAY DEVICE, AND MANUFACTURING METHOD OF CURED FILM | FUJIFLIM CORPORATION (JP) | 2024-06-20 | — | — | US | disclosed |
| EP-0594452-A2 | Radiation sensitive resin composition for microlens | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1994-04-27 | — | — | EP | disclosed |
| EP-0175504-B1 | DIFFUSION OR SUBLIMATION TRANSFER IMAGING SYSTEM | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1989-04-05 | — | — | EP | disclosed |
| EP-0302610-A2 | Light sensitive element | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1989-02-08 | — | — | EP | disclosed |
| EP-0120601-B1 | OXIDATIVE IMAGING | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1988-10-19 | — | — | EP | disclosed |
| US-4769459-A | Oxidative imaging | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1988-09-06 | — | — | US | disclosed |
| US-4701402-A | BLEACHABLE DYE IN REACTIVE DISSOCIATION WITH IODONIUM COMPOUND | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1987-10-20 | — | — | US | disclosed |
| US-4632895-A | FORMING POSITIVE BY BLEACHING DYE WITH IODONIUM ION CONTAINING COMPOUND | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1986-12-30 | — | — | US | disclosed |
| EP-0175504-A2 | Diffusion or sublimation transfer imaging system | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1986-03-26 | — | — | EP | disclosed |
| EP-0120601-A2 | Oxidative imaging | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1984-10-03 | — | — | EP | disclosed |
| US-4250053-A | WITH FLUORESCENT COMPOUND | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1981-02-10 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20240352203-A1 | FILM-FORMING MATERIAL FOR SEMICONDUCTOR, MEMBER-FORMING MATERIAL FOR SEMICONDUCTOR, PROCESS MEMBER-FORMING MATERIAL FOR SEMICONDUCTOR, UNDERLAYER FILM-FORMING MATERIAL, UNDERLAYER FILM, AND SEMICONDUCTOR DEVICE | FBXL19, SRSF9, CNOT9 | EDNRA 3406/4885CES2 3410/4885CES1 4073/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.