Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | TP53 | P04637 | 1/20 | 0.31 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.31 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.31 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.31 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7726613 | 0.83 | ADRB2 (0.39) | ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2 | |
| SCHEMBL7728340 | 0.82 | CYP3A4 (0.40) | ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2 | |
| 3-Aminobenzoic Acid SCHEMBL7726622 | 0.79 | PBRM1 (0.38) | ALDH1A1 | |
| Aminobenzoic Acid SCHEMBL7728346 | 0.78 | ALDH1A1 (0.33) | ALDH1A1TP53CYP3A4HIF1A | |
| SCHEMBL7733535 | 0.76 | NPC1 (0.32) | — | |
| SCHEMBL8361883 | 0.71 | ALDH1A1 (0.42) | ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2 | |
| Anthranilic Acid SCHEMBL7728935 | 0.70 | HSD17B10 (0.41) | ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2 | |
| Acrylic Acid SCHEMBL29942413 | 0.70 | ALDH1A1 (0.39) | ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2 | |
| SCHEMBL9478551 | 0.69 | HIF1A (0.49) | ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2 | |
| SCHEMBL11422134 | 0.68 | HKDC1 (0.38) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6403289-B1 | ALKALINE SOLUTION CONTAINING PHOTOPOLYMERIZABLE POLYAMIC ACID, BENZYLTRIALKYLAMMONIUM (OR PHOSPHONIUM) SALT OR BENZYLTRIARYLAMMONIUM (OR PHOSPHONIUM) SALT AND BASE; SEMICONDUCTORS | NIPPON ZEON CO., LTD. (JP) | 2002-06-11 | — | — | US | disclosed |
| US-6160081-A | Photosensitive polyimide resin composition | NIPPON ZEON CO., LTD. (JP) | 2000-12-12 | — | — | US | disclosed |
| US-5886136-A | Pattern forming process | NIPPON ZEON CO., LTD. (JP) | 1999-03-23 | — | — | US | disclosed |
| US-5777068-A | Photosensitive polyimide resin composition | NIPPON ZEON CO., LTD. (JP) | 1998-07-07 | — | — | US | disclosed |
| EP-0702270-A2 | Photosensitive polyimide resin composition | NIPPON ZEON CO., LTD. (JP) | 1996-03-20 | — | — | EP | disclosed |