SCHEMBL7716644

SCHEMBL7716644

CC1CC2C=CC1(OC(=O)c1cccc3ccccc13)O2

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 4/20 0.38
POLB P06746 3/20 0.38
GAA P10253 1/20 0.38
KDM4E B2RXH2 4/20 0.37
NPC1 O15118 2/20 0.37
RAB9A P51151 2/20 0.37
MAPK1 P28482 2/20 0.37
CDC25B P30305 1/20 0.36
NR4A1 P22736 1/20 0.36
NR4A2 P43354 1/20 0.36
NR4A3 Q92570 1/20 0.36
HRH3 Q9Y5N1 2/20 0.36
PLK1 P53350 1/20 0.36
UTS2R Q9UKP6 1/20 0.36
PTK2B Q14289 1/20 0.35
L3MBTL1 Q9Y468 1/20 0.35
ALDH1A1 P00352 3/20 0.35
BCHE P06276 1/20 0.35
MEN1 O00255 1/20 0.34
GMNN O75496 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7716682 0.74 KMT2A (0.39) KMT2APOLBGAAKDM4ERAB9A
SCHEMBL2899391 0.67 KMT2A (0.42) KMT2APOLBGAAKDM4ENPC1
SCHEMBL7600356 0.65 ALDH1A1 (0.41) KMT2APOLBGAAKDM4ENR4A1
SCHEMBL4981052 0.65 KMT2A (0.40) KMT2APOLBGAAKDM4ERAB9A
SCHEMBL3807750 0.64 NR4A1 (0.59) KMT2APOLBGAAKDM4ENPC1
Ethylene SCHEMBL10012407 0.64 NR4A1 (0.59) KMT2APOLBGAAKDM4ENPC1
SCHEMBL5697630 0.64 NR4A1 (0.59) KMT2APOLBGAAKDM4ENPC1
SCHEMBL522791 0.64 MAPT (0.63) KMT2APOLBGAAKDM4ECDC25B
SCHEMBL29580762 0.64 MAPT (0.63) KMT2APOLBGAAKDM4ECDC25B
SCHEMBL137605 0.64 NR4A1 (0.63) KMT2APOLBGAAKDM4ENPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6372854-B1 POLYALKENAMERS USED AS PHOTORESISTS HAVING EXCELLENT OPTICAL ELECTRICAL PROPERTIES; HIGH RIGIDITY; HEAT RESISTANCE; ADHESION AND WEAR RESISTANCE; HYDROGENATION; ACIDOLYSIS MITSUI CHEMICALS, INC. (JP) 2002-04-16 US disclosed