SCHEMBL7728821

SCHEMBL7728821

C=C(C)C(=O)OC(C(=O)C(=C)C)(C(=O)C(=C)C)C(CO)(CO)COC(=O)c1cccc(N)c1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ADRB2 P07550 2/20 0.41
ADRB1 P08588 2/20 0.41
ADRB3 P13945 2/20 0.41
CHRNB2 P17787 1/20 0.38
CHRNA4 P43681 1/20 0.38
ELANE P08246 3/20 0.35
KDM4E B2RXH2 1/20 0.34
ALDH1A1 P00352 1/20 0.34
MAPK1 P28482 2/20 0.33
HIF1A Q16665 1/20 0.33
PBRM1 Q86U86 1/20 0.33
NPC1 O15118 1/20 0.32
MITF O75030 1/20 0.32
LMNA P02545 1/20 0.32
POLB P06746 1/20 0.32
CDC25B P30305 2/20 0.32
SLC7A5 Q01650 2/20 0.32
CYP4F2 P78329 1/20 0.32
CYP4A11 Q02928 1/20 0.32
RAB9A P51151 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6802558 0.86 LMNA (0.43) ADRB2ADRB1ADRB3ALDH1A1MAPK1
3-Aminobenzoic Acid SCHEMBL7728826 0.85 PBRM1 (0.38) ADRB2ADRB1ADRB3ELANEKDM4E
SCHEMBL7733535 0.83 NPC1 (0.32) NPC1POLB
SCHEMBL7721993 0.81 ALDH1A1 (0.47) KDM4EALDH1A1MAPK1HIF1ANPC1
SCHEMBL7726613 0.76 ADRB2 (0.39) ADRB2ADRB1ADRB3CHRNB2CHRNA4
SCHEMBL6806182 0.76 ADRB2 (0.42) ADRB2ADRB1ADRB3KDM4EALDH1A1
3-Aminobenzoic Acid SCHEMBL7728353 0.74 PBRM1 (0.32) ADRB2ADRB1ADRB3KDM4EALDH1A1
SCHEMBL8578222 0.73
Aminobenzoic Acid SCHEMBL6802563 0.73 HTT (0.40) ELANEKDM4EALDH1A1HIF1ANPC1
3-Aminobenzoic Acid SCHEMBL8361933 0.72

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5886136-A Pattern forming process NIPPON ZEON CO., LTD. (JP) 1999-03-23 US claimed
US-6403289-B1 ALKALINE SOLUTION CONTAINING PHOTOPOLYMERIZABLE POLYAMIC ACID, BENZYLTRIALKYLAMMONIUM (OR PHOSPHONIUM) SALT OR BENZYLTRIARYLAMMONIUM (OR PHOSPHONIUM) SALT AND BASE; SEMICONDUCTORS NIPPON ZEON CO., LTD. (JP) 2002-06-11 US disclosed
US-6160081-A Photosensitive polyimide resin composition NIPPON ZEON CO., LTD. (JP) 2000-12-12 US disclosed
US-5777068-A Photosensitive polyimide resin composition NIPPON ZEON CO., LTD. (JP) 1998-07-07 US disclosed
EP-0702270-A2 Photosensitive polyimide resin composition NIPPON ZEON CO., LTD. (JP) 1996-03-20 EP disclosed