SCHEMBL7775783

SCHEMBL7775783

CC1(C)CC(C)(c2ccc(O)c(O)c2O)c2c1cc(O)c(O)c2O

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TP53 P04637 1/20 0.36
CYP1A2 P05177 1/20 0.36
ACHE P22303 1/20 0.30
ADAMTS4 O75173 1/20 0.30
ALDH1A1 P00352 1/20 0.30
EGFR P00533 1/20 0.30
CA1 P00915 1/20 0.30
CA2 P00918 1/20 0.30
LMNA P02545 1/20 0.30
FYN P06241 1/20 0.30
MMP2 P08253 1/20 0.30
MMP9 P14780 1/20 0.30
HPGD P15428 1/20 0.30
ALOX15 P16050 1/20 0.30
MMP8 P22894 1/20 0.30
CA6 P23280 1/20 0.30
CDK2 P24941 1/20 0.30
MMP12 P39900 1/20 0.30
RECQL P46063 1/20 0.30
HSD17B10 Q99714 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8652307 0.82 CYP1A2 (0.40) TP53CYP1A2ACHEADAMTS4ALDH1A1
SCHEMBL8652076 0.79 ESR1 (0.43) TP53ACHELMNATDP1
SCHEMBL9843871 0.77 CYP19A1 (0.36) ACHE
SCHEMBL3256213 0.75 FTO (0.32) TP53CYP1A2ACHE
SCHEMBL30773362 0.75 FTO (0.32) TP53CYP1A2ACHE
SCHEMBL7775784 0.72 TRPA1 (0.38) TP53CYP1A2ACHEADAMTS4ALDH1A1
SCHEMBL7775769 0.72
SCHEMBL7105170 0.71 TRPA1 (0.41) TP53CYP1A2ACHEADAMTS4ALDH1A1
SCHEMBL6846705 0.71 ACHE (0.32) ACHE
SCHEMBL7769631 0.70 FTO (0.32) TP53CYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0445819-B1 Positive type photoresist composition FUJI PHOTO FILM CO LTD (JP) 2001-08-22 EP disclosed
EP-0443533-B1 Positive photoresist composition FUJI PHOTO FILM CO LTD (JP) 1998-09-30 EP disclosed
EP-0445819-A2 Positive type photoresist composition FUJI PHOTO FILM CO., LTD. (JP) 1991-09-11 EP disclosed
EP-0443533-A2 Positive photoresist composition FUJI PHOTO FILM CO., LTD. (JP) 1991-08-28 EP disclosed