SCHEMBL766004

SCHEMBL766004

Cc1ccc(/C=C/C(=O)N2CCCCC2)c(O[Si](C)(C)C(C)(C)C)c1

nearest known ligand 0.49

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
HPGD P15428 5/20 0.49
PELI1 Q96FA3 3/20 0.45
ALDH1A1 P00352 6/20 0.44
RAB9A P51151 4/20 0.44
MAPT P10636 3/20 0.44
NPC1 O15118 3/20 0.44
KMT2A Q03164 2/20 0.44
SMN1; SMN2 Q16637 2/20 0.44
MEN1 O00255 1/20 0.44
TRPV1 Q8NER1 2/20 0.43
KDM4E B2RXH2 3/20 0.43
PTGS2 P35354 1/20 0.40
BCHE P06276 1/20 0.39
MAOA P21397 1/20 0.39
ACHE P22303 1/20 0.39
MAOB P27338 1/20 0.39
GAA P10253 1/20 0.39
TSHR P16473 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL766030 0.80 HPGD (0.49) HPGDPELI1ALDH1A1RAB9AMAPT
SCHEMBL766039 0.78 HPGD (0.47) HPGDPELI1ALDH1A1RAB9AMAPT
SCHEMBL766014 0.76 MAPT (0.55) HPGDPELI1ALDH1A1RAB9AMAPT
SCHEMBL15970762 0.73 MAPT (0.57) HPGDPELI1ALDH1A1RAB9AMAPT
SCHEMBL15970761 0.73 MAPT (0.57) HPGDPELI1ALDH1A1RAB9AMAPT
SCHEMBL766040 0.72 HPGD (0.43) HPGDPELI1ALDH1A1RAB9AMAPT
SCHEMBL17786204 0.72 ALDH1A1 (0.40) HPGDALDH1A1RAB9AMAPTNPC1
SCHEMBL766041 0.72 APP (0.52) HPGDPELI1ALDH1A1MAPTKMT2A
SCHEMBL766009 0.71 HPGD (0.44) HPGDPELI1ALDH1A1RAB9AMAPT
SCHEMBL765981 0.71 HPGD (0.49) HPGDPELI1ALDH1A1MAPTKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120070781-A1 BASE GENERATOR, PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING MATERIAL COMPRISING THE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD USING THE PHOTOSENSITIVE RESIN COMPOSITION AND PRODUCTS COMPRISING THE SAME DAI NIPPON PRINTING CO., LTD. (JP) 2012-03-22 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120070781-A1 BASE GENERATOR, PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING MATERIAL COMPRISING THE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD USING THE PHOTOSENSITIVE RESIN COMPOSITION AND PRODUCTS COMPRISING THE SAME RER1, SUN2, REV1 HPGD 861/4885PELI1 585/4885ALDH1A1 2053/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.