SCHEMBL7668034

SCHEMBL7668034

CCC1(OC(=O)C2CC3C=CC2C3)C[Si](C)(C)C(C)(C)[Si](C)(C)C1

nearest known ligand 0.36

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 1/20 0.36
LMNA P02545 1/20 0.36
ALDH1A1 P00352 6/20 0.35
HPGD P15428 1/20 0.35
KMT2A Q03164 2/20 0.34
POLB P06746 2/20 0.34
RAB9A P51151 1/20 0.34
APEX1 P27695 1/20 0.33
RECQL P46063 1/20 0.33
BLM P54132 1/20 0.33
ESR2 Q92731 1/20 0.33
HSD17B10 Q99714 1/20 0.33
TDP1 Q9NUW8 1/20 0.33
L3MBTL1 Q9Y468 1/20 0.33
MAPK1 P28482 1/20 0.32
HSD11B1 P28845 2/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7667928 0.86 ALDH1A1 (0.37) KDM4ELMNAALDH1A1HPGDKMT2A
SCHEMBL7667945 0.81 KDM4E (0.37) KDM4ELMNAALDH1A1HPGDKMT2A
SCHEMBL3434470 0.80 LMNA (0.41) KDM4ELMNAALDH1A1HPGDKMT2A
SCHEMBL7671705 0.80 ALDH1A1 (0.35) KDM4ELMNAALDH1A1HPGDKMT2A
SCHEMBL22263664 0.79 LMNA (0.40) KDM4ELMNAALDH1A1HPGDKMT2A
SCHEMBL13409255 0.79 LMNA (0.40) KDM4ELMNAALDH1A1HPGDKMT2A
SCHEMBL1410180 0.79 LMNA (0.40) KDM4ELMNAALDH1A1HPGDKMT2A
SCHEMBL7666998 0.76 KDM4E (0.33) KDM4ELMNAALDH1A1HPGDKMT2A
SCHEMBL7269169 0.76 LMNA (0.37) KDM4ELMNAALDH1A1HPGDKMT2A
Maleic Anhydride SCHEMBL7262875 0.74 ALDH1A1 (0.35) KDM4ELMNAALDH1A1HPGDKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6492089-B2 POLYMER BEARING CYCLIC SILICON-CONTAINING GROUPS SUCH AS 1,4,4-TRIMETHYL-4-SILACYCLOHEXYL METHACRYLATE; USE AS CHEMICALLY AMPLIFIED POSITIVE RESIST SHIN-ETSU CHEMICAL CO., LTD. (JP) 2002-12-10 US disclosed
US-20010003772-A1 Polymer, resist composition and patterning process SHIN-ETSU CHEMICDL CO., LTD. OF (JP) 2001-06-14 US disclosed