SCHEMBL7728340

SCHEMBL7728340

C=CC(=O)OC(C(=O)C=C)(C(=O)C=C)C(CO)(CO)COC(=O)c1ccc(N)cc1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 4/20 0.40
LMNA P02545 3/20 0.40
CYP1A2 P05177 3/20 0.40
MAOA P21397 2/20 0.40
TSHR P16473 2/20 0.37
CYP2C9 P11712 1/20 0.37
CYP2C19 P33261 1/20 0.37
PDE4D Q08499 1/20 0.37
PHLPP2 Q6ZVD8 1/20 0.36
NPC1 O15118 2/20 0.36
RAB9A P51151 2/20 0.36
ALDH1A1 P00352 2/20 0.36
MAPT P10636 2/20 0.36
CYP2D6 P10635 2/20 0.35
HTR3A P46098 1/20 0.35
HRH3 Q9Y5N1 1/20 0.35
ADRB2 P07550 2/20 0.35
ADRB1 P08588 2/20 0.35
ADRB3 P13945 2/20 0.35
BLM P54132 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Aminobenzoic Acid SCHEMBL7728346 0.84 ALDH1A1 (0.33) CYP3A4LMNACYP1A2MAOATSHR
SCHEMBL7721922 0.82 ALDH1A1 (0.31) CYP3A4ALDH1A1MAPK1HIF1ATP53
SCHEMBL8361883 0.74 ALDH1A1 (0.42) CYP3A4TSHRALDH1A1MAPK1HIF1A
SCHEMBL6802558 0.74 LMNA (0.43) CYP3A4LMNACYP1A2MAOATSHR
3-Aminobenzoic Acid SCHEMBL7726622 0.73 PBRM1 (0.38) LMNANPC1ALDH1A1ADRB2ADRB1
SCHEMBL23484508 0.70 NPC1 (0.58) CYP3A4LMNACYP1A2MAOATSHR
Acrylic Acid SCHEMBL29942413 0.70 ALDH1A1 (0.39) CYP3A4LMNATSHRALDH1A1MAPK1
Aminobenzoic Acid SCHEMBL7730847 0.70 ALDH1A1 (0.31) CYP3A4ALDH1A1MAPK1HIF1ATP53
SCHEMBL9067962 0.68 LMNA (0.59) CYP3A4LMNACYP1A2MAOATSHR
SCHEMBL5694279 0.68 ALDH1A1 (0.63) CYP3A4LMNACYP1A2MAOATSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5886136-A Pattern forming process NIPPON ZEON CO., LTD. (JP) 1999-03-23 US claimed
US-6403289-B1 ALKALINE SOLUTION CONTAINING PHOTOPOLYMERIZABLE POLYAMIC ACID, BENZYLTRIALKYLAMMONIUM (OR PHOSPHONIUM) SALT OR BENZYLTRIARYLAMMONIUM (OR PHOSPHONIUM) SALT AND BASE; SEMICONDUCTORS NIPPON ZEON CO., LTD. (JP) 2002-06-11 US disclosed
US-6160081-A Photosensitive polyimide resin composition NIPPON ZEON CO., LTD. (JP) 2000-12-12 US disclosed
US-5886136-A Pattern forming process NIPPON ZEON CO., LTD. (JP) 1999-03-23 US disclosed
US-5777068-A Photosensitive polyimide resin composition NIPPON ZEON CO., LTD. (JP) 1998-07-07 US disclosed
EP-0702270-A2 Photosensitive polyimide resin composition NIPPON ZEON CO., LTD. (JP) 1996-03-20 EP disclosed