Nitrilotriacetic Acid

Nitrilotriacetic Acid

SCHEMBL7713868

O.O=C(O)CN(CC(=O)O)CC(=O)O

nearest known ligand 0.69

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ABCC9ABL1ACEACHEACVR1ADORA1ADORA2AADORA2BADORA3ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALOX5ATP4AATP4BBCRBTKCACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGCRBNCUL4ACXCR1CXCR2DDB1DDCDHFRDPP4DRD2DRD3DRD4EGFRERBB2ERBB4ESR1ESR2FDPSFKBP1AFLT1FLT3FLT4GARTGHSRGRIA1GRIA2GRIA3GRIA4GRIK1GRIK2GRIK3GRIK4GRIK5GRIN2AGSK3AGSK3BHDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IDH1IDH2IMPA1ITGA2BITGB3JAK1JAK2JAK3KCNJ11KCNK3KCNK9KDRKITMEN1METMMP1MMP13MMP7MMP8NANOD2NS5bODC1OPG057OPRD1OPRK1OPRM1PPARP1PARP2PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PKLRPPARDPPATPTGS1PTGS2RBX1ROCK1ROCK2RRM1RRM2RRM2BSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC10A2SLC5A2SLC6A2SLC6A3SLC6A4SLC9A3SYKTACR1THRATHRBTOP1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYK2TYMSVDRampCblablaT-3blaT-4blaT-5blaT-6blaUOE-1dacAdacBdacCfolAfolPftsIgyrAgyrBileSmecAmrcAmrcBmrdAparCparEpbp2pbp4pbpApbpFrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUthyAykgMykgO

The experimentally established mechanism targets of Nitrilotriacetic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ACE known ✓ P12821 1/20 0.69
DRD3 known ✓ P35462 2/20 0.65
CHRM2 known ✓ P08172 1/20 0.65
ADRA2A known ✓ P08913 1/20 0.65
SLC6A2 known ✓ P23975 1/20 0.65
SLC6A4 known ✓ P31645 1/20 0.65
ADRA1A known ✓ P35348 1/20 0.65
SLC6A3 known ✓ Q01959 1/20 0.65
TDP1 Q9NUW8 3/20 0.69
EYA2 O00167 1/20 0.69
APP P05067 1/20 0.69
TSHR P16473 4/20 0.65
LMNA P02545 3/20 0.65
BLM P54132 2/20 0.65
PMP22 Q01453 2/20 0.65
ALOX15 P16050 2/20 0.65
CYP2C19 P33261 2/20 0.65
KDM4E B2RXH2 1/20 0.65
DRD1 P21728 1/20 0.65
HRH3 Q9Y5N1 1/20 0.65

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Nitrilotriacetic Acid SCHEMBL7713873 1.00 TDP1 (0.69) TDP1EYA2APPACETSHR
Nitrilotriacetic Acid SCHEMBL213013 0.96 TDP1 (0.65) TDP1EYA2APPACETSHR
Nitrilotriacetic Acid SCHEMBL3739292 0.96 TDP1 (0.65) TDP1EYA2APPACETSHR
Nitrilotriacetic Acid SCHEMBL5386888 0.96 TDP1 (0.65) TDP1EYA2APPACETSHR
Nitrilotriacetic Acid SCHEMBL10760644 0.96 TDP1 (0.65) TDP1EYA2APPACETSHR
Nitrilotriacetic Acid SCHEMBL213011 0.96 TDP1 (0.65) TDP1EYA2APPACETSHR
Nitrilotriacetic Acid SCHEMBL9129592 0.96 TDP1 (0.65) TDP1EYA2APPACETSHR
Nitrilotriacetic Acid SCHEMBL10760654 0.96 TDP1 (0.65) TDP1EYA2APPACETSHR
Nitrilotriacetic Acid SCHEMBL9771757 0.96 TDP1 (0.73) TDP1EYA2APPACETSHR
Nitrilotriacetic Acid SCHEMBL670055 0.96 TDP1 (0.73) TDP1EYA2APPACETSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 51 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6190443-B1 Polishing composition FUJIMI INCORPORATED (JP) 2001-02-20 US claimed
US-6365568-B1 REACTING AN ALKALI METAL SILICATE WITH AN ALKALI METAL HYDROXIDE IN WATER TO FORM REACTION PRODUCT; SOLIDIFICATION IN MOLD WITHOUT THE ADDITION OF EXTERNALLY SUPPLIED HEAT AND THE REACTION PRODUCT SOLIDIFIES WITHOUT EXTERNAL COOLING ECOLAB INC. 2002-04-02 US disclosed
US-6190443-B1 Polishing composition FUJIMI INCORPORATED (JP) 2001-02-20 US disclosed
US-5955251-A SURFACE TREATMENT OF FILM SUPPORTS AND SUBBING LAYERS KONICA CORPORATION (JP) 1999-09-21 US disclosed
US-5728513-A PHOTOGRAPHIC FILMS WITH SILVER IODOBROMIDE, SENSITIZER DYE AND COUPLER IN EMULSION KONICA CORPORATION (JP) 1998-03-17 US disclosed
EP-0569445-B1 PROCESS FOR MANUFACTURING CAST SILICATE-BASED DETERGENT ECOLAB INC (US) 1997-06-11 EP disclosed
US-H1609-H Silver halide photographic emulsion KONDO TOSHIYA (JP) 1996-11-05 US disclosed
US-H1594-H MULTILAYER FILM WITH SUPPORT AND LAYERS KONICA CORPORATION (JP) 1996-09-03 US disclosed
US-5534400-A PYRAZOLONE MAGENTA COUPLERS KONICA CORPORATION (JP) 1996-07-09 US disclosed
US-5519106-A COLORLESS MITSUBISHI CHEMICAL CORPORATION (JP) 1996-05-21 US disclosed
US-4925783-A FORMED BY ADDING SPECTRAL SENSITIZING DYE DURING DESALTING KONICA CORPORATION (JP) 1990-05-15 US disclosed
US-4356258-A AN ACYLACETANILIDE DERIVATIVE; IMAGE PRESERVATION KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1982-10-26 US disclosed
US-4326022-A FOR A HYDROPHOBIC COUPLER IN A SILVER HALIDE EMULSION KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1982-04-20 US disclosed
US-4275148-A THIO SUBSTITUTED PYRAZOLINES AS MAGENTA COUPLERS KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1981-06-23 US disclosed
US-4264721-A AN ACYLAMIDE YELLOW COUPLER AND A 5-THIA-1,2,4-TRIAZOLE KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1981-04-28 US disclosed
US-4263397-A SEALING A PACKAGE OF FILM HAVING A SILVER HALIDE EMULSION LAYER CONTAINING A SENSITIZING OR DESENSITIZING DYE; OXYGEN PERMEABILITY KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1981-04-21 US disclosed
US-4069051-A Silver halide photosensitive element sensitized with an inorganic bismuth compound and the use thereof KONISHIROKU PHOTO INDUSTRY CO., LTD. (JA) 1978-01-17 US disclosed
US-4026706-A Silver halide multilayer photosensitive material KONISHIROKU PHOTO INDUSTRY CO., LTD. (JA) 1977-05-31 US disclosed
US-4022712-A CORROSION REDUCTION OLIN CORPORATION (US) 1977-05-10 US disclosed
US-3956379-A Process for recovering NTA ETHYL CORPORATION (US) 1976-05-11 US disclosed