Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 3/20 | 0.43 |
| ▸ | CYP1A2 | P05177 | 3/20 | 0.43 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.43 |
| ▸ | MAOA | P21397 | 2/20 | 0.43 |
| ▸ | TSHR | P16473 | 2/20 | 0.40 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.40 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.40 |
| ▸ | PDE4D | Q08499 | 1/20 | 0.40 |
| ▸ | PHLPP2 | Q6ZVD8 | 1/20 | 0.39 |
| ▸ | NPC1 | O15118 | 2/20 | 0.39 |
| ▸ | RAB9A | P51151 | 2/20 | 0.39 |
| ▸ | MAPT | P10636 | 2/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.39 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.38 |
| ▸ | HTR3A | P46098 | 1/20 | 0.38 |
| ▸ | HRH3 | Q9Y5N1 | 1/20 | 0.38 |
| ▸ | ADRB2 | P07550 | 2/20 | 0.38 |
| ▸ | ADRB1 | P08588 | 2/20 | 0.38 |
| ▸ | ADRB3 | P13945 | 2/20 | 0.38 |
| ▸ | BLM | P54132 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7728821 | 0.86 | ADRB2 (0.41) | LMNANPC1RAB9AALDH1A1ADRB2 | |
| SCHEMBL6806182 | 0.84 | ADRB2 (0.42) | LMNACYP1A2CYP3A4CYP2C9CYP2C19 | |
| Aminobenzoic Acid SCHEMBL6802563 | 0.84 | HTT (0.40) | LMNACYP1A2CYP3A4MAOATSHR | |
| SCHEMBL7721993 | 0.82 | ALDH1A1 (0.47) | CYP3A4TSHRNPC1RAB9AALDH1A1 | |
| SCHEMBL7733535 | 0.82 | NPC1 (0.32) | NPC1POLBAPEX1HTTTDP1 | |
| SCHEMBL8578222 | 0.81 | — | — | |
| SCHEMBL8362147 | 0.79 | CA12 (0.35) | TSHRCYP2C19NPC1ALDH1A1GAA | |
| SCHEMBL8362150 | 0.77 | ALDH1A1 (0.44) | TSHRCYP2C19NPC1ALDH1A1CYP2D6 | |
| SCHEMBL8578226 | 0.77 | — | — | |
| SCHEMBL8362090 | 0.74 | ALDH1A1 (0.38) | TSHRALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5886136-A | Pattern forming process | NIPPON ZEON CO., LTD. (JP) | 1999-03-23 | — | — | US | claimed |
| US-5777068-A | Photosensitive polyimide resin composition | NIPPON ZEON CO., LTD. (JP) | 1998-07-07 | — | — | US | claimed |
| EP-0702270-A2 | Photosensitive polyimide resin composition | NIPPON ZEON CO., LTD. (JP) | 1996-03-20 | — | — | EP | claimed |
| US-20140087136-A1 | RESIN COMPOSITION AND SEMICONDUCTOR DEVICE BOARD | ZEON CORPORATION (JP) | 2014-03-27 | — | — | US | disclosed |
| US-6743851-B2 | MIXTURE CONTAINING TETRAZOLE | NIPPON ZEON CO., LTD. (JP) | 2004-06-01 | — | — | US | disclosed |
| US-6734248-B2 | CONTAINING A 1H-TETRAZOLE OR A 5,5'-BIS-1H-TETRAZOLE | NIPPON ZEON CO., LTD. (JP) | 2004-05-11 | — | — | US | disclosed |
| EP-0822229-B1 | POLYIMIDE RESIN COMPOSITION | NIPPON ZEON CO (JP) | 2003-07-30 | — | — | EP | disclosed |
| US-6403289-B1 | ALKALINE SOLUTION CONTAINING PHOTOPOLYMERIZABLE POLYAMIC ACID, BENZYLTRIALKYLAMMONIUM (OR PHOSPHONIUM) SALT OR BENZYLTRIARYLAMMONIUM (OR PHOSPHONIUM) SALT AND BASE; SEMICONDUCTORS | NIPPON ZEON CO., LTD. (JP) | 2002-06-11 | — | — | US | disclosed |
| US-20020035196-A1 | Polyimide film | TANAKA AKIRA (JP) | 2002-03-21 | — | — | US | disclosed |
| US-20020032273-A1 | Pattern forming process using polyimide resin composition | TANAKA AKIRA (JP) | 2002-03-14 | — | — | US | disclosed |
| US-6310135-B1 | PHOTOSENSITIVE RESINS WITH TETRAZOLE COMPOUND | NIPPON ZEON CO., LTD. (JP) | 2001-10-30 | — | — | US | disclosed |
| US-6160081-A | Photosensitive polyimide resin composition | NIPPON ZEON CO., LTD. (JP) | 2000-12-12 | — | — | US | disclosed |
| US-5886136-A | Pattern forming process | NIPPON ZEON CO., LTD. (JP) | 1999-03-23 | — | — | US | disclosed |
| US-5777068-A | Photosensitive polyimide resin composition | NIPPON ZEON CO., LTD. (JP) | 1998-07-07 | — | — | US | disclosed |
| EP-0822229-A1 | POLYIMIDE RESIN COMPOSITION | NIPPON ZEON CO., LTD. (JP) | 1998-02-04 | — | — | EP | disclosed |
| EP-0702270-A2 | Photosensitive polyimide resin composition | NIPPON ZEON CO., LTD. (JP) | 1996-03-20 | — | — | EP | disclosed |