SCHEMBL7684673

SCHEMBL7684673

CCOC(=O)C(Cc1ccc(OC)c(OC)c1)CN1CCCCC1

nearest known ligand 0.52

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
OPRD1 P41143 1/20 0.52
OPRK1 P41145 1/20 0.52
LMNA P02545 2/20 0.51
KDM4E B2RXH2 1/20 0.50
LDHA P00338 1/20 0.48
TSHR P16473 1/20 0.47
SMN1; SMN2 Q16637 1/20 0.46
ALDH1A1 P00352 3/20 0.46
MEN1 O00255 2/20 0.46
KMT2A Q03164 2/20 0.46
ATM Q13315 1/20 0.46
CA12 O43570 2/20 0.45
CA1 P00915 2/20 0.45
CA2 P00918 2/20 0.45
CA9 Q16790 2/20 0.45
POLB P06746 1/20 0.44
CYP2C19 P33261 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL7688076 0.99 LMNA (0.53) OPRD1OPRK1LMNAKDM4ELDHA
SCHEMBL7682400 0.87 LDHA (0.58) OPRD1OPRK1KDM4ELDHATSHR
SCHEMBL1478245 0.80 EPHX2 (0.48) OPRK1KDM4ETSHRSMN1; SMN2ALDH1A1
SCHEMBL6778533 0.78 LMNA (0.55) LMNAKDM4ELDHASMN1; SMN2ATM
SCHEMBL9008064 0.77 LDHA (0.54) LMNALDHASMN1; SMN2CA12CA1
SCHEMBL491026 0.76 LDHA (0.71) LMNALDHASMN1; SMN2ALDH1A1MEN1
SCHEMBL20382349 0.75 ALDH1A1 (0.48) OPRD1OPRK1KDM4ETSHRSMN1; SMN2
SCHEMBL7684481 0.74 SIGMAR1 (0.56) LMNAKDM4ESMN1; SMN2MEN1KMT2A
SCHEMBL20382390 0.73 KDM4E (0.47) OPRD1OPRK1KDM4ETSHRSMN1; SMN2
SCHEMBL7296827 0.73 LDHA (0.59) LMNALDHASMN1; SMN2ALDH1A1CA12

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6492522-B1 OPTICAL ISOMERS AND SALTS WITH 4-PYRIDINECARBOXALDEHYDE IN THE PRESENCE OF BASE TO GIVE A COMPOUND OF THE FORMULA REACTING THE COMPOUND OBTAINED IN STEP B) ABOVE OR A SALT THEREOF WITH A COMPOUND OF FORMULA R.SUP.10 X, WHEREIN R.SUP.10, FINETECH LABORATORIES LTD. (IL) 2002-12-10 US disclosed
EP-1129073-A2 PROCESS AND INTERMEDIATES FOR PRODUCTION OF DONEPEZIL AND RELATED COMPOUNDS Finetech Ltd (IL) 2001-09-05 EP disclosed
WO-2000009483-A2 PROCESS AND INTERMEDIATES FOR PRODUCTION OF DONEPEZIL AND RELATED COMPOUNDS FINETECH LTD. (IL) 2000-02-24 WO disclosed