SCHEMBL775863

SCHEMBL775863

O=S(=O)(NCCC1CC2C=CC1C2)C(F)(F)F

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
EPHX1 P07099 1/20 0.36
KDM4E B2RXH2 5/20 0.34
CA1 P00915 1/20 0.33
CA2 P00918 1/20 0.33
ALDH1A1 P00352 3/20 0.33
CNR2 P34972 2/20 0.32
CNR1 P21554 1/20 0.32
PKM P14618 2/20 0.32
MEN1 O00255 3/20 0.32
KMT2A Q03164 3/20 0.32
CYP1A2 P05177 1/20 0.32
CYP3A4 P08684 1/20 0.32
CYP2D6 P10635 1/20 0.32
CYP2C19 P33261 1/20 0.32
ATM Q13315 1/20 0.32
EPHX2 P34913 2/20 0.31
TDP1 Q9NUW8 1/20 0.31
IL1B P01584 1/20 0.31
POLB P06746 1/20 0.30
NPSR1 Q6W5P4 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8531194 0.91 EPHX1 (0.41) EPHX1KDM4ECA1CA2ALDH1A1
SCHEMBL775569 0.84 KDM4E (0.35) EPHX1KDM4ECA2ALDH1A1PKM
SCHEMBL15492288 0.80 KDM4E (0.35) KDM4EALDH1A1PKMMEN1KMT2A
SCHEMBL12943492 0.80 KDM4E (0.42) KDM4EALDH1A1PKMMEN1KMT2A
SCHEMBL14280196 0.77 KDM4E (0.32) KDM4EALDH1A1PKMEPHX2
SCHEMBL2632934 0.76 KDM4E (0.34) KDM4EALDH1A1PKMMEN1KMT2A
SCHEMBL21716111 0.75 KDM4E (0.32) KDM4EPKMEPHX2
SCHEMBL12198886 0.73 KDM4E (0.35) KDM4EALDH1A1MEN1KMT2ACYP1A2
SCHEMBL13237669 0.72 KDM4E (0.34) KDM4EALDH1A1PKMMEN1KMT2A
SCHEMBL21716076 0.72 KDM4E (0.34) KDM4EALDH1A1MEN1KMT2ACYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 111 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9671693-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-06-06 US disclosed
US-9671693-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-06-06 US disclosed
US-9507258-B2 Resin and photoresist composition comprising the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-11-29 US disclosed
US-9507258-B2 Resin and photoresist composition comprising the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-11-29 US disclosed
US-9488914-B2 Fluorine-containing sulfonic acid salt, fluorine-containing sulfonic acid salt resin, resist composition, and pattern forming method using same CENTRAL GLASS COMPANY, LIMITED (JP) 2016-11-08 US disclosed
US-9488914-B2 Fluorine-containing sulfonic acid salt, fluorine-containing sulfonic acid salt resin, resist composition, and pattern forming method using same CENTRAL GLASS COMPANY, LIMITED (JP) 2016-11-08 US disclosed
US-9360754-B2 Resin and photoresist composition comprising the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-06-07 US disclosed
US-9360754-B2 Resin and photoresist composition comprising the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-06-07 US disclosed
US-9291893-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-03-22 US disclosed
US-9291893-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-03-22 US disclosed
US-20090118539-A1 forming diastereomeric mixture of norbornenecarbonitrile via Diels-Alder reaction, separating, converting to diastereomeric norbornenecarboxaldehyde, and norbornenecarboxylic acid and alcohol; methathesis ring-opening polymerization PROMERUS, LLC (US) 2009-05-07 US disclosed
US-20090118539-A1 forming diastereomeric mixture of norbornenecarbonitrile via Diels-Alder reaction, separating, converting to diastereomeric norbornenecarboxaldehyde, and norbornenecarboxylic acid and alcohol; methathesis ring-opening polymerization PROMERUS, LLC (US) 2009-05-07 US disclosed
US-7524977-B2 Process for producing fluoroalkanesulfonamide derivatives CENTRAL GLASS COMPANY, LIMITED (JP) 2009-04-28 US disclosed
EP-2031007-A2 Norbornene-type polymers, compositions thereof and lithographic processes using such compositions Promerus LLC (US) 2009-03-04 EP disclosed
WO-2008121804-A1 USE OF A COMBINATION CHAIN TRANSFER AND ACTIVATING AGENT TO CONTROL MOLECULAR WEIGHT AND OPTICAL DENSITY OF PD CATALYZED NORBORNENE POLYMERS PROMERUS LLC (US) 2008-10-09 WO disclosed
US-20080242810-A1 Use of a Combination Chain Transfer and Activating Agent to Control Molecular Weight and Optical Density of Pd Catalyzed Norbornene Polymers PROMERUS LLC (US) 2008-10-02 US disclosed
US-20080242810-A1 Use of a Combination Chain Transfer and Activating Agent to Control Molecular Weight and Optical Density of Pd Catalyzed Norbornene Polymers PROMERUS LLC (US) 2008-10-02 US disclosed
US-20080058538-A1 Process for producing fluoroalkanesulfonamide derivatives CENTRAL GLASS COMPANY, LIMITED (JP) 2008-03-06 US disclosed
US-20080027246-A1 Process for forming perfluorinated-alkyl sulfonamide substituted norbornene-type monomers PROMERUS, LLC 2008-01-31 US disclosed
US-20080027246-A1 Process for forming perfluorinated-alkyl sulfonamide substituted norbornene-type monomers PROMERUS, LLC 2008-01-31 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20090118539-A1 forming diastereomeric mixture of norbornenecarbonitrile via Diels-Alder reaction, separating, converting to diastereomeric norbornenecarboxaldehyde, and norbornenecarboxylic acid and alcohol; methathesis ring-opening polymerization MMAB, ADH1C, OXER1 EPHX1 656/4885KDM4E 3566/4885CA1 3093/4885
US-20080027246-A1 Process for forming perfluorinated-alkyl sulfonamide substituted norbornene-type monomers PFAS, FLNA, FLNB EPHX1 2101/4885KDM4E 3732/4885CA1 3454/4885
US-20080058538-A1 Process for producing fluoroalkanesulfonamide derivatives AFF1, AFF2, RER1 EPHX1 1026/4885KDM4E 2850/4885CA1 372/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.