Known targets — ChEMBL curated mechanism
ABL1BMXBRAFBTKCHRNA4CHRNB2CSNK1EEGFRERBB2F10FLT1FLT3FLT4IGF1RINSRITKJAK3KDRKITOPRM1PARP1PARP2PDGFRBPIK3CDRAF1RETSLC18A2TECTXKdacAdacBdacCftsImrcAmrcBmrdArplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 2/20 | 0.35 |
| ▸ | PPARG | P37231 | 5/20 | 0.35 |
| ▸ | PPARA | Q07869 | 5/20 | 0.35 |
| ▸ | HTT | P42858 | 3/20 | 0.34 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.34 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.34 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.34 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.34 |
| ▸ | LMNA | P02545 | 1/20 | 0.34 |
| ▸ | CNR2 | P34972 | 1/20 | 0.34 |
| ▸ | PTGS2 | P35354 | 4/20 | 0.34 |
| ▸ | PTGS1 | P23219 | 2/20 | 0.34 |
| ▸ | MMP2 | P08253 | 1/20 | 0.33 |
| ▸ | MMP9 | P14780 | 1/20 | 0.33 |
| ▸ | PTGDR | Q13258 | 1/20 | 0.33 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.32 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.32 |
| ▸ | FFAR4 | Q5NUL3 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3144542 | 0.85 | LMNA (0.44) | MAPTHTTTDP1L3MBTL1SMN1; SMN2 | |
| SCHEMBL3143806 | 0.84 | PTGS2 (0.42) | MAPTHTTTDP1L3MBTL1SMN1; SMN2 | |
| Trifluoromethanesulfonic Acid SCHEMBL7190997 | 0.84 | MAPT (0.37) | MAPTPPARGPPARAFFAR4 | |
| SCHEMBL7172569 | 0.83 | CNR2 (0.40) | MAPTPPARGPPARAHTTTDP1 | |
| SCHEMBL219087 | 0.81 | TDP1 (0.36) | MAPTPPARGPPARAHTTTDP1 | |
| SCHEMBL3135090 | 0.81 | LMNA (0.45) | MAPTHTTTDP1L3MBTL1SMN1; SMN2 | |
| SCHEMBL3136311 | 0.79 | PTGS2 (0.44) | MAPTHTTTDP1L3MBTL1SMN1; SMN2 | |
| SCHEMBL3137420 | 0.79 | PTGS2 (0.44) | MAPTHTTTDP1L3MBTL1SMN1; SMN2 | |
| SCHEMBL3140909 | 0.78 | LMNA (0.42) | MAPTHTTTDP1L3MBTL1SMN1; SMN2 | |
| SCHEMBL3132925 | 0.78 | ALDH1A1 (0.42) | MAPTHTTTDP1L3MBTL1SMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20010033990-A1 | Resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-10-25 | — | — | US | disclosed |