Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CES1 | P23141 | 7/20 | 0.45 |
| ▸ | CA2 | P00918 | 1/20 | 0.38 |
| ▸ | CA4 | P22748 | 1/20 | 0.38 |
| ▸ | EDNRA | P25101 | 1/20 | 0.36 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.34 |
| ▸ | FAAH | O00519 | 3/20 | 0.34 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.34 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.34 |
| ▸ | CES2 | O00748 | 1/20 | 0.33 |
| ▸ | FABP7 | O15540 | 1/20 | 0.33 |
| ▸ | CPA1 | P15085 | 1/20 | 0.33 |
| ▸ | KCNN1 | Q92952 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trifluoroacetic Acid SCHEMBL761109 | 0.85 | EDNRA (0.47) | CES1CA2EDNRACES2 | |
| Trifluoroacetic Acid SCHEMBL10492085 | 0.84 | HDAC1 (0.46) | HDAC6 | |
| Bicarbonate SCHEMBL108506 | 0.84 | CA2 (0.46) | CES1CA2CA4EDNRAHDAC6 | |
| Bicarbonate SCHEMBL105149 | 0.84 | CA2 (0.46) | CES1CA2CA4EDNRAHDAC6 | |
| Trichloroacetic Acid SCHEMBL108191 | 0.83 | CYP1A2 (0.40) | CES1CA2CA4EDNRACES2 | |
| Oxalic Acid SCHEMBL108407 | 0.81 | CA4 (0.44) | CES1CA2CA4EDNRAHDAC6 | |
| Trifluoroacetic Acid SCHEMBL10492025 | 0.81 | SMN1; SMN2 (0.35) | CES1HDAC6CES2 | |
| Trifluoroacetic Acid SCHEMBL10584037 | 0.81 | LTA4H (0.44) | — | |
| SCHEMBL104017 | 0.81 | RIPK1 (0.39) | CA2CA4HDAC6TDP1 | |
| SCHEMBL10601716 | 0.80 | THRB (0.42) | CES1CA2HDAC6 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 429 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2026097702-A1 | PHOTOSENSITIVE COMPOSITION, METHOD FOR PREPARING PATTERN, CURED PRODUCT, AND ELECTRONIC COMPONENT | 江苏艾森半导体材料股份有限公司 | 2026-05-15 | — | — | WO | disclosed |
| US-20260118767-A1 | REVERSE PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-04-30 | — | — | US | disclosed |
| US-20260044081-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-02-12 | — | — | US | disclosed |
| EP-4692941-A2 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2026-02-11 | — | — | EP | disclosed |
| EP-4621486-A2 | POLYVALENT AMMONIUM SALT COMPOUND, COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-09-24 | — | — | EP | disclosed |
| US-20250289931-A1 | POLYVALENT AMMONIUM SALT COMPOUND, COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-09-18 | — | — | US | disclosed |
| EP-4592299-A1 | SILICON-CONTAINING SULFONIUM SALT COMPOUND, COMPOSITION FOR FORMING A SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-07-30 | — | — | EP | disclosed |
| US-20250237953-A1 | SILICON-CONTAINING SULFONIUM SALT COMPOUND, COMPOSITION FOR FORMING A SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-07-24 | — | — | US | disclosed |
| US-20250231491-A1 | PHOTOLITHOGRAPHIC METHOD USING SILICON PHOTORESIST | SUNTIFIC MATERIALS (WEIFANG)., LTD. (CN) | 2025-07-17 | — | — | US | disclosed |
| US-20250231492-A1 | MANUFACTURE OF INTEGRATED CIRUIT USING POSITIVE TONE PHOTOPATTERNABLE DIELECTRIC INCLUDING HIGH SILICON CONTENT POLYSILSESQUIOXANE | SUNTIFIC MATERIALS (WEIFANG)., LTD. (CN) | 2025-07-17 | — | — | US | disclosed |
| US-5498765-A | Positive photoresist composition containing photoacid generator and use thereof | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1996-03-12 | — | — | US | disclosed |
| US-5432039-A | Radiation sensitive quinone diazide and resin composition for microlens | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1995-07-11 | — | — | US | disclosed |
| US-5374500-A | Positive photoresist composition containing photoacid generator and use thereof | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1994-12-20 | — | — | US | disclosed |
| EP-0619522-A2 | Positive photoresist composition containing photoacid generator and use thereof | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1994-10-12 | — | — | EP | disclosed |
| EP-0594452-A2 | Radiation sensitive resin composition for microlens | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1994-04-27 | — | — | EP | disclosed |
| US-5266444-A | Positives photoimages with crosslinking and onium curing agent | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1993-11-30 | — | — | US | disclosed |
| EP-0530095-A1 | Improved sensitization of photopolymerizable compositions | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1993-03-03 | — | — | EP | disclosed |
| US-5055439-A | PHOTOACID GENERATING COMPOSITION AND SENSITIZER THEREFOR | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1991-10-08 | — | — | US | disclosed |
| EP-0435531-A2 | Photoacid generating composition and sensitizer therefor | International Business Machines Corporation (US) | 1991-07-03 | — | — | EP | disclosed |
| US-4250053-A | WITH FLUORESCENT COMPOUND | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1981-02-10 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20250289931-A1 | POLYVALENT AMMONIUM SALT COMPOUND, COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS | ASH2L, PUF60, IDUA | CES1 4246/4885CA2 1064/4885CA4 749/4885 |
| US-20260118767-A1 | REVERSE PATTERNING PROCESS | EFNA1, EPHA4, ETV6 | CES1 2618/4885CA2 2902/4885CA4 281/4885 |
| US-20260044081-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS | SMC1A, SPOUT1, LBR | CES1 3024/4885CA2 2105/4885CA4 1681/4885 |
| US-20250237953-A1 | SILICON-CONTAINING SULFONIUM SALT COMPOUND, COMPOSITION FOR FORMING A SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS | SMURF1, OSR1, SIK1 | CES1 3505/4885CA2 972/4885CA4 440/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.