SCHEMBL770265

SCHEMBL770265

CC(=O)Oc1ccc(CCSCCC[Si](CO)(CO)CO)cc1

nearest known ligand 0.43

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 2/20 0.43
NPC1 O15118 1/20 0.43
RAB9A P51151 1/20 0.43
PTGS2 P35354 2/20 0.40
LMNA P02545 1/20 0.38
GLS O94925 2/20 0.38
KMT2A Q03164 3/20 0.37
MEN1 O00255 2/20 0.37
CACNA1B Q00975 1/20 0.37
APBA1 Q02410 1/20 0.37
GAA P10253 1/20 0.36
POLB P06746 1/20 0.36
MAPT P10636 1/20 0.36
PKM P14618 1/20 0.36
THRB P10828 2/20 0.35
ELANE P08246 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL770492 0.86 SMN1; SMN2 (0.45) SMN1; SMN2NPC1RAB9APTGS2LMNA
SCHEMBL17354076 0.84 SMN1; SMN2 (0.43) SMN1; SMN2NPC1RAB9APTGS2LMNA
SCHEMBL769794 0.83 CALM1 (0.45) SMN1; SMN2GLSPOLB
SCHEMBL769785 0.80 PPARA (0.39) SMN1; SMN2
SCHEMBL769795 0.77 CYP1A2 (0.48) SMN1; SMN2GLS
SCHEMBL19755175 0.74 SMN1; SMN2 (0.48) SMN1; SMN2NPC1RAB9APTGS2LMNA
SCHEMBL23894744 0.73 LMNA (0.57) SMN1; SMN2NPC1RAB9APTGS2LMNA
SCHEMBL9081470 0.73 LMNA (0.61) SMN1; SMN2NPC1RAB9APTGS2LMNA
SCHEMBL6662199 0.71 PTGS2 (0.65) SMN1; SMN2NPC1RAB9APTGS2LMNA
SCHEMBL8565931 0.70 NPC1 (0.61) SMN1; SMN2NPC1RAB9APTGS2LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9217921-B2 Resist underlayer film forming composition containing silicon having sulfide bond NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2015-12-22 US disclosed
US-20120070994-A1 RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SILICON HAVING SULFIDE BOND NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2012-03-22 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120070994-A1 RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SILICON HAVING SULFIDE BOND SMC3, SRSF3, SRSF9 SMN1; SMN2 3522/4885NPC1 3432/4885RAB9A 916/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.