Aminobenzoic Acid

Aminobenzoic Acid

SCHEMBL7728346

C=CC(=O)OC(C(=O)C=C)(C(=O)C=C)C(CO)(CO)CO.Nc1ccc(C(=O)O)cc1

nearest known ligand 0.33

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.33
L3MBTL1 Q9Y468 1/20 0.33
LMNA P02545 1/20 0.31
CYP1A2 P05177 1/20 0.31
CYP3A4 P08684 1/20 0.31
MAOA P21397 1/20 0.31
PIN1 Q13526 1/20 0.31
TP53 P04637 1/20 0.31
TSHR P16473 1/20 0.31
KDM4E B2RXH2 2/20 0.31
MAPT P10636 2/20 0.31
HIF1A Q16665 1/20 0.31
SLC22A6 Q4U2R8 1/20 0.31
SLC22A8 Q8TCC7 1/20 0.31
NPC1 O15118 2/20 0.30
RAB9A P51151 2/20 0.30
CSNK2A2 P19784 1/20 0.30
CSNK2B P67870 1/20 0.30
CSNK2A1 P68400 1/20 0.30
CSNK2A3 Q8NEV1 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
3-Aminobenzoic Acid SCHEMBL7726622 0.85 PBRM1 (0.38) ALDH1A1LMNAKDM4ENPC1MITF
SCHEMBL7728340 0.84 CYP3A4 (0.40) ALDH1A1LMNACYP1A2CYP3A4MAOA
Aminobenzoic Acid SCHEMBL7730844 0.83 ALDH1A1 (0.31) ALDH1A1CYP3A4TP53HIF1A
Anthranilic Acid SCHEMBL7728935 0.81 HSD17B10 (0.41) ALDH1A1L3MBTL1CYP3A4TP53TSHR
SCHEMBL8361883 0.80 ALDH1A1 (0.42) ALDH1A1CYP3A4TP53TSHRHIF1A
Aminobenzoic Acid SCHEMBL7730847 0.79 ALDH1A1 (0.31) ALDH1A1CYP3A4TP53HIF1A
SCHEMBL7721922 0.78 ALDH1A1 (0.31) ALDH1A1CYP3A4TP53HIF1A
Adipic Acid SCHEMBL11653632 0.75 ABCC4 (0.38) ALDH1A1LMNACYP3A4TP53TSHR
SCHEMBL7726613 0.73 ADRB2 (0.39) ALDH1A1CYP3A4TP53KDM4EMAPT
Aminobenzoic Acid SCHEMBL6802563 0.72 HTT (0.40) ALDH1A1LMNACYP1A2CYP3A4MAOA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5886136-A Pattern forming process NIPPON ZEON CO., LTD. (JP) 1999-03-23 US claimed
US-6403289-B1 ALKALINE SOLUTION CONTAINING PHOTOPOLYMERIZABLE POLYAMIC ACID, BENZYLTRIALKYLAMMONIUM (OR PHOSPHONIUM) SALT OR BENZYLTRIARYLAMMONIUM (OR PHOSPHONIUM) SALT AND BASE; SEMICONDUCTORS NIPPON ZEON CO., LTD. (JP) 2002-06-11 US disclosed
US-6160081-A Photosensitive polyimide resin composition NIPPON ZEON CO., LTD. (JP) 2000-12-12 US disclosed
US-5886136-A Pattern forming process NIPPON ZEON CO., LTD. (JP) 1999-03-23 US disclosed
US-5777068-A Photosensitive polyimide resin composition NIPPON ZEON CO., LTD. (JP) 1998-07-07 US disclosed
EP-0702270-A2 Photosensitive polyimide resin composition NIPPON ZEON CO., LTD. (JP) 1996-03-20 EP disclosed