SCHEMBL766129

SCHEMBL766129

Nc1ccc(C(=O)c2ccc(N)c(O)c2)cc1O

nearest known ligand 0.62

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD17B10 Q99714 2/20 0.52
CYP3A4 P08684 1/20 0.52
ALOX15 P16050 1/20 0.52
MAPT P10636 4/20 0.48
GAA P10253 3/20 0.48
HTT P42858 3/20 0.48
LMNA P02545 2/20 0.48
L3MBTL1 Q9Y468 2/20 0.48
MAPK1 P28482 1/20 0.48
ALDH1A1 P00352 1/20 0.48
RAB9A P51151 2/20 0.46
KDM4E B2RXH2 2/20 0.46
POLB P06746 2/20 0.46
MEN1 O00255 1/20 0.46
KMT2A Q03164 1/20 0.46
SIRT1 Q96EB6 1/20 0.46
SLC22A6 Q4U2R8 1/20 0.45
SLC22A8 Q8TCC7 1/20 0.45
SMN1; SMN2 Q16637 2/20 0.44
NPC1 O15118 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29412590 1.00 HSD17B10 (0.52) HSD17B10CYP3A4ALOX15MAPTGAA
SCHEMBL9114963 0.92 L3MBTL1 (0.54) HSD17B10CYP3A4ALOX15MAPTGAA
SCHEMBL6853626 0.92 GAA (0.47) HSD17B10CYP3A4ALOX15MAPTGAA
SCHEMBL4608574 0.90 PBRM1 (0.58) MAPTGAALMNAL3MBTL1MAPK1
SCHEMBL9328747 0.90 SRD5A2 (0.58) MAPTGAAL3MBTL1KDM4EPOLB
SCHEMBL5595306 0.84 LCK (0.55) HSD17B10CYP3A4ALOX15MAPTGAA
SCHEMBL180385 0.84 KDM4E (0.64) HSD17B10CYP3A4ALOX15MAPTGAA
SCHEMBL21369269 0.84 ALDH1A1 (0.58) MAPTGAAHTTLMNAL3MBTL1
SCHEMBL9306191 0.82 KDM4E (0.61) HSD17B10CYP3A4ALOX15MAPTGAA
Hydrochloric Acid SCHEMBL9797575 0.82 MAPT (0.61) HSD17B10CYP3A4ALOX15MAPTGAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 277 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024216910-A1 HIGH-CHEMICAL-RESISTANCE POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PREPARATION METHOD THEREFOR, AND USE THEREOF 明士(北京)新材料开发有限公司 2024-10-24 WO claimed
WO-2022068900-A1 POSITIVE PHOTOSENSITIVE POLYAMIDE ESTER RESIN AND COMPOSITION USING SAME 明士(北京)新材料开发有限公司 2022-04-07 WO claimed
US-20160009862-A1 TRANSPARENT POLYMER FILM AND ELECTRONIC DEVICE INCLUDING THE SAME SAMSUNG ELECTRONICS CO., LTD. (KR) 2016-01-14 US claimed
EP-1023168-B1 FIBER-REINFORCED PHTHALONITRILE COMPOSITE CURED WITH LOW-REACTIVITY AROMATIC AMINE CURING AGENT US GOV SEC NAVY (US) 2004-11-24 EP claimed
US-6001926-A Fiber-reinforced phthalonitrile composite cured with low-reactivity aromatic amine curing agent THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE NAVY (US) 1999-12-14 US claimed
US-4927736-A Hydroxy polyimides and high temperature positive photoresists therefrom HOECHST CELANESE CORPORATION (US) 1990-05-22 US claimed
US-12422750-B2 Method of manufacturing cured film, photocurable resin composition, method of manufacturing laminate, and method of manufacturing semiconductor device FUJIFILM CORPORATION (JP) 2025-09-23 US disclosed
EP-4597225-A1 FILM PRODUCTION METHOD, PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT PRODUCTION METHOD, CURED PRODUCT, AND LAMINATE FUJIFILM Corporation (JP) 2025-08-06 EP disclosed
EP-4596607-A1 RESIN COMPOSITION, CURED OBJECT, LAYERED PRODUCT, METHOD FOR PRODUCING CURED OBJECT, METHOD FOR PRODUCING LAYERED PRODUCT, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE FUJIFILM Corporation (JP) 2025-08-06 EP disclosed
US-12365763-B2 Phthalonitrile resins, methods of making same and compositions thereof HUNTSMAN ADVANCED MATERIALS AMERICAS LLC 2025-07-22 US disclosed
US-20250230283-A1 RESIN COMPOSITION, CURED SUBSTANCE, LAMINATE, MANUFACTURING METHOD FOR CURED SUBSTANCE, MANUFACTURING METHOD FOR LAMINATE, MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE FUJIFILM CORPORATION (JP) 2025-07-17 US disclosed
EP-4398289-B1 CURED PRODUCT PRODUCTION METHOD, LAMINATE PRODUCTION METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD, AND PROCESSING LIQUID FUJIFILM CORP (JP) 2025-07-02 EP disclosed
WO-2025013517-A1 RESIN COMPOSITION, CURED PRODUCT, LAMINATE, AND METHOD FOR PRODUCING CURED PRODUCT 富士フイルム株式会社 2025-01-16 WO disclosed
US-4055543-A Chain-extending Schiff base terminated polyimides and method of preparation ALELIO GAETANO FRANCIS D 1977-10-25 US disclosed
US-4026871-A Chain-extending phenolic end-capped polyimides UNIVERSITY OF NOTRE DAME (US) 1977-05-31 US disclosed
US-4026833-A CROSSLINKED FOAMS UNIVERSITY OF NOTRE DAME (US) 1977-05-31 US disclosed
US-4026904-A Aromatic epoxy-terminated polyimides UNIVERSITY OF NOTRE DAME (US) 1977-05-31 US disclosed
US-3998786-A USEFUL FOR PREPARING COATINGS UNIVERSITY OF NOTRE DAME DU LAC (US) 1976-12-21 US disclosed
US-3996196-A Polyimide-metallo-phthalocyanines and their preparation UNIVERSITY OF NOTRE DAME DU LAC (US) 1976-12-07 US disclosed
US-3987003-A THERMALLY STABLE DIOXO AND DITHIO-BENZISOQUINOLINE COMPOSITIONS AND PROCESS OF SYNTHESIZING SAME THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE AIR FORCE (US) 1976-10-19 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12365763-B2 Phthalonitrile resins, methods of making same and compositions thereof PNN, PAH, CUL4B HSD17B10 2904/4885CYP3A4 2081/4885ALOX15 1621/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.